ES2143685T3 - Interferometro de referencia con longitud de onda variable. - Google Patents

Interferometro de referencia con longitud de onda variable.

Info

Publication number
ES2143685T3
ES2143685T3 ES96109740T ES96109740T ES2143685T3 ES 2143685 T3 ES2143685 T3 ES 2143685T3 ES 96109740 T ES96109740 T ES 96109740T ES 96109740 T ES96109740 T ES 96109740T ES 2143685 T3 ES2143685 T3 ES 2143685T3
Authority
ES
Spain
Prior art keywords
mirrors
interferometer
way
variable wave
flats
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES96109740T
Other languages
English (en)
Inventor
Karl-Heinz Bechstein
Beate Moller
Klaus-Dieter Dr Salewski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Carl Zeiss Jena GmbH
Original Assignee
VEB Carl Zeiss Jena GmbH
Carl Zeiss Jena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by VEB Carl Zeiss Jena GmbH, Carl Zeiss Jena GmbH filed Critical VEB Carl Zeiss Jena GmbH
Application granted granted Critical
Publication of ES2143685T3 publication Critical patent/ES2143685T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02004—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using frequency scans
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Lasers (AREA)
  • Spectrometry And Color Measurement (AREA)

Abstract

LA INVENCION SE REFIERE A UN INTERFEROMETRO DE INTERFERENCIA CON LONGITUDES DE ONDA VARIABLES, CON UN DISTRIBUIDOR (3) DE INTERFEROMETRO, CON UNA VIA (R) DE RADIACION DE DIFERENCIA Y CON UNA VIA (M) DE RADIACION DE MEDICION PLEGADA QUE DISCURRE ENTRE DOS ESPEJOS (8;9) PLANOS. UN ELEMENTO (10) QUE MANTIENE LA DISTANCIA ESTA PREVISTO PARA LA REALIZACION DE UNA SITUACION OPUESTA FIJA DE LOS ESPEJOS (8;9) PLANOS. AMBOS ESPEJOS (8;9) PLANOS ESTAN DISPUESTOS DE FORMA INCLINADA UNO CON RESPECTO A OTRO, DE TAL MODO QUE A PARTIR DE UN DISTRIBUIDOR (3) DE INTERFEROMETRO SE REFLEJA UN RAYO DE LUZ ACOPLADO QUE LLEGA EN UN LUGAR O DE ENTRADA EN EL ESPACIO ENTRE LOS ESPEJOS (8;9) PLANOS, EFECTUANDOSE LA REFLEXION MULTIPLES VECES, CON LO CUAL LOS LUGARES (13) DE REFLEXION DESCANSAN SOBRE LAS SUPERFICIES REFLECTORAS DE LOS ESPEJOS (8;9) PLANOS SOBRE UNA PARABOLA. EL SEGUNDO ESPEJO (9) PLANO ESTA COORDINADO CON UN RETRORREFLECTOR (5) DE TAL MODO, QUE SE GUIA CONJUNTAMENTE CON EL RAYO DE LUZ QUE APARECE HACIA EL LUGAR O DE ENTRADA O AL MENOS EN SU PROXIMIDAD.
ES96109740T 1995-06-20 1996-06-18 Interferometro de referencia con longitud de onda variable. Expired - Lifetime ES2143685T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19522263A DE19522263C2 (de) 1995-06-20 1995-06-20 Referenzinterferometer (RI) mit variabler Wellenlänge

Publications (1)

Publication Number Publication Date
ES2143685T3 true ES2143685T3 (es) 2000-05-16

Family

ID=7764728

Family Applications (1)

Application Number Title Priority Date Filing Date
ES96109740T Expired - Lifetime ES2143685T3 (es) 1995-06-20 1996-06-18 Interferometro de referencia con longitud de onda variable.

Country Status (5)

Country Link
US (1) US5715057A (es)
EP (1) EP0750174B1 (es)
AT (1) ATE189925T1 (es)
DE (2) DE19522263C2 (es)
ES (1) ES2143685T3 (es)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19614183C2 (de) * 1996-04-11 2000-08-31 Ulrich Wimmer Verfahren zur Schwerkraftwellendetektion
WO2000045451A1 (en) * 1999-02-01 2000-08-03 Blue Sky Batteries, Inc. Single component sulfur-based cathodes for lithium and lithium-ion batteries
US7193726B2 (en) * 2001-08-23 2007-03-20 Zygo Corporation Optical interferometry
WO2003048681A1 (en) * 2001-12-03 2003-06-12 Zygo Corporation Compensating for effects of non-isotropics gas mixtures in interferometers
TWI259898B (en) * 2002-01-24 2006-08-11 Zygo Corp Method and apparatus for compensation of time-varying optical properties of gas in interferometry
US7030993B2 (en) * 2002-04-24 2006-04-18 Zygo Corporation Athermal zero-shear interferometer
AU2003298613A1 (en) * 2002-11-04 2004-06-07 Zygo Corporation Compensation of refractivity perturbations in an intererometer path
JP4546255B2 (ja) * 2002-12-12 2010-09-15 ザイゴ コーポレーション フォトリソグラフィック露光サイクルの間のステージ・ミラー歪の工程内補正
US7286240B2 (en) * 2003-06-19 2007-10-23 Zygo Corporation Compensation for geometric effects of beam misalignments in plane mirror interferometer metrology systems
US7327465B2 (en) * 2003-06-19 2008-02-05 Zygo Corporation Compensation for effects of beam misalignments in interferometer metrology systems
WO2005067579A2 (en) * 2004-01-06 2005-07-28 Zygo Corporation Multi-axis interferometers and methods and systems using multi-axis interferometers
US7375823B2 (en) * 2004-04-22 2008-05-20 Zygo Corporation Interferometry systems and methods of using interferometry systems
US7280223B2 (en) * 2004-04-22 2007-10-09 Zygo Corporation Interferometry systems and methods of using interferometry systems
WO2006041984A2 (en) * 2004-10-06 2006-04-20 Zygo Corporation Error correction in interferometry systems
WO2006102234A2 (en) * 2005-03-18 2006-09-28 Zygo Corporation Multi-axis interferometer with procedure and data processing for mirror mapping
JP5340730B2 (ja) * 2005-06-29 2013-11-13 ザイゴ コーポレーション 干渉分光法における非周期性の非線形誤差を軽減するための装置および方法
DE102010041634A1 (de) 2010-09-29 2012-03-29 Carl Zeiss Ag Vorrichtung und Verfahren zur Messung des Abstandes eines Objekts von einem Bezugspunkt
CN102942604A (zh) * 2012-11-19 2013-02-27 浙江理工大学 一种泡沫分离纯化茶皂素的方法
DE102020113159A1 (de) 2020-05-14 2021-11-18 Carl Zeiss Ag Verfahren und System zur Messung einer Oberflächentopographie eines Objektes

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB858171A (en) * 1956-01-17 1961-01-11 Nat Res Dev Improvements in and relating to optical apparatus
US3551051A (en) * 1967-08-18 1970-12-29 Gen Electrodynamics Corp Infra-red detectors
CH609456A5 (en) * 1976-09-24 1979-02-28 Eidgenoessisches Amt Fuer Mass Refractometer
CH676289A5 (es) * 1987-03-24 1990-12-28 Wild Leitz Ag
CH678108A5 (es) * 1987-04-28 1991-07-31 Wild Leitz Ag
GB9026622D0 (en) * 1990-12-07 1991-01-23 Ometron Limited Apparatus for the measurement of surface shape
DE4139839C2 (de) * 1991-12-03 1996-06-20 Univ Ernst Moritz Arndt Verfahren zur Bestimmung von Schwebungsfrequenzänderungen zwischen zwei Single-Mode-Lasern sowie zur Vermessung von Distanzen
DE4314486C2 (de) * 1993-05-03 1998-08-27 Heidenhain Gmbh Dr Johannes Absolutinterferometrisches Meßverfahren sowie dafür geeignete Laserinterferometeranordnung

Also Published As

Publication number Publication date
DE59604477D1 (de) 2000-03-30
US5715057A (en) 1998-02-03
DE19522263C2 (de) 1998-07-09
EP0750174A3 (de) 1997-05-21
EP0750174A2 (de) 1996-12-27
EP0750174B1 (de) 2000-02-23
ATE189925T1 (de) 2000-03-15
DE19522263A1 (de) 1997-01-09

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