ES2143875T3 - Instalacion de revestimiento en vacio con una camara de revestimiento y al menos una camara de fuente. - Google Patents

Instalacion de revestimiento en vacio con una camara de revestimiento y al menos una camara de fuente.

Info

Publication number
ES2143875T3
ES2143875T3 ES97931806T ES97931806T ES2143875T3 ES 2143875 T3 ES2143875 T3 ES 2143875T3 ES 97931806 T ES97931806 T ES 97931806T ES 97931806 T ES97931806 T ES 97931806T ES 2143875 T3 ES2143875 T3 ES 2143875T3
Authority
ES
Spain
Prior art keywords
coating
chamber
layers
high purity
found
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES97931806T
Other languages
English (en)
Inventor
Hans-Joachim Scheibe
Daniela Giersch
Robert Schalausky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bayerische Motoren Werke AG
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Original Assignee
Bayerische Motoren Werke AG
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayerische Motoren Werke AG, Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV filed Critical Bayerische Motoren Werke AG
Application granted granted Critical
Publication of ES2143875T3 publication Critical patent/ES2143875T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

LA INVENCION TRATA DE UN DISPOSITIVO EN PARTICULAR PARA UN EVAPORADOR DE DESCARGA EN ARCO DE VACIO INDUCIDO POR LASER PARA DEPOSITAR MULTIPLES CAPAS CON ELEVADA PUREZA Y ELEVADAS TASAS DE DEPOSICION SOBRE PIEZAS DE GRAN TAMAÑO. DE ACUERDO CON LA INVENCION SE ENCUENTRA LA ALIMENTACION DEL MATERIAL PARA EL MATERIAL DE RECUBRIMIENTO EN UNA CAMARA DE ALIMENTACION, QUE SE PUEDE SEPARAR Y SE PUEDE DEJAR AL VACIO DE MANERA ESTANCA CON RESPECTO A LA CAMARA DE RECUBRIMIENTO, EN LA CUAL SE ENCUENTRA SITUADO EL SUSTRATO QUE SE VA A RECUBRIR. EL EVAPORADOR PUEDE, EN PARTICULAR, UTILIZARSE PARA LA DEPOSICION DE CAPAS DE CARBONO AMORFO QUE NO LLEVAN HIDROGENO Y QUE SON SUPERDURAS Y/O QUE CONTIENEN HIDROGENO, EN RELACION CON CAPAS DE METAL DE ELEVADA PUREZA O PARA LA DEPOSICION REACTIVA MEDIANTE PLASMA DE, POR EJEMPLO, CAPAS OBTENIDAS POR MEDIO DE LA OXIDACION, DE CARBURACION, DE NITRURACION O BIEN DE CAPAS CERAMICAS O DE UNA COMBINACION DE LAS DOS ULTIMAS. LAS CORRESPONDIENTES ALIMENTACIONES DEL PLASMA SE PUEDEN UNIR CON APROPIADAS CAMARAS DE RECUBRIMIENTO Y ASI SE PUEDEN COMBINAR CON PROCEDIMIENTOS NORMALES DE REVESTIMIENTO, P. E. LA PULVERIZACION MAGNETRONICA.
ES97931806T 1996-07-12 1997-07-10 Instalacion de revestimiento en vacio con una camara de revestimiento y al menos una camara de fuente. Expired - Lifetime ES2143875T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19628102A DE19628102A1 (de) 1996-07-12 1996-07-12 Vakuumbeschichtungsanlage mit einer Beschichtungskammer und zumindest einer Quellenkammer

Publications (1)

Publication Number Publication Date
ES2143875T3 true ES2143875T3 (es) 2000-05-16

Family

ID=7799625

Family Applications (1)

Application Number Title Priority Date Filing Date
ES97931806T Expired - Lifetime ES2143875T3 (es) 1996-07-12 1997-07-10 Instalacion de revestimiento en vacio con una camara de revestimiento y al menos una camara de fuente.

Country Status (5)

Country Link
US (1) US6338778B1 (es)
EP (1) EP0910683B1 (es)
DE (2) DE19628102A1 (es)
ES (1) ES2143875T3 (es)
WO (1) WO1998002596A1 (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19816818A1 (de) * 1998-04-16 1999-10-21 Bayerische Motoren Werke Ag Vakuumbeschichtungsanlage mit einer Beschichtungskammer, einer Quellenkammer und einer Laserstrahlquelle
CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus
US7300559B2 (en) * 2000-04-10 2007-11-27 G & H Technologies Llc Filtered cathodic arc deposition method and apparatus
DE10023122A1 (de) * 2000-05-11 2001-11-15 Bayerische Motoren Werke Ag Verfahren zur Herstellung einer verschleiß- und reibarmen Beschichtung auf Leichtmetallbauteilen
JP2005029855A (ja) 2003-07-08 2005-02-03 Fuji Electric Device Technology Co Ltd 真空アーク蒸着装置、真空アーク蒸着法、および磁気記録媒体
WO2005033663A2 (en) * 2003-09-30 2005-04-14 Sequenom, Inc. Methods of making substrates for mass spectrometry analysis and related devices
US20070224242A1 (en) * 2006-03-21 2007-09-27 Jet Engineering, Inc. Tetrahedral Amorphous Carbon Coated Medical Devices
DE102007019981B4 (de) * 2007-04-23 2011-04-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Anode für die Bildung eines Plasmas durch Ausbildung elektrischer Bogenentladungen
CN101824596B (zh) * 2010-03-30 2011-12-14 东莞宏威数码机械有限公司 自动冷却式供电装置
DE102013225608A1 (de) 2013-12-11 2015-06-11 Apo Gmbh Massenkleinteilbeschichtung Vorrichtung und Verfahren zur Oberflächenbehandlung von Kleinteilen mittels Plasma
CZ306607B6 (cs) 2016-02-05 2017-03-22 Platit A.S. Způsob nanášení otěruvzdorné DLC vrstvy

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE111408C (es)
DE267515C (es)
DE279695C (es)
US3649339A (en) * 1969-09-05 1972-03-14 Eugene C Smith Apparatus and method for securing a high vacuum for particle coating process
US3865625A (en) * 1972-10-13 1975-02-11 Bell Telephone Labor Inc Molecular beam epitaxy shadowing technique for fabricating dielectric optical waveguides
DD111408A1 (es) * 1974-05-10 1975-02-12
JPS5665981A (en) * 1979-11-02 1981-06-04 Hitachi Ltd Sputtering device
JPS5825474A (ja) * 1981-08-07 1983-02-15 Mitsubishi Electric Corp スパツタ・酸化・蒸着装置
FR2542327B1 (es) * 1983-03-07 1986-03-07 Bensoussan Marcel
DE3413891C2 (de) 1984-04-12 1987-01-08 Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich Verfahren und Vorrichtung zur Materialverdampfung in einem Vakuumbehälter
DD267515A1 (de) * 1987-10-15 1989-05-03 Ardenne Forschungsinst Einrichtung zur bearbeitung von substraten im vakuum in mehreren prozessstationen
EP0319347B1 (en) * 1987-12-04 1994-08-03 Research Development Corporation of Japan Vacuum depositing apparatus
US4961832A (en) * 1989-03-14 1990-10-09 Shagun Vladimir A Apparatus for applying film coatings onto substrates in vacuum
JPH0793348B2 (ja) * 1989-05-19 1995-10-09 アプライド マテリアルズ インコーポレーテッド 多重チャンバ真空式処理装置及び多重チャンバ真空式半導体ウェーハ処理装置
JPH081923B2 (ja) * 1991-06-24 1996-01-10 ティーディーケイ株式会社 クリーン搬送方法及び装置
JPH05251408A (ja) * 1992-03-06 1993-09-28 Ebara Corp 半導体ウェーハのエッチング装置
DE4207526C2 (de) * 1992-03-10 1995-07-13 Leybold Ag Hochvakuum-Beschichtungsanlage
DE4336681C2 (de) 1993-10-27 1996-10-02 Fraunhofer Ges Forschung Verfahren und Einrichtung zum plasmaaktivierten Elektronenstrahlverdampfen
US5401543A (en) * 1993-11-09 1995-03-28 Minnesota Mining And Manufacturing Company Method for forming macroparticle-free DLC films by cathodic arc discharge
DE4342574C1 (de) * 1993-12-14 1995-04-13 Hilmar Weinert Bandbedampfungsanlage
DE4443740B4 (de) * 1994-12-08 2005-09-15 W. Blösch AG Vorrichtung zum Beschichten von Substraten

Also Published As

Publication number Publication date
EP0910683B1 (de) 2000-02-02
WO1998002596A1 (de) 1998-01-22
EP0910683A1 (de) 1999-04-28
DE19628102A1 (de) 1998-01-15
US6338778B1 (en) 2002-01-15
DE59701095D1 (de) 2000-03-09

Similar Documents

Publication Publication Date Title
US5464667A (en) Jet plasma process and apparatus
KR880700098A (ko) 질화티타늄과 질화지르코늄 피복의 제조방법
AU2003207794A1 (en) Corona-generated chemical vapor deposition on a substrate
SG68679A1 (en) Gas ionisation in a cathode arc source
ES522825A0 (es) "metodo para la deposicion de un cuerpo de material de silicio amorfo en capas multiples sobre un sustrato" divisional de la patente de invencion n 516.034n0 solicitada en:28 de septiembre de 1982
DE602004018517D1 (de) Abscheideverfahren mit einem thermischen plasma das mit einer ersetzbaren platte expandiert wird
SE8602715D0 (sv) Forfarande for beleggning av substrat i en vakuumkammare
ES2064593T3 (es) Dispositivo para el recubrimiento de sustratos.
MX170472B (es) Metodo para mejorar la resistencia contra el desgaste mecanico de un substrato y articulo que tiene cuando menos, una superficie con una resistencia mejorada contra el desgaste mecanico
AR025066A2 (es) Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica
WO2004030020A3 (en) Upper electrode plate with deposition shield in a plasma processing system
KR970701803A (ko) 입방 질화 붕소막 제조 방법
ES2128841T3 (es) Ozonizador y procedimiento para su fabricacion.
WO2003071577A3 (de) Kanalfunkenquelle zur erzeugung eines stabil gebündelten elektronenstrahls
TW200606266A (en) MgO vacuum deposition material
KR940004657A (ko) 연료 조립체 스퍼터링 방법
EP0229633A3 (en) Apparatus and method for laser-induced chemical vapor deposition
MXPA06002679A (es) Deposicion de vapor quimico generado por descarga de brillo.
DK0924316T3 (da) Fremgangsmåde til påföring af belægningssystemer
KR100436565B1 (ko) 실리콘을 함유한 초경질 다이아몬드상 탄소박막 및 그제조방법
KR950034303A (ko) 저항체, 저항체의 제조방법 및 제조장치
PL1794856T3 (pl) Lampy wyładowań koronowych
ES2064934T3 (es) Gas plasmageno y aplicacion de este gas a la proyeccion con plasma de oxido metalico.
US20010008698A1 (en) Brass-colored coating with color-imparting nitride layer
TW200607872A (en) MgO vacuum deposition material

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 910683

Country of ref document: ES