ES2160343T3 - Componentes opticos con estructura en gradiente de indice y procedimiento para su fabricacion. - Google Patents
Componentes opticos con estructura en gradiente de indice y procedimiento para su fabricacion.Info
- Publication number
- ES2160343T3 ES2160343T3 ES97919317T ES97919317T ES2160343T3 ES 2160343 T3 ES2160343 T3 ES 2160343T3 ES 97919317 T ES97919317 T ES 97919317T ES 97919317 T ES97919317 T ES 97919317T ES 2160343 T3 ES2160343 T3 ES 2160343T3
- Authority
- ES
- Spain
- Prior art keywords
- optical components
- procedure
- manufacturing
- gradient index
- matrix material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0087—Simple or compound lenses with index gradient
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/773—Nanoparticle, i.e. structure having three dimensions of 100 nm or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
- Y10S977/779—Possessing nanosized particles, powders, flakes, or clusters other than simple atomic impurity doping
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/832—Nanostructure having specified property, e.g. lattice-constant, thermal expansion coefficient
- Y10S977/834—Optical properties of nanomaterial, e.g. specified transparency, opacity, or index of refraction
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Holo Graphy (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Glass Compositions (AREA)
- Mechanical Coupling Of Light Guides (AREA)
- Optical Integrated Circuits (AREA)
- Polymerisation Methods In General (AREA)
Abstract
LA FABRICACION DE COMPONENTES OPTICOS CON UN GRADIENTE DE SUSTANCIA PROVOCADO POR PARTICULAS DEL TAMAÑO DE UN NANOMETRO INCLUIDAS EN UNA MATRIZ FIJA, SE LLEVA A CABO PERMITIENDO EL DESPLAZAMIENTO A LA FASE DE MATRIZ DE PARTICULAS DEL TAMAÑO DE UN NANOMETRO DISPERSADAS EN UNA FASE DE MATRIZ LIQUIDA ENDURECIBLE, FORMANDO UN GRADIENTE DE SUSTANCIA EN VIRTUD DE UNA DIFERENCIA DE POTENCIAL Y, A CONTINUACION, ENDURECIENDO LA FASE DE MATRIZ CONSERVANDO EL GRADIENTE DE SUSTANCIA. ESTE PROCEDIMIENTO ESTA INDICADO, POR EJEMPLO, PARA LA FABRICACION DE LENTES OPTICAS CON GRADIENTES EN EL INDICE DE REFRACCION.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19613645A DE19613645A1 (de) | 1996-04-04 | 1996-04-04 | Optische Bauteile mit Gradientenstruktur und Verfahren zu deren Herstellung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2160343T3 true ES2160343T3 (es) | 2001-11-01 |
Family
ID=7790554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES97919317T Expired - Lifetime ES2160343T3 (es) | 1996-04-04 | 1997-04-03 | Componentes opticos con estructura en gradiente de indice y procedimiento para su fabricacion. |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6236493B1 (es) |
| EP (1) | EP0891565B1 (es) |
| JP (1) | JP4320456B2 (es) |
| CN (1) | CN1091522C (es) |
| AT (1) | ATE204991T1 (es) |
| DE (2) | DE19613645A1 (es) |
| ES (1) | ES2160343T3 (es) |
| WO (1) | WO1997038333A1 (es) |
Families Citing this family (92)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19823732A1 (de) * | 1998-05-27 | 1999-12-02 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung optischer Mehrschichtsysteme |
| GB9815271D0 (en) | 1998-07-14 | 1998-09-09 | Cambridge Display Tech Ltd | Particles and devices comprising particles |
| JP3982953B2 (ja) * | 1999-07-28 | 2007-09-26 | 触媒化成工業株式会社 | 抗菌性塗膜および塗膜付基材 |
| DE19952040A1 (de) * | 1999-10-28 | 2001-05-03 | Inst Neue Mat Gemein Gmbh | Substrat mit einem abriebfesten Diffusionssperrschichtsystem |
| DE10001135A1 (de) | 2000-01-13 | 2001-07-19 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung eines mikrostrukturierten Oberflächenreliefs durch Prägen thixotroper Schichten |
| DE10004132B4 (de) * | 2000-01-31 | 2007-02-01 | Few Chemicals Gmbh | Beschichtungszusammensetzung zur Herstellung schmutzabweisender Schichten und Zweikomponentensystem sowie deren Verwendung |
| US7018057B2 (en) * | 2000-08-23 | 2006-03-28 | Vtec Technologies, Llc | Transparent plastic optical components and abrasion resistant polymer substrates and methods for making the same |
| EP1195416A3 (de) | 2000-10-05 | 2005-12-28 | Degussa AG | Polymerisierbare siliciumorganische Nanokapseln |
| US6695880B1 (en) * | 2000-10-24 | 2004-02-24 | Johnson & Johnson Vision Care, Inc. | Intraocular lenses and methods for their manufacture |
| EP2328026B1 (en) | 2001-02-09 | 2014-04-09 | Dai Nippon Printing Co., Ltd. | Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording |
| EP1249470A3 (de) * | 2001-03-30 | 2005-12-28 | Degussa AG | Hochgefüllte pastöse siliciumorganische Nano- und/oder Mikrohybridkapseln enthaltende Zusammensetzung für kratz- und/oder abriebfeste Beschichtungen |
| DE10126973B4 (de) * | 2001-06-01 | 2007-04-19 | Frischat, Günther Heinz, Prof.Dr. | Lichtdurchlässiges Bauelement aus einem thermoplastischen Polymer |
| JP3717868B2 (ja) * | 2001-08-30 | 2005-11-16 | 東陶機器株式会社 | 光触媒性コーティング剤及び光触媒性複合材並びにその製造方法 |
| JP2004269898A (ja) * | 2001-08-30 | 2004-09-30 | Toto Ltd | 光触媒性コーティング剤及び光触媒性複合材並びにその製造方法 |
| US20030214690A1 (en) * | 2001-11-26 | 2003-11-20 | Escuti Michael J. | Holographic polymer photonic crystal |
| DE10161200A1 (de) | 2001-12-13 | 2003-06-26 | Clariant Gmbh | Kompositmaske zur Herstellung eines Diffusors |
| DE10200760A1 (de) | 2002-01-10 | 2003-07-24 | Clariant Gmbh | Nanokompositmaterial zur Herstellung von Brechzahlgradientenfolien |
| DE10200648A1 (de) * | 2002-01-10 | 2003-07-24 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung Optischer Elemente mit Gradientenstruktur |
| US7128943B1 (en) * | 2002-02-20 | 2006-10-31 | University Of South Florida | Methods for fabricating lenses at the end of optical fibers in the far field of the fiber aperture |
| AU2003218212A1 (en) * | 2002-03-15 | 2003-09-29 | Photon-X, Inc. | Optical polymer nanocomposite substrates with surface relief structures |
| DE10213036A1 (de) * | 2002-03-22 | 2003-10-02 | Clariant Gmbh | Kunststofffolie mit Mehrschicht-Interferenzbeschichtung |
| DE10217151A1 (de) * | 2002-04-17 | 2003-10-30 | Clariant Gmbh | Nanoimprint-Resist |
| JP4324344B2 (ja) * | 2002-05-02 | 2009-09-02 | 富士フイルム株式会社 | 反射防止フィルムおよびその形成方法、偏光板、画像表示装置 |
| JP4344177B2 (ja) | 2002-07-12 | 2009-10-14 | 大日本印刷株式会社 | 体積型ホログラム記録用感光性組成物、体積型ホログラム記録用感光性媒体、及び体積型ホログラム |
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| US6728456B1 (en) * | 2002-10-11 | 2004-04-27 | Eastman Kodak Company | Waveguide with nanoparticle induced refractive index gradient |
| DE10302605B4 (de) * | 2003-01-23 | 2006-05-24 | Humboldt-Universität Zu Berlin | Anordnung und Verfahren zum Beugen von Lichtwellen an einer Beugungsstruktur |
| DE10323729A1 (de) | 2003-05-26 | 2004-12-16 | Institut Für Neue Materialien Gem. Gmbh | Zusammensetzung mit Nichtnewtonschem Verhalten |
| US7521155B2 (en) * | 2003-06-10 | 2009-04-21 | Dai Nippon Printing Co., Ltd. | Volume hologram layer and volume hologram transfer foil |
| DE10326538A1 (de) | 2003-06-12 | 2005-01-05 | Institut für Neue Materialien Gemeinnützige GmbH | Abriebfeste optische Schichten und Formkörper |
| US20050036179A1 (en) * | 2003-08-13 | 2005-02-17 | General Electric Company | Holographic storage medium comprising metal-containing high refractive index region, and storage article containing same |
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| US20060019172A1 (en) * | 2004-03-25 | 2006-01-26 | Hiroyuki Ohtaki | Volume hologram resin composition, surface relief hologram resin composition, and hologram layer, hologram transfer foil and brittle hologram label using the same |
| US8836331B2 (en) | 2004-03-25 | 2014-09-16 | Dai Nippon Printing Co., Ltd. | Volume hologram resin composition, surface relief hologram resin composition, and hologram layer, hologram transfer foil and brittle hologram label using the same |
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| DE102004061324A1 (de) * | 2004-12-20 | 2006-06-22 | Epg (Engineered Nanoproducts Germany)Gmbh | Optische Komponente aus einem anorganisch-organischen Hybridmaterial zur Herstellung von Brechzahlgradientenschichten mit schneller Kinetik und Verfahren zu ihrer Herstellung |
| DE102004061323A1 (de) | 2004-12-20 | 2006-06-22 | Epg (Engineered Nanoproducts Germany)Gmbh | Optische Komponente aus einem anorganisch-organischen Hybridmaterial zur Herstellung von Brechzahlgradientenschichten mit hoher lateraler Auflösung und Verfahren zu ihrer Herstellung |
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| DE4130550A1 (de) * | 1991-09-13 | 1993-03-18 | Inst Neue Mat Gemein Gmbh | Optische elemente und verfahren zu deren herstellung |
| DE4133621A1 (de) * | 1991-10-10 | 1993-04-22 | Inst Neue Mat Gemein Gmbh | Nanoskalige teilchen enthaltende kompositmaterialien, verfahren zu deren herstellung und deren verwendung fuer optische elemente |
| JP3219437B2 (ja) * | 1991-10-28 | 2001-10-15 | オリンパス光学工業株式会社 | 屈折率分布型光学素子 |
| DE69316792T2 (de) * | 1992-06-17 | 1998-05-28 | Nitto Denko Corp | Verfahren zur Herstellung von Polymerisation oder vernetzter Rate-distribuierte Produkte und Verfahren zur Herstellung einer Linse, Linsenanordnung oder Lichtwellenleiter durch dieses Verfahren |
| JPH10502677A (ja) * | 1994-06-29 | 1998-03-10 | ローベルト ボツシユ ゲゼルシヤフト ミツト ベシユレンクテル ハフツング | 異方性導電性の接着剤及び異方性導電性の接着剤の製造方法 |
| FR2731081B1 (fr) * | 1995-02-27 | 1997-04-11 | Essilor Int | Procede d'obtention d'un article transparent a gradient d'indice de refraction |
| US5849373A (en) * | 1996-02-05 | 1998-12-15 | Sandia Corporation | Process for the synthesis of nanophase dispersion-strengthened aluminum alloy |
| US5926740A (en) * | 1997-10-27 | 1999-07-20 | Micron Technology, Inc. | Graded anti-reflective coating for IC lithography |
-
1996
- 1996-04-04 DE DE19613645A patent/DE19613645A1/de not_active Withdrawn
-
1997
- 1997-04-03 DE DE59704453T patent/DE59704453D1/de not_active Expired - Lifetime
- 1997-04-03 EP EP97919317A patent/EP0891565B1/de not_active Expired - Lifetime
- 1997-04-03 JP JP53582797A patent/JP4320456B2/ja not_active Expired - Lifetime
- 1997-04-03 ES ES97919317T patent/ES2160343T3/es not_active Expired - Lifetime
- 1997-04-03 CN CN97193414A patent/CN1091522C/zh not_active Expired - Lifetime
- 1997-04-03 US US09/155,639 patent/US6236493B1/en not_active Expired - Lifetime
- 1997-04-03 AT AT97919317T patent/ATE204991T1/de not_active IP Right Cessation
- 1997-04-03 WO PCT/EP1997/001678 patent/WO1997038333A1/de not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| US6236493B1 (en) | 2001-05-22 |
| DE19613645A1 (de) | 1997-10-09 |
| EP0891565B1 (de) | 2001-08-29 |
| EP0891565A1 (de) | 1999-01-20 |
| CN1091522C (zh) | 2002-09-25 |
| JP4320456B2 (ja) | 2009-08-26 |
| JP2000508783A (ja) | 2000-07-11 |
| ATE204991T1 (de) | 2001-09-15 |
| WO1997038333A1 (de) | 1997-10-16 |
| CN1214773A (zh) | 1999-04-21 |
| DE59704453D1 (de) | 2001-10-04 |
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