ES2175687T3 - Sistema de conexiones y procedimiento para suministrar corriente pulsada a instalaciones de galvanizado o decapado. - Google Patents

Sistema de conexiones y procedimiento para suministrar corriente pulsada a instalaciones de galvanizado o decapado.

Info

Publication number
ES2175687T3
ES2175687T3 ES98910610T ES98910610T ES2175687T3 ES 2175687 T3 ES2175687 T3 ES 2175687T3 ES 98910610 T ES98910610 T ES 98910610T ES 98910610 T ES98910610 T ES 98910610T ES 2175687 T3 ES2175687 T3 ES 2175687T3
Authority
ES
Spain
Prior art keywords
switch
connection
cube
decaped
galvanized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES98910610T
Other languages
English (en)
Inventor
Manfred Maurer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Application granted granted Critical
Publication of ES2175687T3 publication Critical patent/ES2175687T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing of the conductive pattern
    • H05K3/241—Reinforcing of the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Control Of El Displays (AREA)
  • Optical Communication System (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Catching Or Destruction (AREA)
  • Keying Circuit Devices (AREA)
  • Supply And Distribution Of Alternating Current (AREA)
  • ing And Chemical Polishing (AREA)
  • Coating With Molten Metal (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

LA INVENCION SE REFIERE A UN CIRCUITO Y PROCEDIMIENTO PARA SUMINISTRAR A CUBAS ELECTROLITICAS UNA CORRIENTE BURSATIL PARA UTILIZAR EN PLANTAS DE GALVANOPLASTIA. A FIN DE PROPORCIONAR POTENCIA A CADA CUBA ELECTROLITICA, SE INCLUYEN DOS GALVANO RECTIFICADORES (5, 32) Y UN INTERRUPTOR DE CONMUTACION (12) CON DOS INTERRUPTORES SEPARADOS RESPECTIVOS (23, 24). UNA SALIDA DEL RECTIFICADOR CORRESPONDIENTE SE CONECTA POR UN PRIMER CABLE (34, 35) A LA CUBA ELECTROLITICA. LAS OTRAS SALIDAS DEL RECTIFICADOR SE CONECTAN RESPECTIVAMENTE A LAS ENTRADAS DEL INTERRUPTOR DE CONMUTACION POR UN SEGUNDO CABLE (34, 35) LA SALIDA (18) DEL INTERRUPTOR DE CONMUTACION SE UNE A LA OTRA CONEXION DE LA CUBA ELECTROLITICA. ENTRE LOS CABLES PRIMERO Y SEGUNDO SE CONECTA UN CONDENSADOR (20, 21). SE PRODUCEN IMPULSOS PERIODICOS ABRIENDOSE Y CERRANDOSE ALTERNATIVAMENTE LOS INTERRUPTORES SEPARADOS.
ES98910610T 1997-02-27 1998-02-02 Sistema de conexiones y procedimiento para suministrar corriente pulsada a instalaciones de galvanizado o decapado. Expired - Lifetime ES2175687T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19707905A DE19707905C1 (de) 1997-02-27 1997-02-27 Verfahren zur Pulsstromversorgung von Galvanisieranlagen

Publications (1)

Publication Number Publication Date
ES2175687T3 true ES2175687T3 (es) 2002-11-16

Family

ID=7821683

Family Applications (1)

Application Number Title Priority Date Filing Date
ES98910610T Expired - Lifetime ES2175687T3 (es) 1997-02-27 1998-02-02 Sistema de conexiones y procedimiento para suministrar corriente pulsada a instalaciones de galvanizado o decapado.

Country Status (15)

Country Link
US (1) US6179984B1 (es)
EP (1) EP0966557B1 (es)
JP (1) JP4095675B2 (es)
KR (1) KR100490223B1 (es)
CN (1) CN1204300C (es)
AT (1) ATE217037T1 (es)
AU (1) AU6494898A (es)
BR (1) BR9807269B1 (es)
CA (1) CA2282391A1 (es)
DE (2) DE19707905C1 (es)
ES (1) ES2175687T3 (es)
HU (1) HUP0000593A3 (es)
MY (1) MY119720A (es)
PL (1) PL187880B1 (es)
WO (1) WO1998038357A1 (es)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19726510C2 (de) * 1997-06-23 2000-12-28 Georg Hesse Vorrichtung und Verfahren zur elektrolytischen Metallabscheidung mittels Pulsstrom
US7135461B1 (en) * 2000-06-16 2006-11-14 Myelos Corporation Retro-inverso peptides derived from interleukin-6
DE19931230A1 (de) * 1999-07-07 2001-01-18 Atotech Deutschland Gmbh Verfahren zur Galvanisier- und Ätzstrom-Erzeugung in elektrolytischen Anlagen
US6294060B1 (en) 1999-10-21 2001-09-25 Ati Properties, Inc. Conveyorized electroplating device
KR100439356B1 (ko) * 2002-01-16 2004-07-12 소치재 배터리의 충전전압 보상 안정화 회로
DE10202431C1 (de) * 2002-01-22 2003-05-28 Egon Huebel Vorrichtung und Verfahren zum elektrochemischen Behandeln von Gut mit Pulsstrom
US20040140219A1 (en) * 2003-01-21 2004-07-22 Texas Instruments Incorporated System and method for pulse current plating
GB2403609A (en) * 2003-07-01 2005-01-05 Univ Leicester Pulse charging an electrochemical device
US20070068821A1 (en) * 2005-09-27 2007-03-29 Takahisa Hirasawa Method of manufacturing chromium plated article and chromium plating apparatus
JP4877548B2 (ja) * 2006-11-30 2012-02-15 日立オートモティブシステムズ株式会社 クロムめっき装置
AU2008303654A1 (en) * 2007-09-20 2009-04-02 Siemens Aktiengesellschaft Power control device of a power network of an electrochemical coating facility
CN101469442B (zh) * 2007-12-29 2011-12-14 比亚迪股份有限公司 脉冲调制电源及具有该电源的电化学抛光装置
WO2011003178A1 (en) 2009-07-10 2011-01-13 National Research Council Of Canada Novel pulsed power supply for plasma electrolytic deposition and other processes
AU2014351382B2 (en) * 2013-11-19 2017-11-30 Hecker Electronica De Potencia Y Procesos S.A. Method of superimposing alternating current on direct current in electrolytic methods
EP3029178A1 (en) 2014-12-05 2016-06-08 ATOTECH Deutschland GmbH Method and apparatus for electroplating a metal onto a substrate
EP3279676B1 (en) * 2016-08-04 2020-04-01 Robert Bosch GmbH Method and device for the detection of corrosion within an at least partially electrically conductive housing of an electric energy storage unit and corresponding electric energy storage system
EP4010516A1 (de) * 2019-08-05 2022-06-15 SMS Group GmbH Verfahren und anlage zum elektrolytischen beschichten eines elektrisch leitfähigen bandes und/oder gewebes mittels pulstechnik

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3959088A (en) * 1975-03-19 1976-05-25 The United States Of America As Represented By The Secretary Of The Army Method and apparatus for generating high amperage pulses from an A-C power source
US4656411A (en) * 1984-11-13 1987-04-07 Carlson Daniel P DC current controller for hydroset battery electrode electroformation
DE3609296A1 (de) 1986-03-19 1987-09-24 Siemens Ag Vorrichtung zur impulsartigen stromaenderung in einem gleichstromverbraucher, insbesondere einem elektrolytischen bad zur stoffabscheidung bzw. stoffabtragung
US4863579A (en) * 1986-12-27 1989-09-05 Shizuoka Seiki Co., Ltd. Power supply system for electrolytic processing apparatus
EP0308246A1 (en) * 1987-09-17 1989-03-22 Shizuoka Seiki Co. Ltd. Electrolytic finishing method
US4839002A (en) * 1987-12-23 1989-06-13 International Hardcoat, Inc. Method and capacitive discharge apparatus for aluminum anodizing
EP0324142B1 (en) * 1988-01-11 1992-03-11 Shizuoka Seiki Co. Ltd. Finishing method employing electrochemical machining and an electrochemical finishing machine
GB8801827D0 (en) * 1988-01-27 1988-02-24 Jct Controls Ltd Improvements in electrochemical processes
JPH0271932A (ja) * 1988-09-07 1990-03-12 Shizuoka Seiki Co Ltd 電解仕上げ加工装置の芯出し方法
US5007993A (en) * 1989-06-20 1991-04-16 Hull Harry F Electrolytic processing apparatus and method with time multiplexed power supply
DE3939681A1 (de) * 1989-12-01 1991-06-06 Schering Ag Verfahren zur steuerung des ablaufes von galvanischen anlagen, sowie zur durchfuehrung des verfahrens dienender anordnung
KR910018111A (ko) * 1990-04-26 1991-11-30 시기 모리야 전해가공방법 및 전해가공장치

Also Published As

Publication number Publication date
BR9807269B1 (pt) 2010-06-01
ATE217037T1 (de) 2002-05-15
KR20000068882A (ko) 2000-11-25
AU6494898A (en) 1998-09-18
WO1998038357A1 (de) 1998-09-03
CA2282391A1 (en) 1998-09-03
MY119720A (en) 2005-07-29
US6179984B1 (en) 2001-01-30
CN1237215A (zh) 1999-12-01
HUP0000593A2 (en) 2000-07-28
BR9807269A (pt) 2000-05-23
JP2001513146A (ja) 2001-08-28
HUP0000593A3 (en) 2002-02-28
DE59803980D1 (de) 2002-06-06
PL187880B1 (pl) 2004-10-29
JP4095675B2 (ja) 2008-06-04
EP0966557A1 (de) 1999-12-29
DE19707905C1 (de) 1998-02-05
PL333139A1 (en) 1999-11-22
CN1204300C (zh) 2005-06-01
KR100490223B1 (ko) 2005-05-17
HK1021750A1 (en) 2000-06-30
EP0966557B1 (de) 2002-05-02

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