ES2183593T3 - Procedimiento de polimeracion y/o reticulacion por haz de electrones y/o rayos gamma. - Google Patents

Procedimiento de polimeracion y/o reticulacion por haz de electrones y/o rayos gamma.

Info

Publication number
ES2183593T3
ES2183593T3 ES99936669T ES99936669T ES2183593T3 ES 2183593 T3 ES2183593 T3 ES 2183593T3 ES 99936669 T ES99936669 T ES 99936669T ES 99936669 T ES99936669 T ES 99936669T ES 2183593 T3 ES2183593 T3 ES 2183593T3
Authority
ES
Spain
Prior art keywords
gamma
polymerization
electron beam
polymeration
reticulation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES99936669T
Other languages
English (en)
Inventor
Christian Priou
Jean-Marc Frances
Didier Dhaler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhodia Chimie SAS
Original Assignee
Rhodia Chimie SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR9810297A external-priority patent/FR2782320B1/fr
Application filed by Rhodia Chimie SAS filed Critical Rhodia Chimie SAS
Application granted granted Critical
Publication of ES2183593T3 publication Critical patent/ES2183593T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C07F5/027—Organoboranes and organoborohydrides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Silicon Polymers (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)

Abstract

Procedimiento de reticulación y/o polimerización por haz de electrones y/o rayos gamma, de composiciones a base de monómeros y/o de polímeros con agrupamientos organofuncionales, caracterizado porque la reticulación y/o polimerización se efectúa en presencia de un iniciador, activable por haz de electrones y/o rayos gamma, que comprende un derivado de boro de fórmula M+B(Ar)44 . (I) en la que: M+, entidad que lleva una carga positiva, es un metal alcalino elegido entre los de las columnas IA y IIA de la clasificación periódica (versión CAS) Ar es un derivado aromático, eventualmente sustituido con al menos un sustituyente elegido entre un radical flúor, un radical cobre, una cadena alquilo lineal o ramificada, que puede ella misma estar sustituida con al menos un grupo electroactractor tal como CnF2n+1, estando n comprendido entre 1 y 18, F, y OCF3.
ES99936669T 1998-08-11 1999-08-02 Procedimiento de polimeracion y/o reticulacion por haz de electrones y/o rayos gamma. Expired - Lifetime ES2183593T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9810297A FR2782320B1 (fr) 1998-08-11 1998-08-11 Nouveaux amorceurs de polymerisation et/ou de reticulation activables sous faisceau d'electrons
FR9907421 1999-06-11

Publications (1)

Publication Number Publication Date
ES2183593T3 true ES2183593T3 (es) 2003-03-16

Family

ID=26234493

Family Applications (1)

Application Number Title Priority Date Filing Date
ES99936669T Expired - Lifetime ES2183593T3 (es) 1998-08-11 1999-08-02 Procedimiento de polimeracion y/o reticulacion por haz de electrones y/o rayos gamma.

Country Status (11)

Country Link
US (1) US6590009B1 (es)
EP (1) EP1114067B1 (es)
JP (1) JP2002522601A (es)
AT (1) ATE226600T1 (es)
AU (1) AU761698B2 (es)
CA (1) CA2339899A1 (es)
DE (1) DE69903656T2 (es)
DK (1) DK1114067T3 (es)
ES (1) ES2183593T3 (es)
PT (1) PT1114067E (es)
WO (1) WO2000009572A1 (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR0113521B1 (pt) 2000-08-31 2010-07-27 unidade para produção contìnua de tiras têxteis impressas, em particular tiras de etiqueta impressas.
US20030031802A1 (en) * 2001-05-11 2003-02-13 3M Innovative Properties Company Pulsed electron beam polymerization
EP1730214A1 (fr) * 2004-02-27 2006-12-13 Rhodia Chimie Matrice en polysaccaride modifie sous faisceau d'electrons par un compose organosilicie fonctionnel
US20060283133A1 (en) * 2005-06-17 2006-12-21 The Boeing Company Composite reinforcement of metallic structural elements
CN102964369B (zh) * 2012-10-24 2016-04-06 中国科学院青岛生物能源与过程研究所 一类聚合物型硼酸酯锂盐及其制备方法和应用
CN104183867B (zh) * 2014-08-12 2018-06-19 中国科学院青岛生物能源与过程研究所 一种单离子导体纳米颗粒增强锂电池隔膜或聚合物电解质的制备方法和应用
EP3216794A1 (en) * 2016-03-09 2017-09-13 Studiengesellschaft Kohle mbH Process for removing radioactive isotopes from aqueous fluids by fluorine containing reagents, fluorine containing, water-insoluble salts of the radioactive isotopes, and their use as therapeutic agents
AU2017230853B2 (en) * 2016-03-09 2021-06-17 Studiengesellschaft Kohle Mbh Process for removing radioactive isotopes from aqueous fluids by fluorine containing reagents, fluorine containing, water-insoluble salts of the radioactive isotopes, and their use as therapeutic agents

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
US4307182A (en) * 1980-05-23 1981-12-22 Minnesota Mining And Manufacturing Company Imaging systems with tetra(aliphatic) borate salts
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
FR2724660B1 (fr) * 1994-09-16 1997-01-31 Rhone Poulenc Chimie Amorceurs de reticulation, par voie cationique, de polymeres a groupements organofonctionnels, compositions a base de polyorganosiloxanes reticulables et contenant ces amorceurs et application desdites compositions en antiadherence
AU717137B2 (en) * 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
FR2762001B1 (fr) * 1997-04-11 1999-07-02 Rhodia Chimie Sa Amorceurs non toxiques, resines a groupements organofonctionnels reticulables comprenant les amorceurs, et leur utilisation pour la preparation de polymeres stables et non toxiques

Also Published As

Publication number Publication date
AU5168399A (en) 2000-03-06
WO2000009572A1 (fr) 2000-02-24
ATE226600T1 (de) 2002-11-15
CA2339899A1 (fr) 2000-02-24
PT1114067E (pt) 2003-03-31
DE69903656D1 (de) 2002-11-28
JP2002522601A (ja) 2002-07-23
DE69903656T2 (de) 2003-06-26
DK1114067T3 (da) 2002-12-02
EP1114067B1 (fr) 2002-10-23
US6590009B1 (en) 2003-07-08
AU761698B2 (en) 2003-06-05
EP1114067A1 (fr) 2001-07-11

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