ES2184904T3 - Aleacion de cobre, cromo, titanio y silicio y su utilizacion. - Google Patents

Aleacion de cobre, cromo, titanio y silicio y su utilizacion.

Info

Publication number
ES2184904T3
ES2184904T3 ES97100093T ES97100093T ES2184904T3 ES 2184904 T3 ES2184904 T3 ES 2184904T3 ES 97100093 T ES97100093 T ES 97100093T ES 97100093 T ES97100093 T ES 97100093T ES 2184904 T3 ES2184904 T3 ES 2184904T3
Authority
ES
Spain
Prior art keywords
chrome
titanium
copper
silicon alloy
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES97100093T
Other languages
English (en)
Inventor
Andreas Dipl-Ing-Dr-Rer- Bogel
Michael Dipl-Ing-Dr-R Bohsmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wieland Werke AG
Original Assignee
Wieland Werke AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wieland Werke AG filed Critical Wieland Werke AG
Application granted granted Critical
Publication of ES2184904T3 publication Critical patent/ES2184904T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C9/00—Alloys based on copper
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/40—Leadframes
    • H10W70/456—Materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Conductive Materials (AREA)

Abstract

LA INVENCION TRATA DE UNA ALEACION DE COBRE, CROMO, TITANIO Y SILICIO, QUE SE COMPONE DE 0,10 A 0,50 % DE CROMO, 0,01 A 0,25 % DE TITANIO; 0,01 A 0,10 % DE SILICIO: EL RESTO COBRE Y LAS IMPUREZAS ACOSTUMBRADAS. AÑADIENDO DE 0,02 A 0,8 % DE MAGNESIO, DE ACUERDO CON LA INVENCION, SE CONSIGUE EN PARTICULAR UNA ELEVADA ESTABILIDAD CONTRA LA RELAJACION.
ES97100093T 1996-01-12 1997-01-04 Aleacion de cobre, cromo, titanio y silicio y su utilizacion. Expired - Lifetime ES2184904T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19600864A DE19600864C2 (de) 1996-01-12 1996-01-12 Verwendung einer Kupfer-Chrom-Titan-Silizium-Magnesium-Legierung

Publications (1)

Publication Number Publication Date
ES2184904T3 true ES2184904T3 (es) 2003-04-16

Family

ID=7782566

Family Applications (1)

Application Number Title Priority Date Filing Date
ES97100093T Expired - Lifetime ES2184904T3 (es) 1996-01-12 1997-01-04 Aleacion de cobre, cromo, titanio y silicio y su utilizacion.

Country Status (3)

Country Link
EP (1) EP0784099B1 (es)
DE (2) DE19600864C2 (es)
ES (1) ES2184904T3 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6749699B2 (en) 2000-08-09 2004-06-15 Olin Corporation Silver containing copper alloy
EP1251186A1 (de) 2001-04-19 2002-10-23 Wieland-Werke AG Kupfer-Nickel-Mangan-Legierung und deren Verwendung
DE102007015442B4 (de) * 2007-03-30 2012-05-10 Wieland-Werke Ag Verwendung einer korrosionsbeständigen Kupferlegierung
KR20140114059A (ko) * 2012-02-24 2014-09-25 가부시키가이샤 고베 세이코쇼 구리 합금
JP6266354B2 (ja) * 2014-01-15 2018-01-24 株式会社神戸製鋼所 電気電子部品用銅合金
CN103966475B (zh) * 2014-05-15 2015-12-02 江西理工大学 一种铜铬钛合金接触线及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3527341C1 (de) * 1985-07-31 1986-10-23 Wieland-Werke Ag, 7900 Ulm Kupfer-Chrom-Titan-Silizium-Legierung und ihre Verwendung
GB2178448B (en) * 1985-07-31 1988-11-02 Wieland Werke Ag Copper-chromium-titanium-silicon alloy and application thereof
JPS63125628A (ja) * 1986-11-12 1988-05-28 Nippon Mining Co Ltd 半導体機器のリ−ド材用銅合金
DE3812563A1 (de) * 1988-04-15 1989-10-26 Wieland Werke Ag Kupfer-chrom-titan-silizium-legierung, verfahren zu ihrer herstellung und ihre verwendung
US5017250A (en) * 1989-07-26 1991-05-21 Olin Corporation Copper alloys having improved softening resistance and a method of manufacture thereof

Also Published As

Publication number Publication date
DE59708683D1 (de) 2002-12-19
DE19600864C2 (de) 2000-02-10
EP0784099A2 (de) 1997-07-16
EP0784099B1 (de) 2002-11-13
DE19600864A1 (de) 1997-07-17
EP0784099A3 (de) 2000-03-08

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