ES2297045T3 - Recuperacion de metales preciosos. - Google Patents

Recuperacion de metales preciosos. Download PDF

Info

Publication number: ES2297045T3
Authority: ES; Spain
Prior art keywords: liquid; palladium; filter; washing; ceramic membrane
Prior art date: 2001-09-26
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

ES02800002T

Other languages

English (en)

Spanish (es)

Inventor

Ina Hahndorf

Demitry Kostouros

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Atotech Deutschland GmbH and Co KG

Original Assignee

Atotech Deutschland GmbH and Co KG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2001-09-26

Filing date

2002-08-15

Publication date

2008-05-01

2002-08-15 Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG

2008-05-01 Application granted granted Critical

2008-05-01 Publication of ES2297045T3 publication Critical patent/ES2297045T3/es

2022-08-15 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

239000010970 precious metal Substances 0.000 title abstract description 6
238000011084 recovery Methods 0.000 title description 9
238000000034 method Methods 0.000 claims abstract description 109
239000012528 membrane Substances 0.000 claims abstract description 67
239000000919 ceramic Substances 0.000 claims abstract description 45
239000011148 porous material Substances 0.000 claims abstract description 24
230000007717 exclusion Effects 0.000 claims abstract description 17
KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 307
239000007788 liquid Substances 0.000 claims description 197
229910052763 palladium Inorganic materials 0.000 claims description 149
238000005406 washing Methods 0.000 claims description 69
230000008569 process Effects 0.000 claims description 49
239000000126 substance Substances 0.000 claims description 45
238000000576 coating method Methods 0.000 claims description 29
239000011248 coating agent Substances 0.000 claims description 26
239000002245 particle Substances 0.000 claims description 24
238000001914 filtration Methods 0.000 claims description 11
239000000463 material Substances 0.000 claims description 11
-1 borane amine Chemical class 0.000 claims description 8
239000003002 pH adjusting agent Substances 0.000 claims description 8
239000003638 chemical reducing agent Substances 0.000 claims description 7
MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 6
UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical class B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 claims description 6
238000002156 mixing Methods 0.000 claims description 5
229940065287 selenium compound Drugs 0.000 claims description 5
150000003343 selenium compounds Chemical class 0.000 claims description 5
150000003464 sulfur compounds Chemical class 0.000 claims description 5
150000003498 tellurium compounds Chemical class 0.000 claims description 5
GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
238000004519 manufacturing process Methods 0.000 claims description 4
ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 claims description 3
125000000446 sulfanediyl group Chemical group *S* 0.000 claims description 3
229910000085 borane Inorganic materials 0.000 claims description 2
RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
239000004408 titanium dioxide Substances 0.000 claims description 2
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
229910052782 aluminium Inorganic materials 0.000 claims 1
229940024548 aluminum oxide Drugs 0.000 claims 1
150000003568 thioethers Chemical class 0.000 claims 1
239000012530 fluid Substances 0.000 abstract description 7
238000007747 plating Methods 0.000 abstract description 3
239000000243 solution Substances 0.000 description 80
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 24
230000004913 activation Effects 0.000 description 14
239000000084 colloidal system Substances 0.000 description 14
229910052751 metal Inorganic materials 0.000 description 14
239000002184 metal Substances 0.000 description 14
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
238000004140 cleaning Methods 0.000 description 10
238000009434 installation Methods 0.000 description 10
238000000926 separation method Methods 0.000 description 10
238000000108 ultra-filtration Methods 0.000 description 10
239000012141 concentrate Substances 0.000 description 9
230000000717 retained effect Effects 0.000 description 9
229910021626 Tin(II) chloride Inorganic materials 0.000 description 7
239000012190 activator Substances 0.000 description 7
235000011150 stannous chloride Nutrition 0.000 description 7
AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 7
239000000839 emulsion Substances 0.000 description 6
239000000203 mixture Substances 0.000 description 6
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
230000008901 benefit Effects 0.000 description 5
230000002829 reductive effect Effects 0.000 description 5
239000002699 waste material Substances 0.000 description 5
229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
239000007864 aqueous solution Substances 0.000 description 4
229920000642 polymer Polymers 0.000 description 4
239000000725 suspension Substances 0.000 description 4
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
229910010293 ceramic material Inorganic materials 0.000 description 3
229910052802 copper Inorganic materials 0.000 description 3
239000010949 copper Substances 0.000 description 3
238000009826 distribution Methods 0.000 description 3
238000005868 electrolysis reaction Methods 0.000 description 3
238000012423 maintenance Methods 0.000 description 3
150000002940 palladium Chemical class 0.000 description 3
229920003023 plastic Polymers 0.000 description 3
239000004033 plastic Substances 0.000 description 3
230000001681 protective effect Effects 0.000 description 3
230000008929 regeneration Effects 0.000 description 3
238000011069 regeneration method Methods 0.000 description 3
238000004065 wastewater treatment Methods 0.000 description 3
CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
239000002253 acid Substances 0.000 description 2
230000002378 acidificating effect Effects 0.000 description 2
230000009471 action Effects 0.000 description 2
230000003213 activating effect Effects 0.000 description 2
239000002585 base Substances 0.000 description 2
238000011049 filling Methods 0.000 description 2
239000000706 filtrate Substances 0.000 description 2
238000010438 heat treatment Methods 0.000 description 2
238000007654 immersion Methods 0.000 description 2
230000014759 maintenance of location Effects 0.000 description 2
239000007800 oxidant agent Substances 0.000 description 2
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
238000010979 pH adjustment Methods 0.000 description 2
PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 2
239000012466 permeate Substances 0.000 description 2
238000001556 precipitation Methods 0.000 description 2
230000001012 protector Effects 0.000 description 2
239000011347 resin Substances 0.000 description 2
229920005989 resin Polymers 0.000 description 2
150000003839 salts Chemical class 0.000 description 2
239000000523 sample Substances 0.000 description 2
238000001179 sorption measurement Methods 0.000 description 2
238000005507 spraying Methods 0.000 description 2
150000004763 sulfides Chemical class 0.000 description 2
239000003643 water by type Substances 0.000 description 2
GSFSVEDCYBDIGW-UHFFFAOYSA-N 2-(1,3-benzothiazol-2-yl)-6-chlorophenol Chemical compound OC1=C(Cl)C=CC=C1C1=NC2=CC=CC=C2S1 GSFSVEDCYBDIGW-UHFFFAOYSA-N 0.000 description 1
LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 description 1
KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
108010010803 Gelatin Proteins 0.000 description 1
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
238000013019 agitation Methods 0.000 description 1
229910052783 alkali metal Inorganic materials 0.000 description 1
150000001412 amines Chemical class 0.000 description 1
150000003927 aminopyridines Chemical class 0.000 description 1
239000000908 ammonium hydroxide Substances 0.000 description 1
235000010323 ascorbic acid Nutrition 0.000 description 1
229960005070 ascorbic acid Drugs 0.000 description 1
239000011668 ascorbic acid Substances 0.000 description 1
230000005540 biological transmission Effects 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
125000004432 carbon atom Chemical group C* 0.000 description 1
239000013043 chemical agent Substances 0.000 description 1
238000005285 chemical preparation method Methods 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
230000006835 compression Effects 0.000 description 1
238000007906 compression Methods 0.000 description 1
238000011437 continuous method Methods 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
238000000151 deposition Methods 0.000 description 1
125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
MZGNSEAPZQGJRB-UHFFFAOYSA-N dimethyldithiocarbamic acid Chemical class CN(C)C(S)=S MZGNSEAPZQGJRB-UHFFFAOYSA-N 0.000 description 1
239000006185 dispersion Substances 0.000 description 1
238000010494 dissociation reaction Methods 0.000 description 1
230000005593 dissociations Effects 0.000 description 1
238000005553 drilling Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
230000008020 evaporation Effects 0.000 description 1
238000000605 extraction Methods 0.000 description 1
238000005189 flocculation Methods 0.000 description 1
230000016615 flocculation Effects 0.000 description 1
239000008273 gelatin Substances 0.000 description 1
229920000159 gelatin Polymers 0.000 description 1
235000019322 gelatine Nutrition 0.000 description 1
235000011852 gelatine desserts Nutrition 0.000 description 1
230000005484 gravity Effects 0.000 description 1
VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical class C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 1
239000007970 homogeneous dispersion Substances 0.000 description 1
229910052945 inorganic sulfide Inorganic materials 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
239000003446 ligand Substances 0.000 description 1
239000006193 liquid solution Substances 0.000 description 1
238000001471 micro-filtration Methods 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
229910017604 nitric acid Inorganic materials 0.000 description 1
239000012811 non-conductive material Substances 0.000 description 1
150000002894 organic compounds Chemical class 0.000 description 1
229920000620 organic polymer Polymers 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
150000002941 palladium compounds Chemical class 0.000 description 1
229920001021 polysulfide Polymers 0.000 description 1
239000005077 polysulfide Substances 0.000 description 1
150000008117 polysulfides Polymers 0.000 description 1
229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
239000001267 polyvinylpyrrolidone Substances 0.000 description 1
235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
239000000047 product Substances 0.000 description 1
239000011253 protective coating Substances 0.000 description 1
238000005086 pumping Methods 0.000 description 1
230000000754 repressing effect Effects 0.000 description 1
230000002441 reversible effect Effects 0.000 description 1
238000004062 sedimentation Methods 0.000 description 1
239000011265 semifinished product Substances 0.000 description 1
229910052710 silicon Inorganic materials 0.000 description 1
239000010703 silicon Substances 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
239000011734 sodium Substances 0.000 description 1
229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 1
GWQWBFBJCRDINE-UHFFFAOYSA-M sodium;carbamodithioate Chemical compound [Na+].NC([S-])=S GWQWBFBJCRDINE-UHFFFAOYSA-M 0.000 description 1
238000003980 solgel method Methods 0.000 description 1
239000007921 spray Substances 0.000 description 1
239000003381 stabilizer Substances 0.000 description 1
BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 1
239000011593 sulfur Substances 0.000 description 1
229910052717 sulfur Inorganic materials 0.000 description 1
150000003556 thioamides Chemical class 0.000 description 1
150000003573 thiols Chemical class 0.000 description 1
150000003606 tin compounds Chemical class 0.000 description 1
230000009466 transformation Effects 0.000 description 1
239000002351 wastewater Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths

Landscapes

Chemical & Material Sciences (AREA)
General Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Separation Using Semi-Permeable Membranes (AREA)
Chemically Coating (AREA)
Manufacture And Refinement Of Metals (AREA)
Filtering Materials (AREA)
Manufacturing Of Printed Wiring (AREA)
Porous Artificial Stone Or Porous Ceramic Products (AREA)

ES02800002T 2001-09-26 2002-08-15 Recuperacion de metales preciosos. Expired - Lifetime ES2297045T3 (es)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE10148632A DE10148632C1 (de)	2001-09-26	2001-09-26	Verfahren und Vorrichtung zum galvanotechnischen Behandeln von Werkstücken mit einer Edelmetalle enthaltenden Flüssigkeit
DE10148632		2001-09-26

Publications (1)

Publication Number	Publication Date
ES2297045T3 true ES2297045T3 (es)	2008-05-01

Family

ID=7701145

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ES02800002T Expired - Lifetime ES2297045T3 (es)	2001-09-26	2002-08-15	Recuperacion de metales preciosos.

Country Status (15)

Country	Link
US (1)	US20040237717A1 (de)
EP (1)	EP1430163B1 (de)
JP (1)	JP2005504178A (de)
KR (1)	KR20040043168A (de)
CN (1)	CN1633521A (de)
AT (1)	ATE380264T1 (de)
AU (1)	AU2002333428A1 (de)
BR (1)	BR0212823A (de)
CA (1)	CA2460015A1 (de)
DE (2)	DE10148632C1 (de)
ES (1)	ES2297045T3 (de)
MX (1)	MXPA04002772A (de)
MY (1)	MY147747A (de)
TW (1)	TWI293999B (de)
WO (1)	WO2003029518A2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP1884278A1 (de) *	2006-07-24	2008-02-06	ATOTECH Deutschland GmbH	Spülvorrichtung und -verfahren für das Spülen von Flüssigkeiten von Werkstücken
JP5363311B2 (ja) *	2007-03-30	2013-12-11	三井造船株式会社	バラスト水の膜処理方法
CN103945654A (zh) *	2013-01-18	2014-07-23	北大方正集团有限公司	钝化线路板非金属化孔中残留钯离子的方法及此方法制备的线路板
JP6234070B2 (ja) *	2013-06-03	2017-11-22	木田精工株式会社	表面処理排液の再生方法及び再生装置
CN106471156B (zh) *	2014-07-10	2021-11-26	奥野制药工业株式会社	树脂镀敷方法
JP6340302B2 (ja) *	2014-10-24	2018-06-06	田中貴金属工業株式会社	廃液の処理方法、廃液の処理装置および廃液の再利用方法
EP3133175A1 (de) *	2015-08-19	2017-02-22	Enthone, Inc.	System und verfahren zur wiedergewinnung von katalytischem edelmetall aus wässriger galvanischer verarbeitungslösung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4078918A (en) *	1976-11-26	1978-03-14	Perman Craig A	Method for precious metal recovery
US4435258A (en) *	1982-09-28	1984-03-06	Western Electric Co., Inc.	Method and apparatus for the recovery of palladium from spent electroless catalytic baths
US4895739A (en) *	1988-02-08	1990-01-23	Shipley Company Inc.	Pretreatment for electroplating process
US5205937A (en) *	1992-04-30	1993-04-27	U.S. Filter Membralox	Recovery and reuse of water-based cleaners
DE10024239C1 (de) *	2000-05-15	2001-09-20	Atotech Deutschland Gmbh	Verfahren zum galvanotechnischen Behandeln von Werkstücken mit einer Palladiumkolloidlösung
KR20020061530A (ko) *	2001-01-18	2002-07-24	쉬플리 캄파니, 엘.엘.씨.	촉매 금속의 회수방법

2001
- 2001-09-26 DE DE10148632A patent/DE10148632C1/de not_active Expired - Fee Related
2002
- 2002-08-15 US US10/490,004 patent/US20040237717A1/en not_active Abandoned
- 2002-08-15 AT AT02800002T patent/ATE380264T1/de not_active IP Right Cessation
- 2002-08-15 WO PCT/EP2002/009125 patent/WO2003029518A2/en not_active Ceased
- 2002-08-15 CN CNA028188861A patent/CN1633521A/zh active Pending
- 2002-08-15 JP JP2003532726A patent/JP2005504178A/ja not_active Withdrawn
- 2002-08-15 BR BR0212823-3A patent/BR0212823A/pt not_active Application Discontinuation
- 2002-08-15 KR KR10-2004-7001290A patent/KR20040043168A/ko not_active Withdrawn
- 2002-08-15 MX MXPA04002772A patent/MXPA04002772A/es unknown
- 2002-08-15 AU AU2002333428A patent/AU2002333428A1/en not_active Abandoned
- 2002-08-15 ES ES02800002T patent/ES2297045T3/es not_active Expired - Lifetime
- 2002-08-15 EP EP02800002A patent/EP1430163B1/de not_active Expired - Lifetime
- 2002-08-15 CA CA002460015A patent/CA2460015A1/en not_active Abandoned
- 2002-08-15 DE DE60223934T patent/DE60223934T2/de not_active Expired - Lifetime
- 2002-08-22 MY MYPI20023105A patent/MY147747A/en unknown
- 2002-08-23 TW TW091119189A patent/TWI293999B/zh not_active IP Right Cessation

Also Published As

Publication number	Publication date
KR20040043168A (ko)	2004-05-22
JP2005504178A (ja)	2005-02-10
DE10148632C1 (de)	2003-06-05
CA2460015A1 (en)	2003-04-10
ATE380264T1 (de)	2007-12-15
BR0212823A (pt)	2004-10-13
US20040237717A1 (en)	2004-12-02
WO2003029518A2 (en)	2003-04-10
DE60223934D1 (de)	2008-01-17
EP1430163B1 (de)	2007-12-05
AU2002333428A1 (en)	2003-04-14
MXPA04002772A (es)	2004-06-29
WO2003029518A3 (en)	2004-03-25
CN1633521A (zh)	2005-06-29
TWI293999B (en)	2008-03-01
EP1430163A2 (de)	2004-06-23
DE60223934T2 (de)	2008-12-04
MY147747A (en)	2013-01-15

Publication	Publication Date	Title
CN112246108B (zh)	2022-06-10	一种聚吡咯-镍导电复合分离膜及其制备方法与应用
ES2492924T3 (es)	2014-09-10	Método de fabricación de una membrana de separación de gases que comprende un sustrato con una capa de partículas de óxido inorgánico revestido y una capa de superposición de un material selectivo frente a gases
CN105088321B (zh)	2018-01-09	电镀电池及形成金属涂层的方法
CN108339411B (zh)	2020-12-18	一种导电Cu/PDA/PVDF复合超滤膜及其制备方法
ES2236552T3 (es)	2005-07-16	Metodo para regenerar una solucion de chapado.
ES2898913T3 (es)	2022-03-09	Método de preparación de una estructura porosa compuesta
Kohli et al.	2004	Template synthesis of gold nanotubes in an anodic alumina membrane
BR112014021995B1 (pt)	2020-12-15	Processo para metalização de superfícies de plástico não condutor
CN101293181A (zh)	2008-10-29	金属基-金属氧化物分离膜及其制备方法
EP1430163B1 (de)	2007-12-05	Edelmetallrückgewinnung
KR20030061681A (ko)	2003-07-22	폐수 처리 장치 및 폐수 처리 방법
ES2256792T3 (es)	2006-07-16	Dispositivo y procedimiento para la regeneracion de un baño de recubrimiento metalico autocatalitico.
ES2698205T5 (en)	2025-02-27	Process for cleaning of processing solutions
ES2290783T3 (es)	2008-02-16	Instalacion para depositos de zinc.
JP2004500976A (ja)	2004-01-15	パラジウムコロイド溶液を用いた被処理物の処理方法
JP3963319B2 (ja)	2007-08-22	超純水製造装置
JP2006328536A (ja)	2006-12-07	電解質のイオン濃度を設定する方法及びその装置
CN113082774B (zh)	2022-01-28	一种改性碳布及其制备方法和应用
WO2012042203A2 (en)	2012-04-05	Method of metal deposition
CN100434567C (zh)	2008-11-19	保持金属化熔池的方法
CN100554189C (zh)	2009-10-28	海水淡化中陶瓷膜预处理方法
JP6912845B2 (ja)	2021-08-04	金属膜形成用組成物の製造方法、金属膜の製造方法、金属膜、金属膜積層体及び金属膜形成用組成物の製造装置
Mpofu et al.	2021	Effects of Palladium Chloride Concentration on the Nanoscale Surface Morphology of Electroless Deposited Palladium Thin Film
KR200343397Y1 (ko)	2004-02-27	도금액 활성정화장치
JPH03137916A (ja)	1991-06-12	水素化物系廃ガスの乾式処理装置