ES2458515T3 - Conjunto de cátodo y método de generación de plasma pulsado - Google Patents

Conjunto de cátodo y método de generación de plasma pulsado Download PDF

Info

Publication number: ES2458515T3
Authority: ES; Spain
Prior art keywords: cathode; cathodes; current; plasma; anode
Prior art date: 2007-08-06
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

ES07786583.0T

Other languages

English (en)

Spanish (es)

Inventor

Nikolay Suslov

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Plasma Surgical Investments Ltd

Original Assignee

Plasma Surgical Investments Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2007-08-06

Filing date

2007-08-06

Publication date

2014-05-05

2007-08-06 Application filed by Plasma Surgical Investments Ltd filed Critical Plasma Surgical Investments Ltd

2014-05-05 Application granted granted Critical

2014-05-05 Publication of ES2458515T3 publication Critical patent/ES2458515T3/es

Status Active legal-status Critical Current

2027-08-06 Anticipated expiration legal-status Critical

Links

238000000034 method Methods 0.000 title claims description 42
238000010891 electric arc Methods 0.000 claims description 37
239000007789 gas Substances 0.000 description 47
239000003574 free electron Substances 0.000 description 15
230000007423 decrease Effects 0.000 description 13
239000012535 impurity Substances 0.000 description 7
230000005684 electric field Effects 0.000 description 6
150000002500 ions Chemical class 0.000 description 6
238000010438 heat treatment Methods 0.000 description 5
238000011017 operating method Methods 0.000 description 5
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
230000006378 damage Effects 0.000 description 4
239000002245 particle Substances 0.000 description 4
230000003628 erosive effect Effects 0.000 description 3
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
229910052786 argon Inorganic materials 0.000 description 2
238000000429 assembly Methods 0.000 description 2
230000000712 assembly Effects 0.000 description 2
230000000694 effects Effects 0.000 description 2
239000007772 electrode material Substances 0.000 description 2
238000002474 experimental method Methods 0.000 description 2
230000004927 fusion Effects 0.000 description 2
229910052746 lanthanum Inorganic materials 0.000 description 2
FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 2
238000012986 modification Methods 0.000 description 2
230000004048 modification Effects 0.000 description 2
229910052756 noble gas Inorganic materials 0.000 description 2
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
229910052721 tungsten Inorganic materials 0.000 description 2
239000010937 tungsten Substances 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
230000009286 beneficial effect Effects 0.000 description 1
239000003990 capacitor Substances 0.000 description 1
JJWKPURADFRFRB-UHFFFAOYSA-N carbonyl sulfide Chemical compound O=C=S JJWKPURADFRFRB-UHFFFAOYSA-N 0.000 description 1
239000010406 cathode material Substances 0.000 description 1
238000004891 communication Methods 0.000 description 1
230000001934 delay Effects 0.000 description 1
239000000428 dust Substances 0.000 description 1
238000010892 electric spark Methods 0.000 description 1
230000005611 electricity Effects 0.000 description 1
238000010849 ion bombardment Methods 0.000 description 1
238000010884 ion-beam technique Methods 0.000 description 1
238000002844 melting Methods 0.000 description 1
230000008018 melting Effects 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
239000002923 metal particle Substances 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
238000009832 plasma treatment Methods 0.000 description 1
230000010287 polarization Effects 0.000 description 1
238000000746 purification Methods 0.000 description 1
239000007921 spray Substances 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1

Classifications

- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3478—Geometrical details
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/36—Circuit arrangements

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Spectroscopy & Molecular Physics (AREA)
Geometry (AREA)
Plasma Technology (AREA)
Radiation-Therapy Devices (AREA)

ES07786583.0T 2007-08-06 2007-08-06 Conjunto de cátodo y método de generación de plasma pulsado Active ES2458515T3 (es)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
PCT/EP2007/006940 WO2009018838A1 (en)	2007-08-06	2007-08-06	Cathode assembly and method for pulsed plasma generation

Publications (1)

Publication Number	Publication Date
ES2458515T3 true ES2458515T3 (es)	2014-05-05

Family

ID=39273282

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ES07786583.0T Active ES2458515T3 (es)	2007-08-06	2007-08-06	Conjunto de cátodo y método de generación de plasma pulsado

Country Status (6)

Country	Link
EP (2)	EP2177093B1 (de)
JP (1)	JP5154647B2 (de)
CN (1)	CN101828433B (de)
CA (1)	CA2695902C (de)
ES (1)	ES2458515T3 (de)
WO (1)	WO2009018838A1 (de)

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KR20100127927A (ko) *	2009-05-27	2010-12-07	고영산	에너지레벨 조절이 가능한 무정전압 아이피엘 기기
WO2012115533A1 (en) *	2011-02-25	2012-08-30	Nippon Steel Corporation,	Plasma torch
AU2012371647B2 (en) *	2012-02-28	2015-05-07	Sulzer Metco (Us), Inc.	Extended cascade plasma gun
US10045432B1 (en) *	2017-10-20	2018-08-07	DM ECO Plasma, Inc.	System and method of low-power plasma generation based on high-voltage plasmatron
CN110230082B (zh) *	2019-07-18	2021-06-25	烟台大学	一种集束阴极微弧氧化膜制备装置和方法
US12574443B2 (en) *	2020-04-10	2026-03-10	Oracle International Corporation	System and method for use of remote procedure call with a microservices environment
CN115210689A (zh)	2020-04-14	2022-10-18	甲骨文国际公司	用于在微服务环境中使用的反应式消息传递客户端的系统和方法
DE102021111097B4 (de) *	2021-04-29	2023-04-06	Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein	Hohlkathodensystem zum Erzeugen eines Plasmas und Verfahren zum Betreiben eines solchen Hohlkathodensystems

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2007
- 2007-08-06 CA CA2695902A patent/CA2695902C/en not_active Expired - Fee Related
- 2007-08-06 ES ES07786583.0T patent/ES2458515T3/es active Active
- 2007-08-06 EP EP07786583.0A patent/EP2177093B1/de active Active
- 2007-08-06 JP JP2010519340A patent/JP5154647B2/ja not_active Expired - Fee Related
- 2007-08-06 WO PCT/EP2007/006940 patent/WO2009018838A1/en not_active Ceased
- 2007-08-06 EP EP12173651.6A patent/EP2557902B1/de active Active
- 2007-08-06 CN CN2007801008583A patent/CN101828433B/zh not_active Expired - Fee Related

Also Published As

Publication number	Publication date
CN101828433A (zh)	2010-09-08
CA2695902A1 (en)	2009-02-12
EP2177093A1 (de)	2010-04-21
EP2177093B1 (de)	2014-01-22
JP2010536124A (ja)	2010-11-25
CA2695902C (en)	2016-01-05
WO2009018838A1 (en)	2009-02-12
CN101828433B (zh)	2013-04-24
EP2557902A3 (de)	2014-10-29
HK1136738A1 (en)	2010-07-02
EP2557902B1 (de)	2016-11-23
EP2557902A2 (de)	2013-02-13
JP5154647B2 (ja)	2013-02-27

Publication	Publication Date	Title
ES2458515T3 (es)	2014-05-05	Conjunto de cátodo y método de generación de plasma pulsado
US8735766B2 (en)	2014-05-27	Cathode assembly and method for pulsed plasma generation
US6413256B1 (en)	2002-07-02	Voltage threshold ablation method and apparatus
ES2745473T3 (es)	2020-03-02	Acelerador de plasma con empuje modulado y vehículo espacial con el mismo
JP5441051B2 (ja)	2014-03-12	プラズマ照射装置
US4475063A (en)	1984-10-02	Hollow cathode apparatus
US20060138960A1 (en)	2006-06-29	Gas discharge lamp for euv radiation
US20060237662A1 (en)	2006-10-26	Ion generation by the temporal control of gaseous dielectric breakdown
JP4314309B2 (ja)	2009-08-12	ガス放電による高電流切り換え装置
CN117718211B (zh)	2026-01-06	一种沿面电爆炸耦合多物理场源的复合式机械波发生装置
US10863612B2 (en)	2020-12-08	System for generating a plasma jet of metal ions
JP4930983B2 (ja)	2012-05-16	大気圧プラズマ発生装置
JP6331834B2 (ja)	2018-05-30	プラズマ光源の電源装置
KR20190064037A (ko)	2019-06-10	전방전극이 다중전극이면서 후방전극이 버튼형으로 구성된 플라즈마 토치
HK1136738B (en)	2014-08-15	Cathode assembly and method for pulsed plasma generation
JP6126466B2 (ja)	2017-05-10	プラズマ光源
RU2654493C1 (ru)	2018-05-21	Вакуумный разрядник
Martens	1999	Initiation of a low-pressure glow discharge in a plasma electron source with a ribbon beam
JP6303894B2 (ja)	2018-04-04	プラズマ光源システム
JP6089955B2 (ja)	2017-03-08	プラズマ光源
JP2018028568A (ja)	2018-02-22	プラズマ光源及び極端紫外光の発光方法
EP3405969A1 (de)	2018-11-28	Niederdruckdrahtionenplasmaentladungsquelle und anwendung auf elektronenquelle mit sekundäremission
EP0225413A1 (de)	1987-06-16	C.W.-Gaslaser höchster Leistung mit selbstoptimierenden Elektroden und Pulsstabilisierung
Esaulov et al.	2001	MHD simulation of gas embedded Z-pinch
JP2017181732A (ja)	2017-10-05	プラズマ光源