ES2492065A1 - Manufacturing process of a photo-enamel and product thus obtained (Machine-translation by Google Translate, not legally binding) - Google Patents

Manufacturing process of a photo-enamel and product thus obtained (Machine-translation by Google Translate, not legally binding) Download PDF

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Publication number
ES2492065A1
ES2492065A1 ES201300264A ES201300264A ES2492065A1 ES 2492065 A1 ES2492065 A1 ES 2492065A1 ES 201300264 A ES201300264 A ES 201300264A ES 201300264 A ES201300264 A ES 201300264A ES 2492065 A1 ES2492065 A1 ES 2492065A1
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ES
Spain
Prior art keywords
ceramic
machine
enamel
photo
translation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES201300264A
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Spanish (es)
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ES2492065B1 (en
Inventor
Ángel SÁNCHEZ MUÑOZ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
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Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to ES201300264A priority Critical patent/ES2492065B1/en
Publication of ES2492065A1 publication Critical patent/ES2492065A1/en
Application granted granted Critical
Publication of ES2492065B1 publication Critical patent/ES2492065B1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/18Coating curved surfaces
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81Coating or impregnation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Methods (AREA)

Abstract

Process for manufacturing a photo-enamel comprising the steps of providing a flat rectangular base of a ceramic paste (1, 2) and obtaining a three-dimensional representation of a digital image in a computer system configured for this purpose and characterized in that it comprises furthermore, the steps of reproducing the three-dimensional representation on the flat rectangular base (2) of ceramic paste by means of a numerical control machine (8); glaze (15) and bake (16) the ceramic pasta piece with the three-dimensional representation; apply a tracing or transfer of the pigmentation of the original photograph (18) onto the enameled piece with the ceramic pigments obtained by means of a ceramic toner; and bake until you reach the color and brightness of the original photograph. (Machine-translation by Google Translate, not legally binding)

Description

imagen1image 1

imagen2image2

imagen3image3

imagen4image4

imagen5image5

Claims (1)

imagen1image 1 imagen2image2
ES201300264A 2013-03-07 2013-03-07 Manufacturing process of a photo enamel and product thus obtained Expired - Fee Related ES2492065B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
ES201300264A ES2492065B1 (en) 2013-03-07 2013-03-07 Manufacturing process of a photo enamel and product thus obtained

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ES201300264A ES2492065B1 (en) 2013-03-07 2013-03-07 Manufacturing process of a photo enamel and product thus obtained

Publications (2)

Publication Number Publication Date
ES2492065A1 true ES2492065A1 (en) 2014-09-08
ES2492065B1 ES2492065B1 (en) 2015-01-26

Family

ID=51454289

Family Applications (1)

Application Number Title Priority Date Filing Date
ES201300264A Expired - Fee Related ES2492065B1 (en) 2013-03-07 2013-03-07 Manufacturing process of a photo enamel and product thus obtained

Country Status (1)

Country Link
ES (1) ES2492065B1 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220159A2 (en) * 1985-10-18 1987-04-29 Andromaque S.A. Process for the impression or coating of ceramics at their electroforming, resulting in decorated or technical products by singlefiring
JP2000068291A (en) * 1998-08-20 2000-03-03 Nec Corp Field effect transistor and its manufacture
JP2000199956A (en) * 1999-01-06 2000-07-18 Toray Ind Inc Photosensitive paste
ES2247903A1 (en) * 2004-01-08 2006-03-01 Maprice, S.L. Fabrication of photoluminescent ceramics and glassware comprises silk screw printing of a 200 micron vitreous layer on a green luminescent layer of frit for heating at 700 to 900 degrees C in oxidising atmosphere

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220159A2 (en) * 1985-10-18 1987-04-29 Andromaque S.A. Process for the impression or coating of ceramics at their electroforming, resulting in decorated or technical products by singlefiring
JP2000068291A (en) * 1998-08-20 2000-03-03 Nec Corp Field effect transistor and its manufacture
JP2000199956A (en) * 1999-01-06 2000-07-18 Toray Ind Inc Photosensitive paste
ES2247903A1 (en) * 2004-01-08 2006-03-01 Maprice, S.L. Fabrication of photoluminescent ceramics and glassware comprises silk screw printing of a 200 micron vitreous layer on a green luminescent layer of frit for heating at 700 to 900 degrees C in oxidising atmosphere

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
BASE DE DATOS WPI EN EPOQUE, AN 2000-29396, & JP 2000068291 A (NIPPON SYNTHETIC CHEMIND CO), 28.03.2000, resumen *
BASE DE DATOS WPI EN EPOQUE, AN 2000-621099, & JP 2000199956 A (TORAY IND INC), 18.07.2000, resumen *

Also Published As

Publication number Publication date
ES2492065B1 (en) 2015-01-26

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