ES2545107T3 - Aparato y procedimiento para medir de manera óptica mediante interferometría el grosor de un objeto - Google Patents
Aparato y procedimiento para medir de manera óptica mediante interferometría el grosor de un objeto Download PDFInfo
- Publication number
- ES2545107T3 ES2545107T3 ES09744692.6T ES09744692T ES2545107T3 ES 2545107 T3 ES2545107 T3 ES 2545107T3 ES 09744692 T ES09744692 T ES 09744692T ES 2545107 T3 ES2545107 T3 ES 2545107T3
- Authority
- ES
- Spain
- Prior art keywords
- radiation
- external surface
- radiation source
- thickness
- spectrometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02007—Two or more frequencies or sources used for interferometric measurement
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
- G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Aparato (1) para medir de manera óptica mediante interferometría el grosor de un objeto (2) que presenta una superficie externa (16) y una superficie interna (17) opuesta con respecto a la superficie externa (16), incluyendo el aparato (1): una fuente de radiación (4) que emite un haz de baja coherencia de radiaciones (I) compuesto por una pluralidad de longitudes de onda en una banda determinada; un espectrómetro (5) que analiza el espectro del resultado de la interferencia entre radiaciones (R1) que son reflejadas por la superficie externa (16) que no entran en el objeto (2) y radiaciones (R2) que son reflejadas por la superficie interna (17) que entran en el objeto (2); una sonda óptica (6) que está conectada mediante fibras ópticas (8, 10, 11) a la fuente de radiación (4) y al espectrómetro (5), y que está dispuesta de tal modo que está enfrentada al objeto (2) que va a medirse para dirigir el haz de radiaciones (I) emitido por la fuente de radiación (4) hacia la superficie externa (16) del objeto (2) y para captar las radiaciones (R) que son reflejadas por el objeto (2); y una unidad de procesamiento (18) que calcula el grosor del objeto (2) en función del espectro proporcionado por el espectrómetro (5); estando caracterizado el aparato (1) por el hecho de que la fuente de radiación (4) incluye al menos dos emisores distintos (20) que emiten haces de radiación respectivos que difieren entre sí en su banda de longitudes de onda de modo que el ancho de banda combinado es mayor que el ancho de banda de cada emisor, y que se activan simultáneamente.
Description
Claims (1)
-
imagen1 imagen2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ITBO20080691 | 2008-11-13 | ||
| ITBO2008A000691A IT1391718B1 (it) | 2008-11-13 | 2008-11-13 | Apparecchiatura e metodo per la misura ottica mediante interferometria dello spessore di un oggetto |
| PCT/EP2009/064608 WO2010054969A1 (en) | 2008-11-13 | 2009-11-04 | Apparatus and method for optically measuring by interferometry the thickness of an object |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2545107T3 true ES2545107T3 (es) | 2015-09-08 |
Family
ID=41210642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES09744692.6T Active ES2545107T3 (es) | 2008-11-13 | 2009-11-04 | Aparato y procedimiento para medir de manera óptica mediante interferometría el grosor de un objeto |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20110222072A1 (es) |
| EP (1) | EP2366092B1 (es) |
| JP (1) | JP2012508869A (es) |
| CN (1) | CN102209878B (es) |
| ES (1) | ES2545107T3 (es) |
| IT (1) | IT1391718B1 (es) |
| WO (1) | WO2010054969A1 (es) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI582837B (zh) * | 2012-06-11 | 2017-05-11 | 應用材料股份有限公司 | 在脈衝式雷射退火中使用紅外線干涉技術之熔化深度測定 |
| DE102012111008B4 (de) * | 2012-11-15 | 2014-05-22 | Precitec Optronik Gmbh | Optisches Messverfahren und optische Messvorrichtung zum Erfassen einer Oberflächentopographie |
| US10234265B2 (en) | 2016-12-12 | 2019-03-19 | Precitec Optronik Gmbh | Distance measuring device and method for measuring distances |
| DE102017126310A1 (de) | 2017-11-09 | 2019-05-09 | Precitec Optronik Gmbh | Abstandsmessvorrichtung |
| DE102018130901A1 (de) | 2018-12-04 | 2020-06-04 | Precitec Optronik Gmbh | Optische Messeinrichtung |
| EP4168734B1 (de) | 2020-06-19 | 2025-09-24 | Precitec Optronik GmbH | Chromatisch konfokale messvorrichtung |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3234353B2 (ja) * | 1993-06-15 | 2001-12-04 | 富士写真フイルム株式会社 | 断層情報読取装置 |
| US5856871A (en) * | 1993-08-18 | 1999-01-05 | Applied Spectral Imaging Ltd. | Film thickness mapping using interferometric spectral imaging |
| US5914785A (en) * | 1998-02-04 | 1999-06-22 | The University Of Tennesee Research Corporation | Method and apparatus for making absolute range measurements |
| US6437868B1 (en) * | 1999-10-28 | 2002-08-20 | Agere Systems Guardian Corp. | In-situ automated contactless thickness measurement for wafer thinning |
| US6847454B2 (en) * | 2001-07-16 | 2005-01-25 | Scimed Life Systems, Inc. | Systems and methods for processing signals from an interferometer by an ultrasound console |
| JP3944693B2 (ja) * | 2001-10-04 | 2007-07-11 | オムロン株式会社 | 膜厚測定装置 |
| JP3834789B2 (ja) * | 2002-05-17 | 2006-10-18 | 独立行政法人科学技術振興機構 | 自律型超短光パルス圧縮・位相補償・波形整形装置 |
| JP3852386B2 (ja) * | 2002-08-23 | 2006-11-29 | 株式会社島津製作所 | 膜厚測定方法及び膜厚測定装置 |
| US7139081B2 (en) * | 2002-09-09 | 2006-11-21 | Zygo Corporation | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures |
| JP2004226178A (ja) * | 2003-01-21 | 2004-08-12 | Susumu Nakatani | 分光式厚さ計測装置。 |
| JP4202841B2 (ja) * | 2003-06-30 | 2008-12-24 | 株式会社Sumco | 表面研磨装置 |
| WO2005017489A2 (en) * | 2003-07-11 | 2005-02-24 | Svt Associates, Inc. | Film mapping system |
| DE102005006723B3 (de) * | 2005-02-03 | 2006-06-08 | Universität Stuttgart | Interferometrisches,konfokales Verfahren und interferometrische, konfokale Anordung für optische Datenspeicher, insbesondere Terabyte-Volumenspeicher |
| DE102006016131A1 (de) * | 2005-09-22 | 2007-03-29 | Robert Bosch Gmbh | Interferometrische Messvorrichtung |
| US7589843B2 (en) * | 2005-09-27 | 2009-09-15 | Verity Instruments, Inc. | Self referencing heterodyne reflectometer and method for implementing |
| JP4919860B2 (ja) * | 2007-03-30 | 2012-04-18 | 東京エレクトロン株式会社 | ガス分析装置及び基板処理装置 |
| US7646489B2 (en) * | 2007-04-25 | 2010-01-12 | Yokogawa Electric Corporation | Apparatus and method for measuring film thickness |
| US7884946B2 (en) * | 2008-04-28 | 2011-02-08 | Lumetrics, Inc. | Apparatus for measurement of the axial length of an eye |
-
2008
- 2008-11-13 IT ITBO2008A000691A patent/IT1391718B1/it active
-
2009
- 2009-11-04 WO PCT/EP2009/064608 patent/WO2010054969A1/en not_active Ceased
- 2009-11-04 JP JP2011535968A patent/JP2012508869A/ja active Pending
- 2009-11-04 ES ES09744692.6T patent/ES2545107T3/es active Active
- 2009-11-04 EP EP09744692.6A patent/EP2366092B1/en not_active Not-in-force
- 2009-11-04 CN CN200980145096.8A patent/CN102209878B/zh not_active Expired - Fee Related
- 2009-11-04 US US13/127,467 patent/US20110222072A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| ITBO20080691A1 (it) | 2010-05-14 |
| EP2366092B1 (en) | 2015-06-10 |
| IT1391718B1 (it) | 2012-01-27 |
| CN102209878A (zh) | 2011-10-05 |
| CN102209878B (zh) | 2013-07-17 |
| JP2012508869A (ja) | 2012-04-12 |
| US20110222072A1 (en) | 2011-09-15 |
| EP2366092A1 (en) | 2011-09-21 |
| WO2010054969A1 (en) | 2010-05-20 |
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