ES2545107T3 - Aparato y procedimiento para medir de manera óptica mediante interferometría el grosor de un objeto - Google Patents

Aparato y procedimiento para medir de manera óptica mediante interferometría el grosor de un objeto Download PDF

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Publication number
ES2545107T3
ES2545107T3 ES09744692.6T ES09744692T ES2545107T3 ES 2545107 T3 ES2545107 T3 ES 2545107T3 ES 09744692 T ES09744692 T ES 09744692T ES 2545107 T3 ES2545107 T3 ES 2545107T3
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Spain
Prior art keywords
radiation
external surface
radiation source
thickness
spectrometer
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Application number
ES09744692.6T
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English (en)
Inventor
Leonardo Gwin Roberto Phillips
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Marposs SpA
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Marposs SpA
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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02001Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007Two or more frequencies or sources used for interferometric measurement
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02015Interferometers characterised by the beam path configuration
    • G01B9/02017Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/0209Low-coherence interferometers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

Aparato (1) para medir de manera óptica mediante interferometría el grosor de un objeto (2) que presenta una superficie externa (16) y una superficie interna (17) opuesta con respecto a la superficie externa (16), incluyendo el aparato (1): una fuente de radiación (4) que emite un haz de baja coherencia de radiaciones (I) compuesto por una pluralidad de longitudes de onda en una banda determinada; un espectrómetro (5) que analiza el espectro del resultado de la interferencia entre radiaciones (R1) que son reflejadas por la superficie externa (16) que no entran en el objeto (2) y radiaciones (R2) que son reflejadas por la superficie interna (17) que entran en el objeto (2); una sonda óptica (6) que está conectada mediante fibras ópticas (8, 10, 11) a la fuente de radiación (4) y al espectrómetro (5), y que está dispuesta de tal modo que está enfrentada al objeto (2) que va a medirse para dirigir el haz de radiaciones (I) emitido por la fuente de radiación (4) hacia la superficie externa (16) del objeto (2) y para captar las radiaciones (R) que son reflejadas por el objeto (2); y una unidad de procesamiento (18) que calcula el grosor del objeto (2) en función del espectro proporcionado por el espectrómetro (5); estando caracterizado el aparato (1) por el hecho de que la fuente de radiación (4) incluye al menos dos emisores distintos (20) que emiten haces de radiación respectivos que difieren entre sí en su banda de longitudes de onda de modo que el ancho de banda combinado es mayor que el ancho de banda de cada emisor, y que se activan simultáneamente.

Description

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Claims (1)

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ES09744692.6T 2008-11-13 2009-11-04 Aparato y procedimiento para medir de manera óptica mediante interferometría el grosor de un objeto Active ES2545107T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ITBO20080691 2008-11-13
ITBO2008A000691A IT1391718B1 (it) 2008-11-13 2008-11-13 Apparecchiatura e metodo per la misura ottica mediante interferometria dello spessore di un oggetto
PCT/EP2009/064608 WO2010054969A1 (en) 2008-11-13 2009-11-04 Apparatus and method for optically measuring by interferometry the thickness of an object

Publications (1)

Publication Number Publication Date
ES2545107T3 true ES2545107T3 (es) 2015-09-08

Family

ID=41210642

Family Applications (1)

Application Number Title Priority Date Filing Date
ES09744692.6T Active ES2545107T3 (es) 2008-11-13 2009-11-04 Aparato y procedimiento para medir de manera óptica mediante interferometría el grosor de un objeto

Country Status (7)

Country Link
US (1) US20110222072A1 (es)
EP (1) EP2366092B1 (es)
JP (1) JP2012508869A (es)
CN (1) CN102209878B (es)
ES (1) ES2545107T3 (es)
IT (1) IT1391718B1 (es)
WO (1) WO2010054969A1 (es)

Families Citing this family (6)

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Publication number Priority date Publication date Assignee Title
TWI582837B (zh) * 2012-06-11 2017-05-11 應用材料股份有限公司 在脈衝式雷射退火中使用紅外線干涉技術之熔化深度測定
DE102012111008B4 (de) * 2012-11-15 2014-05-22 Precitec Optronik Gmbh Optisches Messverfahren und optische Messvorrichtung zum Erfassen einer Oberflächentopographie
US10234265B2 (en) 2016-12-12 2019-03-19 Precitec Optronik Gmbh Distance measuring device and method for measuring distances
DE102017126310A1 (de) 2017-11-09 2019-05-09 Precitec Optronik Gmbh Abstandsmessvorrichtung
DE102018130901A1 (de) 2018-12-04 2020-06-04 Precitec Optronik Gmbh Optische Messeinrichtung
EP4168734B1 (de) 2020-06-19 2025-09-24 Precitec Optronik GmbH Chromatisch konfokale messvorrichtung

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3234353B2 (ja) * 1993-06-15 2001-12-04 富士写真フイルム株式会社 断層情報読取装置
US5856871A (en) * 1993-08-18 1999-01-05 Applied Spectral Imaging Ltd. Film thickness mapping using interferometric spectral imaging
US5914785A (en) * 1998-02-04 1999-06-22 The University Of Tennesee Research Corporation Method and apparatus for making absolute range measurements
US6437868B1 (en) * 1999-10-28 2002-08-20 Agere Systems Guardian Corp. In-situ automated contactless thickness measurement for wafer thinning
US6847454B2 (en) * 2001-07-16 2005-01-25 Scimed Life Systems, Inc. Systems and methods for processing signals from an interferometer by an ultrasound console
JP3944693B2 (ja) * 2001-10-04 2007-07-11 オムロン株式会社 膜厚測定装置
JP3834789B2 (ja) * 2002-05-17 2006-10-18 独立行政法人科学技術振興機構 自律型超短光パルス圧縮・位相補償・波形整形装置
JP3852386B2 (ja) * 2002-08-23 2006-11-29 株式会社島津製作所 膜厚測定方法及び膜厚測定装置
US7139081B2 (en) * 2002-09-09 2006-11-21 Zygo Corporation Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
JP2004226178A (ja) * 2003-01-21 2004-08-12 Susumu Nakatani 分光式厚さ計測装置。
JP4202841B2 (ja) * 2003-06-30 2008-12-24 株式会社Sumco 表面研磨装置
WO2005017489A2 (en) * 2003-07-11 2005-02-24 Svt Associates, Inc. Film mapping system
DE102005006723B3 (de) * 2005-02-03 2006-06-08 Universität Stuttgart Interferometrisches,konfokales Verfahren und interferometrische, konfokale Anordung für optische Datenspeicher, insbesondere Terabyte-Volumenspeicher
DE102006016131A1 (de) * 2005-09-22 2007-03-29 Robert Bosch Gmbh Interferometrische Messvorrichtung
US7589843B2 (en) * 2005-09-27 2009-09-15 Verity Instruments, Inc. Self referencing heterodyne reflectometer and method for implementing
JP4919860B2 (ja) * 2007-03-30 2012-04-18 東京エレクトロン株式会社 ガス分析装置及び基板処理装置
US7646489B2 (en) * 2007-04-25 2010-01-12 Yokogawa Electric Corporation Apparatus and method for measuring film thickness
US7884946B2 (en) * 2008-04-28 2011-02-08 Lumetrics, Inc. Apparatus for measurement of the axial length of an eye

Also Published As

Publication number Publication date
ITBO20080691A1 (it) 2010-05-14
EP2366092B1 (en) 2015-06-10
IT1391718B1 (it) 2012-01-27
CN102209878A (zh) 2011-10-05
CN102209878B (zh) 2013-07-17
JP2012508869A (ja) 2012-04-12
US20110222072A1 (en) 2011-09-15
EP2366092A1 (en) 2011-09-21
WO2010054969A1 (en) 2010-05-20

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