ES2600252T8 - Dispositivo y procedimiento de producción y/o de confinamiento de un plasma - Google Patents

Dispositivo y procedimiento de producción y/o de confinamiento de un plasma Download PDF

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Publication number
ES2600252T8
ES2600252T8 ES09740707.6T ES09740707T ES2600252T8 ES 2600252 T8 ES2600252 T8 ES 2600252T8 ES 09740707 T ES09740707 T ES 09740707T ES 2600252 T8 ES2600252 T8 ES 2600252T8
Authority
ES
Spain
Prior art keywords
confinement
plasma
procedure
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES09740707.6T
Other languages
English (en)
Other versions
ES2600252T3 (es
Inventor
Jacques Pelletier
Stéphane BECHU
Alexandre Bes
Ana Lacoste
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Universite Grenoble Alpes
Original Assignee
Centre National de la Recherche Scientifique CNRS
Universite Grenoble Alpes
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Universite Grenoble Alpes filed Critical Centre National de la Recherche Scientifique CNRS
Application granted granted Critical
Publication of ES2600252T3 publication Critical patent/ES2600252T3/es
Publication of ES2600252T8 publication Critical patent/ES2600252T8/es
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
ES09740707.6T 2008-10-30 2009-10-28 Dispositivo y procedimiento de producción y/o de confinamiento de un plasma Active ES2600252T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0857392 2008-10-30
FR0857392A FR2938150B1 (fr) 2008-10-30 2008-10-30 Dispositif et procede de production et/ou de confinement d'un plasma
PCT/EP2009/064231 WO2010049456A1 (fr) 2008-10-30 2009-10-28 Dispositif et procede de production et/ou de confinement d'un plasma

Publications (2)

Publication Number Publication Date
ES2600252T3 ES2600252T3 (es) 2017-02-08
ES2600252T8 true ES2600252T8 (es) 2017-03-17

Family

ID=40673873

Family Applications (1)

Application Number Title Priority Date Filing Date
ES09740707.6T Active ES2600252T3 (es) 2008-10-30 2009-10-28 Dispositivo y procedimiento de producción y/o de confinamiento de un plasma

Country Status (7)

Country Link
US (1) US8736176B2 (es)
EP (1) EP2353347B1 (es)
ES (1) ES2600252T3 (es)
FR (1) FR2938150B1 (es)
HU (1) HUE030574T2 (es)
PL (1) PL2353347T3 (es)
WO (1) WO2010049456A1 (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2993429B1 (fr) * 2012-07-11 2016-08-05 Centre Nat De La Rech Scient (Cnrs) Applicateur micro-onde coaxial pour la production de plasma
FR2993428B1 (fr) * 2012-07-11 2014-08-08 Centre Nat Rech Scient Applicateur d'onde de surface pour la production de plasma
FR3005783A1 (fr) * 2013-05-17 2014-11-21 Thales Sa Lampe d'eclairage a plasma a basse consommation
FR3005825B1 (fr) 2013-05-17 2015-06-19 Thales Sa Generateur de plasma etendu comprenant des generateurs elementaires integres
US9548227B2 (en) 2013-10-30 2017-01-17 Nisene Technology Group Microwave induced plasma decapsulation using a dielectric plasma discharge tube
US11037764B2 (en) 2017-05-06 2021-06-15 Applied Materials, Inc. Modular microwave source with local Lorentz force
US10504699B2 (en) 2018-04-20 2019-12-10 Applied Materials, Inc. Phased array modular high-frequency source
CN108776129B (zh) * 2018-07-06 2023-12-08 中国科学院西安光学精密机械研究所 多功能环形磁铁阵列激光等离子体约束装置及其应用系统
US11699575B2 (en) * 2019-09-16 2023-07-11 The Regents Of The University Of Michigan Multiple frequency electron cyclotron resonance thruster
DE102020201829A1 (de) 2020-02-13 2021-08-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Vorrichtung und Verfahren zur Herstellung von Schichten mit verbesserter Uniformität bei Beschichtungsanlagen mit horizontal rotierender Substratführung mit zusätzlichen Plasmaquellen
FR3118280B1 (fr) * 2020-12-18 2022-12-02 Commissariat Energie Atomique Dispositif pour le depot de films minces assisté par plasma micro-onde

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5370765A (en) * 1989-03-09 1994-12-06 Applied Microwave Plasma Concepts, Inc. Electron cyclotron resonance plasma source and method of operation
FR2671931A1 (fr) * 1991-01-22 1992-07-24 Metal Process Dispositif de repartition d'une energie micro-onde pour l'excitation d'un plasma.
US5975014A (en) * 1996-07-08 1999-11-02 Asm Japan K.K. Coaxial resonant multi-port microwave applicator for an ECR plasma source
FR2797372B1 (fr) 1999-08-04 2002-10-25 Metal Process Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma
US6729850B2 (en) * 2001-10-31 2004-05-04 Tokyo Electron Limited Applied plasma duct system
FR2838020B1 (fr) 2002-03-28 2004-07-02 Centre Nat Rech Scient Dispositif de confinement de plasma
FR2840451B1 (fr) 2002-06-04 2004-08-13 Centre Nat Rech Scient Dispositif de production d'une nappe de plasma
FR2904177B1 (fr) * 2006-07-21 2008-11-07 Centre Nat Rech Scient Dispositif et procede de production et de confinement d'un plasma.
FR2904178B1 (fr) * 2006-07-21 2008-11-07 Centre Nat Rech Scient Dispositif et procede de production et/ou de confinement d'un plasma

Also Published As

Publication number Publication date
FR2938150B1 (fr) 2010-12-17
PL2353347T3 (pl) 2017-01-31
US20110215722A1 (en) 2011-09-08
WO2010049456A1 (fr) 2010-05-06
ES2600252T3 (es) 2017-02-08
FR2938150A1 (fr) 2010-05-07
US8736176B2 (en) 2014-05-27
HUE030574T2 (hu) 2017-05-29
EP2353347B1 (fr) 2016-07-27
EP2353347A1 (fr) 2011-08-10

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