ES2625301T3 - Fuente de plasma - Google Patents

Fuente de plasma Download PDF

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Publication number
ES2625301T3
ES2625301T3 ES13802538.2T ES13802538T ES2625301T3 ES 2625301 T3 ES2625301 T3 ES 2625301T3 ES 13802538 T ES13802538 T ES 13802538T ES 2625301 T3 ES2625301 T3 ES 2625301T3
Authority
ES
Spain
Prior art keywords
hollow
plasma source
anode
opening
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES13802538.2T
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English (en)
Inventor
Siegfried Krassnitzer
Juerg Hagmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Oerlikon Surface Solutions AG Pfaeffikon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions AG Pfaeffikon filed Critical Oerlikon Surface Solutions AG Pfaeffikon
Application granted granted Critical
Publication of ES2625301T3 publication Critical patent/ES2625301T3/es
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation
    • H01J37/3233—Discharge generated by other radiation using charged particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

Dispositivo de generación de plasma, comprendiendo una fuente de plasma con cuerpo hueco fuente de plasma (1) y una unidad de emisión de electrones (5) que hace posible emitir electrones libres en el cuerpo hueco fuente de plasma (1), en donde el cuerpo hueco fuente de plasma (1) presenta una primera entrada de gas (7a) y una abertura de fuente de plasma (10) que forma una abertura que lleva a una cámara de vacío, así como un ánodo con cuerpo hueco de ánodo (2), en donde el cuerpo hueco de ánodo (2) presenta una segunda entrada de gas (7b) y una abertura de ánodo (11), y una fuente de tensión (8) cuyo polo negativo está unido con la unidad de emisión de electrones (5) y cuyo polo positivo está unido con el cuerpo hueco de ánodo (2), en donde el polo positivo de la fuente de tensión (8) esta unido eléctricamente adicionalmente con el cuerpo hueco fuente de plasma (1) a través de una primera resistencia en paralelo (6a); caracterizado por que la abertura de ánodo (11) forma una abertura que lleva a la cámara de vacío.

Description

imagen1
imagen2
imagen3

Claims (1)

  1. imagen1
ES13802538.2T 2012-12-13 2013-12-09 Fuente de plasma Active ES2625301T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102012024340.5A DE102012024340A1 (de) 2012-12-13 2012-12-13 Plasmaquelle
DE102012024340 2012-12-13
PCT/EP2013/003704 WO2014090389A1 (de) 2012-12-13 2013-12-09 Plasmaquelle

Publications (1)

Publication Number Publication Date
ES2625301T3 true ES2625301T3 (es) 2017-07-19

Family

ID=49753120

Family Applications (1)

Application Number Title Priority Date Filing Date
ES13802538.2T Active ES2625301T3 (es) 2012-12-13 2013-12-09 Fuente de plasma

Country Status (18)

Country Link
US (1) US10032610B2 (es)
EP (1) EP2932523B1 (es)
JP (1) JP6362615B2 (es)
KR (1) KR102106133B1 (es)
CN (1) CN105144338B (es)
AR (1) AR093991A1 (es)
BR (1) BR112015013749B1 (es)
CA (1) CA2894942C (es)
DE (1) DE102012024340A1 (es)
ES (1) ES2625301T3 (es)
HU (1) HUE033157T2 (es)
MX (1) MX346874B (es)
MY (1) MY174916A (es)
PL (1) PL2932523T3 (es)
PT (1) PT2932523T (es)
RU (1) RU2643508C2 (es)
SG (2) SG10201709310WA (es)
WO (1) WO2014090389A1 (es)

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DE102015101294A1 (de) * 2015-01-29 2016-08-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum Erzeugen eines Hohlkathodenbogenentladungsplasmas
DE102016213830B3 (de) * 2016-07-27 2017-12-07 Carl Zeiss Smt Gmbh Quell-Hohlkörper sowie EUV-Plasma-Lichtquelle mit einem derartigen Quell-Hohlkörper
GB2552711B (en) * 2016-08-05 2020-04-22 Hydrogen Universe Ltd Energy transfer method and system
KR102533881B1 (ko) * 2018-06-20 2023-05-17 보드 오브 트러스티즈 오브 미시건 스테이트 유니버시티 단일 빔 플라즈마 소스
CH715878A1 (de) 2019-02-26 2020-08-31 Oerlikon Surface Solutions Ag Pfaeffikon Magnetanordnung für eine Plasmaquelle zur Durchführung von Plasmabehandlungen.
US20220068610A1 (en) * 2018-12-21 2022-03-03 Evatec Ag Vacuum treatment apparatus and method for vacuum plasma treating at least one substrate or for manufacturing a substrate
CH715877A1 (de) * 2019-02-26 2020-08-31 Oerlikon Surface Solutions Ag Pfaeffikon Vakuumkammer mit Elektrodenanordnung für eine Plasmaquelle zur Durchführung von Plasmabehandlungen.
CN112899662A (zh) * 2019-12-04 2021-06-04 江苏菲沃泰纳米科技股份有限公司 Dlc制备装置和制备方法
US12098612B2 (en) 2020-11-23 2024-09-24 Schlumberger Technology Corporation Inflatable packer system for submersible well pump
DE102023002926A1 (de) * 2023-07-17 2025-01-23 Oerlikon Surface Solutions Ag, Pfäffikon Methode und Vorrichtung zur Synthese von hochisolierenden Schichten

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Also Published As

Publication number Publication date
BR112015013749B1 (pt) 2021-02-02
US20150318151A1 (en) 2015-11-05
SG10201709310WA (en) 2018-01-30
CN105144338A (zh) 2015-12-09
BR112015013749A2 (pt) 2017-07-11
PT2932523T (pt) 2017-04-21
MX346874B (es) 2017-03-31
DE102012024340A1 (de) 2014-06-18
JP2016509333A (ja) 2016-03-24
RU2643508C2 (ru) 2018-02-02
EP2932523B1 (de) 2017-02-15
WO2014090389A1 (de) 2014-06-19
EP2932523A1 (de) 2015-10-21
CA2894942C (en) 2021-01-05
SG11201504651QA (en) 2015-07-30
CA2894942A1 (en) 2014-06-19
JP6362615B2 (ja) 2018-07-25
PL2932523T3 (pl) 2017-08-31
HUE033157T2 (en) 2017-11-28
MY174916A (en) 2020-05-21
CN105144338B (zh) 2017-07-14
RU2015128048A (ru) 2017-01-17
AR093991A1 (es) 2015-07-01
KR20150093713A (ko) 2015-08-18
KR102106133B1 (ko) 2020-05-04
MX2015007567A (es) 2016-04-15
US10032610B2 (en) 2018-07-24

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