ES267571A1 - Procedure for the obtaining of monocrystalline plates of a semiconductive material (Machine-translation by Google Translate, not legally binding) - Google Patents

Procedure for the obtaining of monocrystalline plates of a semiconductive material (Machine-translation by Google Translate, not legally binding)

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Publication number
ES267571A1
ES267571A1 ES0267571A ES267571A ES267571A1 ES 267571 A1 ES267571 A1 ES 267571A1 ES 0267571 A ES0267571 A ES 0267571A ES 267571 A ES267571 A ES 267571A ES 267571 A1 ES267571 A1 ES 267571A1
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ES
Spain
Prior art keywords
chamber
translation
legally binding
google translate
machine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES0267571A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Merck and Co Inc
Original Assignee
Merck and Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck and Co Inc filed Critical Merck and Co Inc
Publication of ES267571A1 publication Critical patent/ES267571A1/en
Expired legal-status Critical Current

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Abstract

Process for obtaining monocrystalline sheets of a semiconductive material selected from the group consisting of germanium, silicon and a compound of general formula ** (See formula) ** where A and B are distinct elements, but both of group III, and C and D are distinct elements, but both of group V, and the subscripts x and y denote atomic proportions of value from zero to unity inclusive; which consists of charging a reaction chamber with reagents that include a halogen and the elements of the specific material to be formed; Remove from the chamber materials that are not reactive; heating the reagents to a suitable temperature so that they pass to the vapor phase in the chamber, and cooling at least a portion of the chamber at a rate such that the inclination of the temperature curve in degrees Kelvin with respect to the time in minutes is within of the approximate range of -15 to -140, so as to form, within the reaction chamber, monocrystalline sheets of said material, of suitable length and width to be able to apply electrical conductors, with their upper and lower faces substantially flat, and Such thickness allows several layers of different electrical conductivity and an intermediate transition zone to be formed. (Machine-translation by Google Translate, not legally binding)
ES0267571A 1960-05-09 1961-05-05 Procedure for the obtaining of monocrystalline plates of a semiconductive material (Machine-translation by Google Translate, not legally binding) Expired ES267571A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2788360A 1960-05-09 1960-05-09
US6540160A 1960-10-27 1960-10-27

Publications (1)

Publication Number Publication Date
ES267571A1 true ES267571A1 (en) 1961-10-16

Family

ID=34525687

Family Applications (1)

Application Number Title Priority Date Filing Date
ES0267571A Expired ES267571A1 (en) 1960-05-09 1961-05-05 Procedure for the obtaining of monocrystalline plates of a semiconductive material (Machine-translation by Google Translate, not legally binding)

Country Status (2)

Country Link
BE (1) BE603572A (en)
ES (1) ES267571A1 (en)

Also Published As

Publication number Publication date
BE603572A (en) 1961-11-09

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