ES272455A1 - Procedimiento para la formación de cuerpos semiconductores - Google Patents
Procedimiento para la formación de cuerpos semiconductoresInfo
- Publication number
- ES272455A1 ES272455A1 ES272455A ES272455A ES272455A1 ES 272455 A1 ES272455 A1 ES 272455A1 ES 272455 A ES272455 A ES 272455A ES 272455 A ES272455 A ES 272455A ES 272455 A1 ES272455 A1 ES 272455A1
- Authority
- ES
- Spain
- Prior art keywords
- semiconductor
- conductivity type
- growth plane
- formation
- active impurity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
- H10P14/2901—Materials
- H10P14/2902—Materials being Group IVA materials
- H10P14/2905—Silicon, silicon germanium or germanium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
- H10P14/2926—Crystal orientations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
- H10P14/3404—Deposited materials, e.g. layers characterised by the chemical composition being Group IVA materials
- H10P14/3411—Silicon, silicon germanium or germanium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
- H10P14/3414—Deposited materials, e.g. layers characterised by the chemical composition being group IIIA-VIA materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3438—Doping during depositing
- H10P14/3441—Conductivity type
- H10P14/3442—N-type
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US7234460A | 1960-11-29 | 1960-11-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES272455A1 true ES272455A1 (es) | 1962-03-01 |
Family
ID=22106995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES272455A Expired ES272455A1 (es) | 1960-11-29 | 1961-11-14 | Procedimiento para la formación de cuerpos semiconductores |
Country Status (7)
| Country | Link |
|---|---|
| AT (1) | AT243317B (es) |
| BE (1) | BE610469A (es) |
| CH (1) | CH397875A (es) |
| DE (1) | DE1419716B2 (es) |
| ES (1) | ES272455A1 (es) |
| GB (1) | GB990119A (es) |
| SE (1) | SE305201B (es) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7772097B2 (en) | 2007-11-05 | 2010-08-10 | Asm America, Inc. | Methods of selectively depositing silicon-containing films |
| CN112626615A (zh) * | 2020-12-09 | 2021-04-09 | 黄梦蕾 | 一种半导体分立器用硅外延生长扩散辅助设备 |
-
1961
- 1961-11-14 ES ES272455A patent/ES272455A1/es not_active Expired
- 1961-11-14 DE DE19611419716 patent/DE1419716B2/de active Pending
- 1961-11-17 BE BE610469A patent/BE610469A/fr unknown
- 1961-11-18 AT AT871161A patent/AT243317B/de active
- 1961-11-23 GB GB41983/61A patent/GB990119A/en not_active Expired
- 1961-11-28 SE SE11846/61A patent/SE305201B/xx unknown
- 1961-11-29 CH CH1389561A patent/CH397875A/fr unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE1419716B2 (de) | 1971-12-16 |
| GB990119A (en) | 1965-04-28 |
| DE1419716A1 (de) | 1968-10-10 |
| SE305201B (es) | 1968-10-21 |
| AT243317B (de) | 1965-11-10 |
| CH397875A (fr) | 1965-08-31 |
| BE610469A (fr) | 1962-05-17 |
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