ES2733806T3 - Láser de diodos de alta potencia y procedimiento para la fabricación de un láser de diodos de alta potencia - Google Patents
Láser de diodos de alta potencia y procedimiento para la fabricación de un láser de diodos de alta potencia Download PDFInfo
- Publication number
- ES2733806T3 ES2733806T3 ES10173278T ES10173278T ES2733806T3 ES 2733806 T3 ES2733806 T3 ES 2733806T3 ES 10173278 T ES10173278 T ES 10173278T ES 10173278 T ES10173278 T ES 10173278T ES 2733806 T3 ES2733806 T3 ES 2733806T3
- Authority
- ES
- Spain
- Prior art keywords
- layer
- high power
- power diode
- diode laser
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
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- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 2
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- 229910015894 BeTe Inorganic materials 0.000 description 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
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- CMIHHWBVHJVIGI-UHFFFAOYSA-N gadolinium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Gd+3].[Gd+3] CMIHHWBVHJVIGI-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
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- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
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- 229910052715 tantalum Inorganic materials 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/0014—Measuring characteristics or properties thereof
- H01S5/0021—Degradation or life time measurements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0201—Separation of the wafer into individual elements, e.g. by dicing, cleaving, etching or directly during growth
- H01S5/0202—Cleaving
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
- H01S5/0282—Passivation layers or treatments
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
- H01S5/0282—Passivation layers or treatments
- H01S5/0283—Optically inactive coating on the facet, e.g. half-wave coating
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009028985 | 2009-08-28 | ||
| DE102009054912A DE102009054912A1 (de) | 2009-08-28 | 2009-12-17 | Hochleistungs-Diodenlaser und Verfahren zum Herstellen eines Hochleistungs-Diodenlasers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2733806T3 true ES2733806T3 (es) | 2019-12-03 |
Family
ID=42989237
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES10173278T Active ES2733806T3 (es) | 2009-08-28 | 2010-08-18 | Láser de diodos de alta potencia y procedimiento para la fabricación de un láser de diodos de alta potencia |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9450375B2 (de) |
| EP (1) | EP2290766B1 (de) |
| DE (1) | DE102009054912A1 (de) |
| ES (1) | ES2733806T3 (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9972968B2 (en) * | 2016-04-20 | 2018-05-15 | Trumpf Photonics, Inc. | Passivation of laser facets and systems for performing the same |
| DE102017112610A1 (de) * | 2017-06-08 | 2018-12-13 | Osram Opto Semiconductors Gmbh | Kantenemittierender Halbleiterlaser und Betriebsverfahren für einen solchen Halbleiterlaser |
| JP7296934B2 (ja) * | 2018-02-14 | 2023-06-23 | ヌヴォトンテクノロジージャパン株式会社 | 窒化物半導体レーザ素子及び照明光源モジュール |
| US10418781B1 (en) | 2018-07-06 | 2019-09-17 | Ii-Vi Delaware, Inc. | Quantum well passivation structure for laser facets |
| CN109659810B (zh) * | 2018-12-24 | 2021-10-08 | 香港中文大学（深圳） | 一种降低微腔半导体激光器阈值的方法 |
| JP7672258B2 (ja) * | 2021-03-26 | 2025-05-07 | 古河電気工業株式会社 | 半導体レーザ素子および半導体レーザ素子の製造方法 |
| JP7802468B2 (ja) * | 2021-06-29 | 2026-01-20 | ヌヴォトンテクノロジージャパン株式会社 | 窒化物半導体発光素子 |
| CN115915817A (zh) * | 2021-09-30 | 2023-04-04 | Tcl科技集团股份有限公司 | 发光器件及其制备方法、显示装置 |
| EP4475361A4 (de) * | 2022-02-01 | 2025-05-28 | Panasonic Holdings Corporation | Halbleiterlaserelement |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55115386A (en) * | 1979-02-26 | 1980-09-05 | Hitachi Ltd | Semiconductor laser unit |
| JPS5955077A (ja) * | 1982-09-22 | 1984-03-29 | Sanyo Electric Co Ltd | 光起電力装置 |
| US4563368A (en) | 1983-02-14 | 1986-01-07 | Xerox Corporation | Passivation for surfaces and interfaces of semiconductor laser facets or the like |
| DE68915763T2 (de) | 1989-09-07 | 1994-12-08 | Ibm | Verfahren zur Spiegelpassivierung bei Halbleiterlaserdioden. |
| US5144634A (en) | 1989-09-07 | 1992-09-01 | International Business Machines Corporation | Method for mirror passivation of semiconductor laser diodes |
| DE69006353T2 (de) | 1990-05-25 | 1994-06-23 | Ibm | Verfahren und Vorrichtung zum Spalten von Halbleiterplatten und Bekleiden der gespalteten Facetten. |
| JPH0432285A (ja) * | 1990-05-29 | 1992-02-04 | Omron Corp | 端面出射型半導体発光素子 |
| EP0637862A3 (de) * | 1993-08-05 | 1995-05-24 | Hitachi Ltd | Halbleiterlaservorrichtung und Herstellungsverfahren. |
| FR2742926B1 (fr) * | 1995-12-22 | 1998-02-06 | Alsthom Cge Alcatel | Procede et dispositif de preparation de faces de laser |
| US5939732A (en) * | 1997-05-22 | 1999-08-17 | Kulite Semiconductor Products, Inc. | Vertical cavity-emitting porous silicon carbide light-emitting diode device and preparation thereof |
| US6396864B1 (en) * | 1998-03-13 | 2002-05-28 | Jds Uniphase Corporation | Thermally conductive coatings for light emitting devices |
| US6618409B1 (en) | 2000-05-03 | 2003-09-09 | Corning Incorporated | Passivation of semiconductor laser facets |
| JP2003078199A (ja) * | 2001-09-03 | 2003-03-14 | Fuji Photo Film Co Ltd | 半導体レーザ装置 |
| DE10221952B4 (de) | 2002-05-13 | 2007-07-12 | Forschungsverbund Berlin E.V. | Verfahren zur Passivierung der Spiegelflächen von optischen Halbleiterbauelementen |
| KR20090121361A (ko) * | 2007-02-27 | 2009-11-25 | 식스트론 어드밴스드 머티리얼즈 인코포레이티드 | 기판상에 막을 형성하는 방법 |
-
2009
- 2009-12-17 DE DE102009054912A patent/DE102009054912A1/de not_active Withdrawn
-
2010
- 2010-08-18 EP EP10173278.2A patent/EP2290766B1/de active Active
- 2010-08-18 ES ES10173278T patent/ES2733806T3/es active Active
- 2010-08-30 US US12/870,946 patent/US9450375B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US20110051767A1 (en) | 2011-03-03 |
| EP2290766A2 (de) | 2011-03-02 |
| DE102009054912A1 (de) | 2011-03-10 |
| US9450375B2 (en) | 2016-09-20 |
| EP2290766B1 (de) | 2019-04-03 |
| EP2290766A3 (de) | 2015-04-22 |
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