ES2927811T3 - Procedimiento para sellar orificios en vidrio y artículos obtenidos - Google Patents
Procedimiento para sellar orificios en vidrio y artículos obtenidos Download PDFInfo
- Publication number
- ES2927811T3 ES2927811T3 ES18812265T ES18812265T ES2927811T3 ES 2927811 T3 ES2927811 T3 ES 2927811T3 ES 18812265 T ES18812265 T ES 18812265T ES 18812265 T ES18812265 T ES 18812265T ES 2927811 T3 ES2927811 T3 ES 2927811T3
- Authority
- ES
- Spain
- Prior art keywords
- hole
- glass
- glassware
- sealing
- walls
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011521 glass Substances 0.000 title claims abstract description 118
- 238000000034 method Methods 0.000 title claims abstract description 59
- 238000007789 sealing Methods 0.000 title claims abstract description 40
- 239000000463 material Substances 0.000 claims abstract description 17
- 238000002844 melting Methods 0.000 claims abstract description 17
- 230000008018 melting Effects 0.000 claims abstract description 16
- 238000005553 drilling Methods 0.000 claims description 5
- 238000005488 sandblasting Methods 0.000 claims description 3
- 230000003247 decreasing effect Effects 0.000 claims description 2
- 230000004927 fusion Effects 0.000 claims description 2
- 238000003801 milling Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 43
- 238000010438 heat treatment Methods 0.000 abstract description 16
- 239000003566 sealing material Substances 0.000 abstract description 10
- 238000007499 fusion processing Methods 0.000 abstract description 2
- 238000004026 adhesive bonding Methods 0.000 abstract 1
- 238000004382 potting Methods 0.000 abstract 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 10
- 238000013461 design Methods 0.000 description 8
- 238000005538 encapsulation Methods 0.000 description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 7
- 239000007788 liquid Substances 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 5
- 239000004408 titanium dioxide Substances 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000013082 photovoltaic technology Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PT2017110393 | 2017-11-06 | ||
| PCT/IB2018/058715 WO2019087168A1 (en) | 2017-11-06 | 2018-11-06 | Process for sealing holes in glass and articles obtained |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2927811T3 true ES2927811T3 (es) | 2022-11-11 |
Family
ID=84083687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES18812265T Active ES2927811T3 (es) | 2017-11-06 | 2018-11-06 | Procedimiento para sellar orificios en vidrio y artículos obtenidos |
Country Status (2)
| Country | Link |
|---|---|
| ES (1) | ES2927811T3 (pl) |
| PL (1) | PL3707103T3 (pl) |
-
2018
- 2018-11-06 ES ES18812265T patent/ES2927811T3/es active Active
- 2018-11-06 PL PL18812265.9T patent/PL3707103T3/pl unknown
Also Published As
| Publication number | Publication date |
|---|---|
| PL3707103T4 (pl) | 2022-12-27 |
| PL3707103T3 (pl) | 2022-12-27 |
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