ES341185A1 - Un procedimiento para la confeccion de planchas para la im-presion offset. - Google Patents
Un procedimiento para la confeccion de planchas para la im-presion offset.Info
- Publication number
- ES341185A1 ES341185A1 ES341185A ES341185A ES341185A1 ES 341185 A1 ES341185 A1 ES 341185A1 ES 341185 A ES341185 A ES 341185A ES 341185 A ES341185 A ES 341185A ES 341185 A1 ES341185 A1 ES 341185A1
- Authority
- ES
- Spain
- Prior art keywords
- bromine
- iodine
- chlorine
- aralkyl
- aryl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title abstract 3
- 238000007645 offset printing Methods 0.000 title 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 abstract 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 abstract 3
- 229910052794 bromium Inorganic materials 0.000 abstract 3
- 229910052801 chlorine Inorganic materials 0.000 abstract 3
- 239000000460 chlorine Substances 0.000 abstract 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 abstract 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 125000001309 chloro group Chemical group Cl* 0.000 abstract 2
- 239000011630 iodine Chemical group 0.000 abstract 2
- 229910052740 iodine Chemical group 0.000 abstract 2
- ZRUOTKQBVMWMDK-UHFFFAOYSA-N 2-hydroxy-6-methylbenzaldehyde Chemical compound CC1=CC=CC(O)=C1C=O ZRUOTKQBVMWMDK-UHFFFAOYSA-N 0.000 abstract 1
- GDALETGZDYOOGB-UHFFFAOYSA-N Acridone Natural products C1=C(O)C=C2N(C)C3=CC=CC=C3C(=O)C2=C1O GDALETGZDYOOGB-UHFFFAOYSA-N 0.000 abstract 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- MGJKQDOBUOMPEZ-UHFFFAOYSA-N N,N'-dimethylurea Chemical compound CNC(=O)NC MGJKQDOBUOMPEZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract 1
- FZEYVTFCMJSGMP-UHFFFAOYSA-N acridone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3NC2=C1 FZEYVTFCMJSGMP-UHFFFAOYSA-N 0.000 abstract 1
- 125000003342 alkenyl group Chemical group 0.000 abstract 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 abstract 1
- 150000004056 anthraquinones Chemical class 0.000 abstract 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- 229920002301 cellulose acetate Polymers 0.000 abstract 1
- 229920003086 cellulose ether Polymers 0.000 abstract 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 abstract 1
- 229940106681 chloroacetic acid Drugs 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000007859 condensation product Substances 0.000 abstract 1
- 150000008282 halocarbons Chemical class 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 abstract 1
- -1 mercapto compound Chemical class 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract 1
- 239000004627 regenerated cellulose Substances 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 229920003176 water-insoluble polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK0059398 | 1966-05-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES341185A1 true ES341185A1 (es) | 1968-06-16 |
Family
ID=7229130
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES341185A Expired ES341185A1 (es) | 1966-05-31 | 1967-05-30 | Un procedimiento para la confeccion de planchas para la im-presion offset. |
Country Status (8)
| Country | Link |
|---|---|
| AT (1) | AT278055B (de) |
| BE (1) | BE699162A (de) |
| CH (1) | CH499798A (de) |
| DE (1) | DE1522499A1 (de) |
| DK (1) | DK118003B (de) |
| ES (1) | ES341185A1 (de) |
| GB (1) | GB1169426A (de) |
| NL (1) | NL6706961A (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3613632A1 (de) * | 1986-04-23 | 1987-10-29 | Hoechst Ag | Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial |
| US20080268374A1 (en) * | 2004-07-14 | 2008-10-30 | Fujifilm Corporation | Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process |
-
1966
- 1966-05-31 DE DE19661522499 patent/DE1522499A1/de active Pending
-
1967
- 1967-05-19 NL NL6706961A patent/NL6706961A/xx unknown
- 1967-05-26 CH CH749967A patent/CH499798A/de not_active IP Right Cessation
- 1967-05-29 AT AT499167A patent/AT278055B/de not_active IP Right Cessation
- 1967-05-29 BE BE699162D patent/BE699162A/xx unknown
- 1967-05-30 ES ES341185A patent/ES341185A1/es not_active Expired
- 1967-05-30 DK DK279667A patent/DK118003B/da unknown
- 1967-05-30 GB GB2485367A patent/GB1169426A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| BE699162A (de) | 1967-11-29 |
| AT278055B (de) | 1970-01-26 |
| NL6706961A (de) | 1967-12-01 |
| DK118003B (da) | 1970-06-22 |
| GB1169426A (en) | 1969-11-05 |
| DE1522499A1 (de) | 1969-09-11 |
| CH499798A (de) | 1970-11-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3438778A (en) | Planographic printing plate | |
| US2852379A (en) | Azide resin photolithographic composition | |
| US3574617A (en) | Novel photosensitive coating systems | |
| US3671251A (en) | Sensitized pyrylium photobleachable dye in gelatin | |
| GB1302717A (de) | ||
| GB784001A (en) | Positive diazotype printing plates | |
| US3745028A (en) | Lithographic plate desensitizer formulations | |
| GB1148362A (en) | Photosensitive element and process of using same | |
| GB1010203A (en) | Presensitized positive acting lithographic plates | |
| US3575925A (en) | Photosensitive coating systems | |
| GB1423216A (en) | Presensitized planographic printing plate | |
| US3062644A (en) | Diazo printing plates and method for the production thereof | |
| US3149972A (en) | Diazo and resinous coupler printing plates for photomechanical reproduction | |
| GB1249381A (en) | Process for developing light-sensitive planographic plates | |
| GB1012230A (en) | Process for the preparation of a planographic printing plate | |
| US3738850A (en) | Lithographic plate desensitizer formulations | |
| GB1110017A (en) | Improvements in and relating to light-sensitive plates and planographic printing plates produced therefrom | |
| ES341185A1 (es) | Un procedimiento para la confeccion de planchas para la im-presion offset. | |
| US3697274A (en) | Material and process for the preparation of printing plates | |
| US3526503A (en) | Photoresist composition | |
| GB979552A (en) | Improvements in or relating to photosensitive printing plates | |
| US3113023A (en) | Photosensitive lithographic plate comprising photosensitive diazo resins and method for preparing same | |
| GB1373415A (en) | Method of producing a lithographic plate | |
| GB962054A (en) | Improvements in or relating to lithographic offset masters | |
| US1587269A (en) | Synthetic resins, photographic process, and media |