ES357652A1 - Mejoras introducidas en un procedimiento de fabricacion de clises. - Google Patents

Mejoras introducidas en un procedimiento de fabricacion de clises.

Info

Publication number
ES357652A1
ES357652A1 ES357652A ES357652A ES357652A1 ES 357652 A1 ES357652 A1 ES 357652A1 ES 357652 A ES357652 A ES 357652A ES 357652 A ES357652 A ES 357652A ES 357652 A1 ES357652 A1 ES 357652A1
Authority
ES
Spain
Prior art keywords
translation
machine
legally binding
google translate
improvements introduced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES357652A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of ES357652A1 publication Critical patent/ES357652A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Laminated Bodies (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
ES357652A 1967-08-31 1968-08-29 Mejoras introducidas en un procedimiento de fabricacion de clises. Expired ES357652A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0063249 1967-08-31

Publications (1)

Publication Number Publication Date
ES357652A1 true ES357652A1 (es) 1970-03-16

Family

ID=7230997

Family Applications (1)

Application Number Title Priority Date Filing Date
ES357652A Expired ES357652A1 (es) 1967-08-31 1968-08-29 Mejoras introducidas en un procedimiento de fabricacion de clises.

Country Status (2)

Country Link
AT (1) AT284165B (es)
ES (1) ES357652A1 (es)

Also Published As

Publication number Publication date
AT284165B (de) 1970-09-10

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