ES368367A1 - Un procedimiento para preparar un deposito de niquel que esreceptivo para un deposito decorativo de un metal noble. - Google Patents

Un procedimiento para preparar un deposito de niquel que esreceptivo para un deposito decorativo de un metal noble.

Info

Publication number: ES368367A1
Authority: ES; Spain
Prior art keywords: particles; electro; bright; bath; microns thick
Prior art date: 1968-06-17
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

ES368367A

Other languages

English (en)

Spanish (es)

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

M&T Chemicals Inc

Original Assignee

M&T Chemicals Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1968-06-17

Filing date

1969-06-14

Publication date

1971-05-01

1969-06-14 Application filed by M&T Chemicals Inc filed Critical M&T Chemicals Inc

1971-05-01 Publication of ES368367A1 publication Critical patent/ES368367A1/es

Status Expired legal-status Critical Current

Links

238000000034 method Methods 0.000 title 1
238000007747 plating Methods 0.000 title 1
239000002245 particle Substances 0.000 abstract 10
PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 9
-1 polyethylenes Polymers 0.000 abstract 6
229910052751 metal Inorganic materials 0.000 abstract 5
239000002184 metal Substances 0.000 abstract 5
239000000654 additive Substances 0.000 abstract 4
239000000463 material Substances 0.000 abstract 4
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract 3
239000010949 copper Substances 0.000 abstract 3
238000000151 deposition Methods 0.000 abstract 3
229910052759 nickel Inorganic materials 0.000 abstract 3
HJFZAYHYIWGLNL-UHFFFAOYSA-N 2,6-Dimethylpyrazine Chemical compound CC1=CN=CC(C)=N1 HJFZAYHYIWGLNL-UHFFFAOYSA-N 0.000 abstract 2
229910001369 Brass Inorganic materials 0.000 abstract 2
229910000906 Bronze Inorganic materials 0.000 abstract 2
KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 abstract 2
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 2
229910000990 Ni alloy Inorganic materials 0.000 abstract 2
241000080590 Niso Species 0.000 abstract 2
KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 abstract 2
229910000831 Steel Inorganic materials 0.000 abstract 2
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 2
239000002253 acid Substances 0.000 abstract 2
229910045601 alloy Inorganic materials 0.000 abstract 2
239000000956 alloy Substances 0.000 abstract 2
150000001412 amines Chemical class 0.000 abstract 2
239000010951 brass Substances 0.000 abstract 2
239000010974 bronze Substances 0.000 abstract 2
150000001875 compounds Chemical class 0.000 abstract 2
229920001577 copolymer Polymers 0.000 abstract 2
KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 abstract 2
VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 abstract 2
229920000126 latex Polymers 0.000 abstract 2
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract 2
239000004033 plastic Substances 0.000 abstract 2
229920003023 plastic Polymers 0.000 abstract 2
229920005989 resin Polymers 0.000 abstract 2
239000011347 resin Substances 0.000 abstract 2
239000010959 steel Substances 0.000 abstract 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
239000011701 zinc Substances 0.000 abstract 2
OAQPPRDEHRCEAF-HNENSFHCSA-N (Z)-9,10-dimethyloctadec-9-enamide Chemical compound C/C(=C(/CCCCCCCC(=O)N)C)/CCCCCCCC OAQPPRDEHRCEAF-HNENSFHCSA-N 0.000 abstract 1
WGJCBBASTRWVJL-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound SC1=NCCS1 WGJCBBASTRWVJL-UHFFFAOYSA-N 0.000 abstract 1
SOSQXPIKTBUEKF-UHFFFAOYSA-N 1,4-dihexoxy-1,4-dioxobutane-2-sulfonic acid Chemical compound CCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCC SOSQXPIKTBUEKF-UHFFFAOYSA-N 0.000 abstract 1
AFEITPOSEVENMK-UHFFFAOYSA-N 1-(2-hydroxyethyl)imidazolidine-2-thione Chemical compound OCCN1CCNC1=S AFEITPOSEVENMK-UHFFFAOYSA-N 0.000 abstract 1
239000001934 2,5-dimethylpyrazine Substances 0.000 abstract 1
125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 abstract 1
XSJRPRUNIFBPHB-UHFFFAOYSA-N 3-[1,3-bis(2-cyanoethyl)-5-oxo-2-sulfanylideneimidazolidin-4-yl]propanenitrile Chemical compound C(#N)CCC1C(N(C(N1CCC#N)=S)CCC#N)=O XSJRPRUNIFBPHB-UHFFFAOYSA-N 0.000 abstract 1
OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical compound SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 abstract 1
NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract 1
229910018072 Al 2 O 3 Inorganic materials 0.000 abstract 1
239000005995 Aluminium silicate Substances 0.000 abstract 1
101100069231 Caenorhabditis elegans gkow-1 gene Proteins 0.000 abstract 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
229910020639 Co-Al Inorganic materials 0.000 abstract 1
229910020675 Co—Al Inorganic materials 0.000 abstract 1
VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 abstract 1
239000005977 Ethylene Substances 0.000 abstract 1
239000001828 Gelatine Substances 0.000 abstract 1
229920000663 Hydroxyethyl cellulose Polymers 0.000 abstract 1
239000004354 Hydroxyethyl cellulose Substances 0.000 abstract 1
229920001732 Lignosulfonate Polymers 0.000 abstract 1
239000004117 Lignosulphonate Substances 0.000 abstract 1
229910017709 Ni Co Inorganic materials 0.000 abstract 1
229910003267 Ni-Co Inorganic materials 0.000 abstract 1
229910003262 Ni‐Co Inorganic materials 0.000 abstract 1
PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 abstract 1
239000004952 Polyamide Substances 0.000 abstract 1
239000004698 Polyethylene Substances 0.000 abstract 1
239000004793 Polystyrene Substances 0.000 abstract 1
229910004298 SiO 2 Inorganic materials 0.000 abstract 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 abstract 1
150000001241 acetals Chemical class 0.000 abstract 1
150000007513 acids Chemical class 0.000 abstract 1
229920006397 acrylic thermoplastic Polymers 0.000 abstract 1
230000000996 additive effect Effects 0.000 abstract 1
150000001298 alcohols Chemical class 0.000 abstract 1
229920000615 alginic acid Polymers 0.000 abstract 1
235000010443 alginic acid Nutrition 0.000 abstract 1
229920000180 alkyd Polymers 0.000 abstract 1
229910052782 aluminium Inorganic materials 0.000 abstract 1
235000012211 aluminium silicate Nutrition 0.000 abstract 1
150000001408 amides Chemical class 0.000 abstract 1
TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 abstract 1
238000007664 blowing Methods 0.000 abstract 1
JSPXPZKDILSYNN-UHFFFAOYSA-N but-1-yne-1,4-diol Chemical compound OCCC#CO JSPXPZKDILSYNN-UHFFFAOYSA-N 0.000 abstract 1
125000002837 carbocyclic group Chemical group 0.000 abstract 1
229910052799 carbon Inorganic materials 0.000 abstract 1
238000004140 cleaning Methods 0.000 abstract 1
229910052802 copper Inorganic materials 0.000 abstract 1
238000007598 dipping method Methods 0.000 abstract 1
239000002270 dispersing agent Substances 0.000 abstract 1
MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 abstract 1
238000004070 electrodeposition Methods 0.000 abstract 1
239000003792 electrolyte Substances 0.000 abstract 1
238000009713 electroplating Methods 0.000 abstract 1
239000003995 emulsifying agent Substances 0.000 abstract 1
125000003700 epoxy group Chemical group 0.000 abstract 1
KDKYADYSIPSCCQ-UHFFFAOYSA-N ethyl acetylene Natural products CCC#C KDKYADYSIPSCCQ-UHFFFAOYSA-N 0.000 abstract 1
125000002485 formyl group Chemical class [H]C(*)=O 0.000 abstract 1
150000002240 furans Chemical class 0.000 abstract 1
229920000159 gelatin Polymers 0.000 abstract 1
235000019322 gelatine Nutrition 0.000 abstract 1
239000010439 graphite Substances 0.000 abstract 1
229910002804 graphite Inorganic materials 0.000 abstract 1
229910001385 heavy metal Inorganic materials 0.000 abstract 1
150000002391 heterocyclic compounds Chemical class 0.000 abstract 1
239000004312 hexamethylene tetramine Substances 0.000 abstract 1
235000010299 hexamethylene tetramine Nutrition 0.000 abstract 1
125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
235000019447 hydroxyethyl cellulose Nutrition 0.000 abstract 1
229940071826 hydroxyethyl cellulose Drugs 0.000 abstract 1
XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 1
239000012948 isocyanate Substances 0.000 abstract 1
150000002513 isocyanates Chemical class 0.000 abstract 1
NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 abstract 1
239000004816 latex Substances 0.000 abstract 1
235000019357 lignosulphonate Nutrition 0.000 abstract 1
229910052749 magnesium Inorganic materials 0.000 abstract 1
239000011159 matrix material Substances 0.000 abstract 1
150000001247 metal acetylides Chemical class 0.000 abstract 1
229960004011 methenamine Drugs 0.000 abstract 1
HZPNKQREYVVATQ-UHFFFAOYSA-L nickel(2+);diformate Chemical compound [Ni+2].[O-]C=O.[O-]C=O HZPNKQREYVVATQ-UHFFFAOYSA-L 0.000 abstract 1
229920001778 nylon Polymers 0.000 abstract 1
125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 abstract 1
239000000049 pigment Substances 0.000 abstract 1
229920003229 poly(methyl methacrylate) Polymers 0.000 abstract 1
229920002647 polyamide Polymers 0.000 abstract 1
229920000515 polycarbonate Polymers 0.000 abstract 1
239000004417 polycarbonate Substances 0.000 abstract 1
229920000647 polyepoxide Polymers 0.000 abstract 1
229920000728 polyester Polymers 0.000 abstract 1
229920000570 polyether Polymers 0.000 abstract 1
229920000573 polyethylene Polymers 0.000 abstract 1
229920000642 polymer Polymers 0.000 abstract 1
235000013824 polyphenols Nutrition 0.000 abstract 1
229920001296 polysiloxane Polymers 0.000 abstract 1
229920002223 polystyrene Polymers 0.000 abstract 1
FBNCDBZHLBYPGY-UHFFFAOYSA-N pyridine;dihydrochloride Chemical compound [Cl-].[Cl-].C1=CC=[NH+]C=C1.C1=CC=[NH+]C=C1 FBNCDBZHLBYPGY-UHFFFAOYSA-N 0.000 abstract 1
230000000717 retained effect Effects 0.000 abstract 1
CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 abstract 1
229940081974 saccharin Drugs 0.000 abstract 1
235000019204 saccharin Nutrition 0.000 abstract 1
239000000901 saccharin and its Na,K and Ca salt Substances 0.000 abstract 1
150000003839 salts Chemical class 0.000 abstract 1
IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 abstract 1
239000004094 surface-active agent Substances 0.000 abstract 1
239000000454 talc Substances 0.000 abstract 1
229910052623 talc Inorganic materials 0.000 abstract 1
ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 abstract 1
150000003673 urethanes Chemical class 0.000 abstract 1
229920002554 vinyl polymer Polymers 0.000 abstract 1
239000001993 wax Substances 0.000 abstract 1
239000000080 wetting agent Substances 0.000 abstract 1
229910052725 zinc Inorganic materials 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S205/917—Treatment of workpiece between coating steps
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S428/923—Physical dimension
- Y10S428/924—Composite
- Y10S428/925—Relative dimension specified
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- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9265—Special properties
- Y10S428/927—Decorative informative
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- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9335—Product by special process
- Y10S428/934—Electrical process
- Y10S428/935—Electroplating
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S428/9335—Product by special process
- Y10S428/936—Chemical deposition, e.g. electroless plating
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/12389—All metal or with adjacent metals having variation in thickness
- Y10T428/12396—Discontinuous surface component
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/12472—Microscopic interfacial wave or roughness
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- Y10T428/12—All metal or with adjacent metals
- Y10T428/12479—Porous [e.g., foamed, spongy, cracked, etc.]
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/12—All metal or with adjacent metals
- Y10T428/12486—Laterally noncoextensive components [e.g., embedded, etc.]
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12556—Organic component
- Y10T428/12569—Synthetic resin
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- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/1266—O, S, or organic compound in metal component
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/1266—O, S, or organic compound in metal component
- Y10T428/12667—Oxide of transition metal or Al
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12778—Alternative base metals from diverse categories
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
- Y10T428/12826—Group VIB metal-base component
- Y10T428/12847—Cr-base component
- Y10T428/12854—Next to Co-, Fe-, or Ni-base component
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12882—Cu-base component alternative to Ag-, Au-, or Ni-base component
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249978—Voids specified as micro
- Y10T428/249979—Specified thickness of void-containing component [absolute or relative] or numerical cell dimension

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electroplating And Plating Baths Therefor (AREA)
Electroplating Methods And Accessories (AREA)
Chemically Coating (AREA)

ES368367A 1968-06-17 1969-06-14 Un procedimiento para preparar un deposito de niquel que esreceptivo para un deposito decorativo de un metal noble. Expired ES368367A1 (es)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US73776768A	1968-06-17	1968-06-17

Publications (1)

Publication Number	Publication Date
ES368367A1 true ES368367A1 (es)	1971-05-01

Family

ID=24965229

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ES368367A Expired ES368367A1 (es)	1968-06-17	1969-06-14	Un procedimiento para preparar un deposito de niquel que esreceptivo para un deposito decorativo de un metal noble.

Country Status (10)

Country	Link
US (1)	US3591350A (de)
JP (1)	JPS4827580B1 (de)
BE (1)	BE734627A (de)
CH (1)	CH537461A (de)
DE (1)	DE1930820A1 (de)
ES (1)	ES368367A1 (de)
FR (1)	FR2011062A1 (de)
GB (1)	GB1249002A (de)
NL (1)	NL6909222A (de)
SE (1)	SE357006B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5413979B2 (de) *	1975-01-23	1979-06-04
US4169020A (en) *	1977-12-21	1979-09-25	General Electric Company	Method for making an improved gas seal
US4311768A (en) *	1977-12-22	1982-01-19	Gould Inc.	Printed circuit board having mutually etchable copper and nickel layers
US4190474A (en) *	1977-12-22	1980-02-26	Gould Inc.	Method of making a printed circuit board having mutually etchable copper and nickel layers
DE3144859A1 (de) *	1980-11-12	1982-08-12	Four Brain K.K., Hiroshima	Verfahren zur verbindung von metall und keramik, mit diesem verbindungsverfahren hergestellte prothetische zaehne und zusammengesetzte primaerplattierungsmaterialien zur verwendung bei dem verbindungsverfahren
KR100264622B1 (ko) *	1992-11-30	2000-09-01	에모토 간지	가공성, 도전성 및 내식성이 우수한 표면처리금속판 및 그 제조방법
US6472014B1 (en) *	2001-04-17	2002-10-29	Novellus Systems, Inc.	Uniform surface texturing for PVD/CVD hardware
FR2848219B1 (fr) *	2002-12-09	2006-12-01	Centre Nat Rech Scient	Materiau composite utilisable comme revetement lubrifiant
EP1581474B1 (de) *	2002-12-10	2008-08-27	Dompé S.P.A.	Chirale arylketone zur behandlung neutrophil-abhängiger entzündungskrankheiten
KR100709288B1 (ko) *	2005-07-29	2007-04-19	한국과학기술연구원	수직 자기 이방성이 우수한 ＣｏＰｔＰ 합금 박막 및 그 제조 방법
KR100709290B1 (ko) *	2005-11-15	2007-04-19	한국과학기술연구원	금속 및 무기분말을 포함하는 복합체막 및 그 제조 방법
US8152985B2 (en) *	2008-06-19	2012-04-10	Arlington Plating Company	Method of chrome plating magnesium and magnesium alloys
US8388824B2 (en) *	2008-11-26	2013-03-05	Enthone Inc.	Method and composition for electrodeposition of copper in microelectronics with dipyridyl-based levelers
CN106065491B (zh) *	2016-07-15	2018-06-26	浙江海洋大学	一种非晶Ni-W-TiO2纳米复合镀层的制备方法
DE102019127658A1 (de) *	2019-10-15	2021-04-15	Hueck Rheinische Gmbh	Presswerkzeug und Verfahren zum Herstellen eines Presswerkzeugs
CN114163086B (zh) *	2021-12-21	2023-04-07	海南大学	一种重金属污染废水的处理装置及方法

1968
- 1968-06-17 US US3591350D patent/US3591350A/en not_active Expired - Lifetime
1969
- 1969-05-27 GB GB2668569A patent/GB1249002A/en not_active Expired
- 1969-06-10 SE SE821869A patent/SE357006B/xx unknown
- 1969-06-14 ES ES368367A patent/ES368367A1/es not_active Expired
- 1969-06-16 BE BE734627D patent/BE734627A/xx unknown
- 1969-06-16 FR FR6919919A patent/FR2011062A1/fr not_active Withdrawn
- 1969-06-17 CH CH924069A patent/CH537461A/de not_active IP Right Cessation
- 1969-06-17 JP JP4783969A patent/JPS4827580B1/ja active Pending
- 1969-06-17 NL NL6909222A patent/NL6909222A/xx unknown
- 1969-06-18 DE DE19691930820 patent/DE1930820A1/de active Pending

Also Published As

Publication number	Publication date
FR2011062A1 (de)	1970-02-27
GB1249002A (en)	1971-10-06
SE357006B (de)	1973-06-12
CH537461A (de)	1973-05-31
BE734627A (de)	1969-12-01
JPS4827580B1 (de)	1973-08-23
US3591350A (en)	1971-07-06
NL6909222A (de)	1969-12-19
DE1930820A1 (de)	1970-02-12

Publication	Publication Date	Title
ES368367A1 (es)	1971-05-01	Un procedimiento para preparar un deposito de niquel que esreceptivo para un deposito decorativo de un metal noble.
CA2224382C (en)	2005-07-19	An electroplating method of forming platings of nickel, cobalt, nickel alloys or cobalt alloys
US2849351A (en)	1958-08-26	Electroplating process
US3152971A (en)	1964-10-13	Electrodeposition of fine-grained lustrous nickel
US2635076A (en)	1953-04-14	Bright nickel plating
US3697391A (en)	1972-10-10	Electroplating processes and compositions
US3471271A (en)	1969-10-07	Electrodeposition of a micro-cracked corrosion resistant nickel-chromium plate
GB2101162A (en)	1983-01-12	Composition and process for electro-depositing composite nickel layers
US2879211A (en)	1959-03-24	Electroplating duplex nickel coatings
GB2106543A (en)	1983-04-13	Composite electroplated article and process
US3691027A (en)	1972-09-12	Method of producing corrosion resistant chromium plated articles
ES344368A1 (es)	1968-12-01	Un procedimiento para preparar una superficie de niquel.
US2654703A (en)	1953-10-06	Electrodeposition of bright nickel, cobalt, and alloys thereof
US4435254A (en)	1984-03-06	Bright nickel electroplating
US4102755A (en)	1978-07-25	Method of and electrolytic bath for the electrodeposition of semibright nickel and nickel-cobalt coatings upon a metal surface
US2781305A (en)	1957-02-12	Electrodeposition of nickel
US3595762A (en)	1971-07-27	Plating process
US3969399A (en)	1976-07-13	Electroplating processes and compositions
US2648628A (en)	1953-08-11	Electroplating of nickel
US3761363A (en)	1973-09-25	Microcracked nickel plating bath and process
US2694041A (en)	1954-11-09	Electrodeposition of nickel
US3502550A (en)	1970-03-24	Nickel electroplating electrolyte
US3679381A (en)	1972-07-25	Novel composite
US3474010A (en)	1969-10-21	Method of electroplating corrosion resistant coating
US2852449A (en)	1958-09-16	Electrodeposition of nickel