ES420372A1 - Method to prepare matrices to manufacture lattice or grid metal layers structures by electrolytic deposition - Google Patents

Method to prepare matrices to manufacture lattice or grid metal layers structures by electrolytic deposition

Info

Publication number
ES420372A1
ES420372A1 ES420372A ES420372A ES420372A1 ES 420372 A1 ES420372 A1 ES 420372A1 ES 420372 A ES420372 A ES 420372A ES 420372 A ES420372 A ES 420372A ES 420372 A1 ES420372 A1 ES 420372A1
Authority
ES
Spain
Prior art keywords
lattice
grid
electrolytic deposition
metal layers
grid metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES420372A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fritz Buser AG Maschinenfabrik
Original Assignee
Fritz Buser AG Maschinenfabrik
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fritz Buser AG Maschinenfabrik filed Critical Fritz Buser AG Maschinenfabrik
Publication of ES420372A1 publication Critical patent/ES420372A1/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/08Perforated or foraminous objects, e.g. sieves

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Cell Electrode Carriers And Collectors (AREA)

Abstract

A lattice or grid metal layer is made by providing a matrix carrier in which, contrary to the prior art, the areas to form the solid portions of the lattice are depressed into the matrix body and, thereafter, the depressions are filled in with a metal by electrolytic deposition, from which the grid structure can then be prepared, the regions or zones between the metal fillings, and to form those zones which will be the interstices of the grid or lattice, are covered by electrically non-conductive material. Grinding or polishing steps may also be used to form a uniform, smooth surface from which the grid or lattice structure can be, electrolytically, prepared.
ES420372A 1972-11-28 1973-11-08 Method to prepare matrices to manufacture lattice or grid metal layers structures by electrolytic deposition Expired ES420372A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1733072A CH591570A5 (en) 1972-11-28 1972-11-28

Publications (1)

Publication Number Publication Date
ES420372A1 true ES420372A1 (en) 1976-04-16

Family

ID=4424569

Family Applications (1)

Application Number Title Priority Date Filing Date
ES420372A Expired ES420372A1 (en) 1972-11-28 1973-11-08 Method to prepare matrices to manufacture lattice or grid metal layers structures by electrolytic deposition

Country Status (14)

Country Link
US (1) US3891514A (en)
JP (1) JPS5143981B2 (en)
AR (1) AR203828A1 (en)
AT (1) AT323496B (en)
BR (1) BR7309197D0 (en)
CA (1) CA1012483A (en)
CH (1) CH591570A5 (en)
ES (1) ES420372A1 (en)
FR (1) FR2208001B1 (en)
GB (1) GB1441597A (en)
IN (1) IN142202B (en)
IT (1) IT1001734B (en)
NL (1) NL158559B (en)
ZA (1) ZA738850B (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH611345A5 (en) * 1975-03-06 1979-05-31 Buser Ag Maschf Fritz
US4205428A (en) * 1978-02-23 1980-06-03 The United States Of America As Represented By The Secretary Of The Air Force Planar liquid crystal matrix array chip
US4301585A (en) * 1979-05-31 1981-11-24 Ricoh Co., Ltd. Method of forming plate having fine bores
US4745670A (en) * 1980-10-28 1988-05-24 Rockwell International Corporation Method for making chemical laser nozzle arrays
US4404060A (en) * 1981-05-08 1983-09-13 Siemens Aktiengesellschaft Method for producing insulating ring zones by galvanic and etch technologies at orifice areas of through-holes in a plate
JPS5835742A (en) * 1981-08-21 1983-03-02 Victor Co Of Japan Ltd Manufacture for stamper used for manufacture of information recording medium disc
DE3842610C1 (en) * 1988-12-17 1990-06-21 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe, De
DE3905679A1 (en) * 1989-02-24 1990-08-30 Heidelberger Druckmasch Ag METAL FILM AS A LIFT FOR ARCHING CYLINDERS AND / OR DRUMS ON ROTARY PRINTING MACHINES
US4937930A (en) * 1989-10-05 1990-07-03 International Business Machines Corporation Method for forming a defect-free surface on a porous ceramic substrate
DE4222856C1 (en) * 1992-07-11 1993-05-27 Buerkert Gmbh
NL1015535C2 (en) * 2000-06-27 2001-12-28 Stork Screens Bv Electroforming die, process for its manufacture, as well as use thereof and electroformed product.
US6591496B2 (en) * 2001-08-28 2003-07-15 3M Innovative Properties Company Method for making embedded electrical traces
US7160583B2 (en) * 2004-12-03 2007-01-09 3M Innovative Properties Company Microfabrication using patterned topography and self-assembled monolayers
US7871670B2 (en) * 2005-08-10 2011-01-18 3M Innovative Properties Company Microfabrication using replicated patterned topography and self-assembled monolayers
US8764996B2 (en) * 2006-10-18 2014-07-01 3M Innovative Properties Company Methods of patterning a material on polymeric substrates
US20080095988A1 (en) * 2006-10-18 2008-04-24 3M Innovative Properties Company Methods of patterning a deposit metal on a polymeric substrate
US7968804B2 (en) 2006-12-20 2011-06-28 3M Innovative Properties Company Methods of patterning a deposit metal on a substrate
JP6315353B2 (en) * 2013-12-27 2018-04-25 エルジー・ケム・リミテッド Conductive film and method for producing the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2123297A (en) * 1934-12-12 1938-07-12 Beynen Laurens Rynhart Process of preparing perforated metal articles
US2529086A (en) * 1946-04-30 1950-11-07 Rca Corp Method of making fine mesh screens
US2805986A (en) * 1952-01-11 1957-09-10 Harold B Law Method of making fine mesh screens
US2702270A (en) * 1952-06-07 1955-02-15 Rca Corp Method of making fine mesh metallic screens

Also Published As

Publication number Publication date
FR2208001A1 (en) 1974-06-21
IN142202B (en) 1977-06-11
FR2208001B1 (en) 1977-06-10
JPS5143981B2 (en) 1976-11-25
BR7309197D0 (en) 1974-08-29
IT1001734B (en) 1976-04-30
AR203828A1 (en) 1975-10-31
DE2353692B2 (en) 1977-05-18
NL7316250A (en) 1974-05-30
ZA738850B (en) 1974-10-30
JPS4987536A (en) 1974-08-21
AT323496B (en) 1975-07-10
CH591570A5 (en) 1977-09-30
US3891514A (en) 1975-06-24
CA1012483A (en) 1977-06-21
NL158559B (en) 1978-11-15
DE2353692A1 (en) 1974-05-30
GB1441597A (en) 1976-07-07

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