ES482450A1 - Procedimiento para la obtencion de compuestos de oxido de acilfosfina. - Google Patents
Procedimiento para la obtencion de compuestos de oxido de acilfosfina.Info
- Publication number
- ES482450A1 ES482450A1 ES482450A ES482450A ES482450A1 ES 482450 A1 ES482450 A1 ES 482450A1 ES 482450 A ES482450 A ES 482450A ES 482450 A ES482450 A ES 482450A ES 482450 A1 ES482450 A1 ES 482450A1
- Authority
- ES
- Spain
- Prior art keywords
- carbon atoms
- see diagramm
- alkoxy
- alkyl
- radical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000001875 compounds Chemical class 0.000 title abstract 3
- 125000004432 carbon atom Chemical group C* 0.000 abstract 5
- 125000000217 alkyl group Chemical group 0.000 abstract 4
- 125000003545 alkoxy group Chemical group 0.000 abstract 3
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 125000004104 aryloxy group Chemical group 0.000 abstract 1
- -1 beta-carboxyethyl Chemical group 0.000 abstract 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 abstract 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 125000001624 naphthyl group Chemical group 0.000 abstract 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 1
- 125000004437 phosphorous atom Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/30—Phosphinic acids [R2P(=O)(OH)]; Thiophosphinic acids ; [R2P(=X1)(X2H) (X1, X2 are each independently O, S or Se)]
- C07F9/32—Esters thereof
- C07F9/3205—Esters thereof the acid moiety containing a substituent or a structure which is considered as characteristic
- C07F9/3247—Esters of acids containing the structure -C(=X)-P(=X)(R)(XH) or NC-P(=X)(R)(XH), (X = O, S, Se)
- C07F9/3252—Esters of acids containing the structure -C(=X)-P(=X)(R)(XH) or NC-P(=X)(R)(XH), (X = O, S, Se) containing the structure -C(=X)-P(=X)(R)(XR), (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
- C07F9/40—Esters thereof
- C07F9/4003—Esters thereof the acid moiety containing a substituent or a structure which is considered as characteristic
- C07F9/4062—Esters of acids containing the structure -C(=X)-P(=X)(XR)2 or NC-P(=X)(XR)2, (X = O, S, Se)
- C07F9/4065—Esters of acids containing the structure -C(=X)-P(=X)(XR)2, (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/46—Phosphinous acids [R2POH], [R2P(= O)H]: Thiophosphinous acids including[R2PSH]; [R2P(=S)H]; Aminophosphines [R2PNH2]; Derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/48—Phosphonous acids [RP(OH)2] including [RHP(=O)(OH)]; Thiophosphonous acids including [RP(SH)2], [RHP(=S)(SH)]; Derivatives thereof
- C07F9/4808—Phosphonous acids [RP(OH)2] including [RHP(=O)(OH)]; Thiophosphonous acids including [RP(SH)2], [RHP(=S)(SH)]; Derivatives thereof the acid moiety containing a substituent or structure which is considered as characteristic
- C07F9/4841—Aromatic acids or derivatives (P-C aromatic linkage)
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Paints Or Removers (AREA)
Abstract
Procedimiento para la obtención de compuestos de óxido de acilfosfina de fórmula general **(Fórmula-01)** donde R1 significa un resto alquilo de cadena recta o ramificada, con 1 hasta 6 átomos de carbono, un resto ciclohexilo, ciclopentilo, arilo, arilo sustituido por halógeno, alquilo o alcoxi, un resto heterocíclico de cinco o de seis miembros, conteniendo S ó N; R2 tiene el significado de R1, donde R1 y R2 pueden ser iguales o diferentes entre si, o R2 significa un resto alcoxi con 1 hasta 6 átomos de carbono, un resto ariloxi o un resto arialcoxi, o R1 y R2 están unidos entre si formando un anillo; R3 significa un resto alquilo de cadena recta o ramificada con 2 hasta 18 átomos de carbono, un resto cicloalifático conteniendo 3 hasta 12 átomos de carbono, un resto fenilo o naftilo sustituido por alquilo, alcoxi o tioalcoxi, un resto heterocíclico de cinco o de seis miembros, conteniendo S ó N, donde los restos R3 en caso dado llevan ulteriores grupos funcionales, o la agrupación: **(Fórmula-02)** donde R1 y R2 tienen el significado arriba indicado y X significa un resto fenilo o un resto alifático o cicloalifático divalente, conteniendo 2 hasta 6 átomos de carbono, y donde, en caso dado, como mínimo uno de los restos R1 hasta R3 está olefínicamente insaturado, caracterizado porque haluros de ácido, de la fórmula general **(Fórmula-03)** donde X significa cloro o bromo y R3 tiene el significado indicado más arriba, se hace reaccionar con una fosfina de fórmula general **(Fórmula-04)** donde R1 u R2 tiene el significado arriba indicado y R4 significa un resto alquilo de cadena recta o ramificada con 1 hasta 6 átomos de carbono, o un resto cicloalquilo con 5 ó 6 átomos de carbono, a temperaturas entre -30 y +130ºC, en caso dado en presencia de un disolvente orgánico inerte.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19782830927 DE2830927A1 (de) | 1978-07-14 | 1978-07-14 | Acylphosphinoxidverbindungen und ihre verwendung |
| DE19792909992 DE2909992A1 (de) | 1979-03-14 | 1979-03-14 | Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen |
| DE19792909994 DE2909994A1 (de) | 1979-03-14 | 1979-03-14 | Acylphosphinoxidverbindungen, ihre herstellung und verwendung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES482450A1 true ES482450A1 (es) | 1980-04-01 |
Family
ID=27187601
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES482450A Expired ES482450A1 (es) | 1978-07-14 | 1979-07-12 | Procedimiento para la obtencion de compuestos de oxido de acilfosfina. |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0007508B1 (es) |
| DE (1) | DE2965566D1 (es) |
| DK (1) | DK171353B1 (es) |
| ES (1) | ES482450A1 (es) |
| FI (1) | FI68241C (es) |
| NO (1) | NO160215C (es) |
Families Citing this family (106)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3020092A1 (de) * | 1980-05-27 | 1981-12-10 | Basf Ag, 6700 Ludwigshafen | Acylphosphinverbindungen und ihre verwendung |
| DE3023486A1 (de) * | 1980-06-24 | 1982-01-07 | Bayer Ag, 5090 Leverkusen | Photopolymerisierbare mischungen mit aroylphosphonsaeureestern als photoinitiatoren |
| DE3114341A1 (de) * | 1981-04-09 | 1982-11-11 | Basf Ag, 6700 Ludwigshafen | Acylphosphinverbindungen, ihre herstellung und verwendung |
| DE3133419A1 (de) * | 1981-08-24 | 1983-03-10 | Basf Ag, 6700 Ludwigshafen | Acylphosphinoxidverbindungen und ihre verwendung |
| DE3236026A1 (de) * | 1982-09-29 | 1984-03-29 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbare massen und ihre verwendung |
| DE3424182A1 (de) * | 1984-06-30 | 1986-01-09 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung von chlor-phenyl-phosphanen |
| JP2653458B2 (ja) * | 1988-03-26 | 1997-09-17 | 旭化成工業株式会社 | 凸版印刷版用感光性樹脂組成物 |
| DE59010615D1 (de) * | 1989-08-04 | 1997-02-06 | Ciba Geigy Ag | Mono- und Diacylphosphinoxide |
| DE4033215A1 (de) * | 1990-10-19 | 1992-04-23 | Hoechst Ag | Acyl-(2'-hydroxybiphenyl-2-yl)-phosphinsaeuresalze, ihre herstellung und verwendung |
| DE59107840D1 (de) * | 1990-11-21 | 1996-06-27 | Ciba Geigy Ag | Silylierte Acylphosphinoxide |
| DE4230555A1 (de) * | 1992-09-12 | 1994-03-17 | Basf Ag | Verfahren zur Herstellung von alpha-Carbonylphosphinoxiden |
| EP0600373A1 (de) * | 1992-12-03 | 1994-06-08 | Hoechst Aktiengesellschaft | Arylphosphonsäurealkyl-arylester, Verfahren zu ihrer Herstellung und ihre Verwendung |
| DE4240964A1 (de) * | 1992-12-05 | 1994-06-09 | Basf Ag | Arenbisphosphinoxide |
| DE4302123A1 (de) * | 1993-01-27 | 1994-07-28 | Herberts Gmbh | Verfahren zum Bedrucken von Glashohlkörpern |
| DE19502911C2 (de) * | 1995-01-31 | 1996-12-05 | Hoechst Ag | Verfahren zur Herstellung von Arylphosphinigsäurealkylestern |
| DE19502913C1 (de) * | 1995-01-31 | 1996-11-21 | Hoechst Ag | Verfahren zur Herstellung von Arylphosphinigsäurealkylestern |
| EP0725072A1 (de) * | 1995-01-31 | 1996-08-07 | Hoechst Aktiengesellschaft | Verfahren zur Herstellung von Arylphosphinigsäurealkylestern |
| EP0825201B2 (en) † | 1996-08-23 | 2006-11-29 | Showa Denko Kabushiki Kaisha | Photocurable composition and curing process therefor |
| SG53043A1 (en) * | 1996-08-28 | 1998-09-28 | Ciba Geigy Ag | Molecular complex compounds as photoinitiators |
| DE19650562A1 (de) | 1996-12-05 | 1998-06-10 | Basf Ag | Photoinitiatorgemische, enthaltend Acylphosphinoxide und Benzophenonderivate |
| AU3029599A (en) | 1998-03-13 | 1999-10-11 | Akzo Nobel N.V. | Non-aqueous coating composition based on an oxidatively drying alkyd resin and aphoto-initiator |
| DE19812859A1 (de) * | 1998-03-24 | 1999-09-30 | Basf Ag | Photoinitiatorgemische |
| DE19961342B4 (de) | 1999-12-17 | 2004-02-19 | 3M Espe Ag | Radikalisch härtbare Urethanpräpolymere und deren Verwendung |
| DE10058830B4 (de) | 2000-11-27 | 2005-01-27 | 3M Espe Ag | Verwendung von verzweigten Polysäuren in Dentalmassen und Dentalmassen enthaltend verzweigte Polysäuren |
| DE10124028B4 (de) | 2001-05-16 | 2010-02-18 | 3M Espe Ag | Selbstadhäsive Dentalmaterialien |
| DE10206117A1 (de) | 2002-02-13 | 2003-08-14 | Basf Ag | Acyl- und Bisacylphosphinderivate |
| KR20050009744A (ko) * | 2002-06-11 | 2005-01-25 | 시바 스페셜티 케미칼스 홀딩 인크. | 모노- 및 비스아실포스핀 옥사이드의 다량체 형태 |
| DE10241299A1 (de) | 2002-09-04 | 2004-03-25 | Basf Ag | Strahlungshärtbare Polyurethane mit verkappten Aminogrupppen |
| DE10244684A1 (de) | 2002-09-24 | 2004-04-01 | Basf Ag | Verfahren zur Herstellung von Acylphosphinoxiden |
| DE10315671A1 (de) | 2003-04-04 | 2004-10-14 | Basf Ag | Verfahren zur Herstellung von Acylphosphinoxid-Feststoffen |
| DE10318698A1 (de) * | 2003-04-24 | 2004-11-18 | Basf Ag | Verfahren zur Herstellung von Acylphosphinen |
| DE10348463A1 (de) | 2003-10-14 | 2005-05-25 | Basf Ag | Hyperverzweigte Polyester mit ethylenisch ungesättigten Gruppen |
| DE102004063102A1 (de) | 2004-12-22 | 2006-07-13 | Basf Ag | Strahlungshärtbare Verbindungen |
| US20080260959A1 (en) | 2005-02-10 | 2008-10-23 | Basf Aktiengesellschaft Patents, Trademarks And Licences | Use of Dithiophosphinic Acid and/or Its Salts for Producing Anti-Corrosion Coatings that are Devoid of Chrome |
| JP5769359B2 (ja) | 2005-02-24 | 2015-08-26 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | 放射線硬化な水性ポリウレタン分散液 |
| DE102005010109A1 (de) | 2005-03-02 | 2006-09-07 | Basf Ag | Modifizierte Polyolefinwachse |
| JPWO2007018287A1 (ja) * | 2005-08-11 | 2009-02-19 | 協和発酵ケミカル株式会社 | 樹脂組成物 |
| DE102005057683A1 (de) | 2005-12-01 | 2007-06-06 | Basf Ag | Strahlungshärtbare wasserelmulgierbare Polyisocyanate |
| CN101616946B (zh) | 2007-02-15 | 2012-07-18 | 巴斯夫欧洲公司 | 聚氨酯分散体及其制备和用途 |
| DE102008002008A1 (de) | 2007-06-04 | 2008-12-11 | Basf Se | Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate |
| DE102007026196A1 (de) | 2007-06-04 | 2008-12-11 | Basf Se | Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate |
| DE102008041654A1 (de) | 2007-08-31 | 2009-03-05 | Basf Se | Neue Beschichtungsmittel |
| DE102010001956A1 (de) | 2009-02-17 | 2010-08-19 | Basf Se | Verfahren zur Herstellung wasseremulgierbarer Polyurethanacrylate |
| DE102010003308A1 (de) | 2009-03-31 | 2011-01-13 | Basf Se | Strahlungshärtbare wasseremulgierbare Polyurethan(meth)acrylate |
| DE102009016025B4 (de) | 2009-04-02 | 2014-12-11 | Voco Gmbh | Kunststoffmodifizierter Glasionomerzement, seine Verwendung sowie Verfahren zu seiner Herstellung |
| EP2350154B1 (de) | 2009-08-05 | 2012-09-19 | Basf Se | (meth)acrylierte melamin-formaldehyd-harze |
| DE102010044206A1 (de) | 2009-11-25 | 2011-05-26 | Basf Se | Verfahren zur Herstellung von strahlungshärtbaren (Meth)Acrylaten |
| DE102010044204A1 (de) | 2009-11-25 | 2011-05-26 | Basf Se | Verfahren zur Herstellung von strahlungshärtbaren (Meth)Acrylaten |
| DE102010003881A1 (de) | 2010-04-12 | 2011-10-13 | Voco Gmbh | Dentale Abdeckmasse |
| DE102010003883A1 (de) | 2010-04-12 | 2011-10-13 | Voco Gmbh | Lichthärtbares Kompositmaterial |
| DE102010003884A1 (de) | 2010-04-12 | 2011-10-13 | Voco Gmbh | Dualhärtende, mehrkomponentige dentale Zusammensetzung |
| DE102010026490A1 (de) | 2010-07-07 | 2012-01-12 | Basf Se | Verfahren zur Herstellung von feinstrukturierten Oberflächen |
| DE102010046697A1 (de) | 2010-09-28 | 2012-03-29 | Kettenbach Gmbh & Co. Kg | Polymerisierbares Dentalmaterial mit Reaktiv-Pastenbildner, gehärtetes Dentalmaterial und deren Verwendung |
| US8697769B2 (en) | 2010-09-30 | 2014-04-15 | Voco Gmbh | Lacquer composition comprising a monomer with a polyalicyclic structure element |
| US8915736B2 (en) | 2010-09-30 | 2014-12-23 | Voco Gmbh | Composition comprising a monomer with a polyalicyclic structure element for filling and/or sealing a root canal |
| EP2436365B1 (de) | 2010-09-30 | 2017-03-08 | VOCO GmbH | Kompositmaterial umfassend ein Monomer mit einem polyalicyclischen Strukturelement |
| EP2436668B1 (de) | 2010-09-30 | 2012-09-12 | VOCO GmbH | Polymerisierbare Verbindungen umfassend ein polyalicyclisches Strukturelement |
| US8669302B2 (en) | 2010-09-30 | 2014-03-11 | Voco Gmbh | Composite material comprising a monomer with a polyalicyclic structure element as a sealing material |
| EP2450025B1 (de) | 2010-11-08 | 2012-11-28 | VOCO GmbH | Polymerisierbare Phosphorsäurederivate umfassend ein polyalicyclisches Strukturelement |
| DE102011003289A1 (de) | 2011-01-27 | 2012-08-02 | Voco Gmbh | Dentale provisorische Suprakonstruktionen sowie Materialien zu ihrer Herstellung und entsprechende Verfahren |
| CN103608375B (zh) | 2011-06-14 | 2015-09-09 | 巴斯夫欧洲公司 | 可辐射固化聚氨酯水分散体 |
| DE102012001978A1 (de) | 2012-02-02 | 2013-08-08 | Voco Gmbh | Dentale Kompositmaterialien enthaltend tricyclische Weichmacher |
| DE102012001979A1 (de) | 2012-02-02 | 2013-08-08 | Voco Gmbh | Härtbares Gemisch umfassend Weichmacher mit einem polyalicyclischen Strukturelement zur Anwendung bei der Herstellung dentaler Werkstoffe |
| CN104204021B (zh) | 2012-03-19 | 2018-04-20 | 巴斯夫欧洲公司 | 可辐射固化的含水分散体 |
| US9193888B2 (en) | 2012-03-19 | 2015-11-24 | Basf Se | Radiation-curable aqueous dispersions |
| EP2649981B1 (de) | 2012-04-11 | 2018-11-21 | Ivoclar Vivadent AG | Polymerisierbare Zusammensetzungen mit hoher Polymerisationstiefe |
| US9296907B2 (en) | 2012-05-30 | 2016-03-29 | Basf Se | Radiation-curable compounds |
| AU2013269835B2 (en) | 2012-05-30 | 2016-02-04 | Basf Se | Radiation-curable compounds |
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| KR20150036655A (ko) | 2012-07-20 | 2015-04-07 | 바스프 에스이 | 급속-건조, 방사선-경화성 코팅 화합물 |
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Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE125488C (es) * | ||||
| DE1010965B (de) * | 1956-05-08 | 1957-06-27 | Henkel & Cie Gmbh | Verfahren zur Herstellung von sauren Estern der Acylphosphonsaeuren bzw. ihrer Salze |
| CH471535A (de) * | 1964-12-15 | 1969-04-30 | Ciba Geigy | Schädlingsbekämpfungsmittel |
| CH573461A5 (en) * | 1971-01-05 | 1976-03-15 | Hoechst Ag | Photochemically polymerisable polyester moulding composn |
| US3668093A (en) * | 1971-05-06 | 1972-06-06 | Du Pont | Photoinitiation of vinyl polymerization by triaroylphosphines |
| DE2556830A1 (de) * | 1974-12-24 | 1976-07-08 | Ciba Geigy Ag | Neue phosphonate |
-
1979
- 1979-07-09 EP EP79102347A patent/EP0007508B1/de not_active Expired
- 1979-07-09 DE DE7979102347T patent/DE2965566D1/de not_active Expired
- 1979-07-12 FI FI792196A patent/FI68241C/fi not_active IP Right Cessation
- 1979-07-12 ES ES482450A patent/ES482450A1/es not_active Expired
- 1979-07-13 DK DK295979A patent/DK171353B1/da not_active IP Right Cessation
-
1984
- 1984-03-16 NO NO84841029A patent/NO160215C/no unknown
Also Published As
| Publication number | Publication date |
|---|---|
| NO160215C (no) | 1989-03-22 |
| EP0007508B1 (de) | 1983-06-01 |
| FI792196A7 (fi) | 1980-01-15 |
| DK171353B1 (da) | 1996-09-16 |
| EP0007508A3 (en) | 1980-10-29 |
| NO841029L (no) | 1980-01-15 |
| FI68241C (fi) | 1985-08-12 |
| EP0007508A2 (de) | 1980-02-06 |
| DK295979A (da) | 1980-01-15 |
| FI68241B (fi) | 1985-04-30 |
| NO160215B (no) | 1988-12-12 |
| DE2965566D1 (en) | 1983-07-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FD1A | Patent lapsed |
Effective date: 20000403 |