ES498475A0 - Procedimiento para la fabricacion de compuestos sensibles a la radiacion, para placas litograficas. - Google Patents

Procedimiento para la fabricacion de compuestos sensibles a la radiacion, para placas litograficas.

Info

Publication number
ES498475A0
ES498475A0 ES498475A ES498475A ES498475A0 ES 498475 A0 ES498475 A0 ES 498475A0 ES 498475 A ES498475 A ES 498475A ES 498475 A ES498475 A ES 498475A ES 498475 A0 ES498475 A0 ES 498475A0
Authority
ES
Spain
Prior art keywords
radiation sensitive
compound
groups
manufacture
procedure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES498475A
Other languages
English (en)
Other versions
ES8205758A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vickers Ltd
Original Assignee
Vickers Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10509907&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES498475(A0) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Vickers Ltd filed Critical Vickers Ltd
Publication of ES8205758A1 publication Critical patent/ES8205758A1/es
Publication of ES498475A0 publication Critical patent/ES498475A0/es
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pyridine Compounds (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
  • Light Receiving Elements (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Radar Systems Or Details Thereof (AREA)
  • Radio Relay Systems (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Prostheses (AREA)
  • Measuring Volume Flow (AREA)
  • Electroluminescent Light Sources (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
ES498475A 1979-12-18 1980-12-18 Procedimiento para la fabricacion de compuestos sensibles a la radiacion, para placas litograficas. Granted ES498475A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB7943459 1979-12-18

Publications (2)

Publication Number Publication Date
ES8205758A1 ES8205758A1 (es) 1982-08-01
ES498475A0 true ES498475A0 (es) 1982-08-01

Family

ID=10509907

Family Applications (1)

Application Number Title Priority Date Filing Date
ES498475A Granted ES498475A0 (es) 1979-12-18 1980-12-18 Procedimiento para la fabricacion de compuestos sensibles a la radiacion, para placas litograficas.

Country Status (14)

Country Link
US (1) US4595648A (es)
EP (1) EP0030862B2 (es)
AT (1) ATE9850T1 (es)
AU (1) AU546719B2 (es)
CA (1) CA1154759A (es)
DE (1) DE3069429D1 (es)
DK (1) DK537680A (es)
ES (1) ES498475A0 (es)
FI (1) FI71845C (es)
GB (1) GB2069997B (es)
IE (1) IE51734B1 (es)
NO (1) NO161671C (es)
NZ (1) NZ195832A (es)
ZA (1) ZA807875B (es)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4670406A (en) * 1984-01-06 1987-06-02 Becton Dickinson And Company Tracers for use in assays
GB8603405D0 (en) * 1986-02-12 1986-03-19 Vickers Plc Radiation sensitive material
FR2618429A1 (fr) * 1987-07-24 1989-01-27 Centre Nat Rech Scient Nouveaux reactifs bifonctionnels photoactivables, leur preparation et leur application
US4791154A (en) * 1987-11-30 1988-12-13 Shell Oil Company Epoxy resin composition
GB8918161D0 (en) * 1989-08-09 1989-09-20 Du Pont Improvements in or relating to radiation sensitive compounds
US5206349A (en) * 1990-08-10 1993-04-27 Toyo Gosei Kogy Co., Ltd. Aromatic diazo compounds and photosensitive compositions using the same
US5466789A (en) * 1992-01-21 1995-11-14 Du Pont (Uk) Limited Polyunsaturated diazonium compounds
GB2263906B (en) * 1992-01-21 1995-11-08 Du Pont Improvements in or relating to polyunsaturated diazonium compounds
US5534623A (en) * 1993-01-21 1996-07-09 Du Pont (Uk) Limited Process for preparing a polyunsaturated diazonium compounds
US5846685A (en) * 1997-01-31 1998-12-08 Kodak Polychrome Graphics, Llc Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE596731C (de) * 1932-05-23 1934-05-09 Kalle & Co Akt Ges Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
CH563600A5 (es) * 1970-08-19 1975-06-30 Ciba Geigy Ag
CH582899A5 (es) * 1973-03-28 1976-12-15 Multitec Ag
JPS6049301B2 (ja) * 1977-12-06 1985-11-01 富士写真フイルム株式会社 画像形成方法

Also Published As

Publication number Publication date
FI803883L (fi) 1981-06-19
ES8205758A1 (es) 1982-08-01
NO803838L (no) 1981-06-19
ATE9850T1 (de) 1984-10-15
EP0030862A2 (en) 1981-06-24
CA1154759A (en) 1983-10-04
NO161671C (no) 1989-09-13
NO161671B (no) 1989-06-05
ZA807875B (en) 1982-01-27
IE802665L (en) 1981-06-18
NZ195832A (en) 1983-06-17
IE51734B1 (en) 1987-03-18
GB2069997B (en) 1984-07-25
EP0030862A3 (en) 1982-02-10
EP0030862B2 (en) 1987-02-04
AU6548080A (en) 1981-06-25
AU546719B2 (en) 1985-09-19
DK537680A (da) 1981-06-19
FI71845C (fi) 1987-02-09
FI71845B (fi) 1986-10-31
GB2069997A (en) 1981-09-03
DE3069429D1 (en) 1984-11-15
US4595648A (en) 1986-06-17
EP0030862B1 (en) 1984-10-10

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 20011110