ES8100162A1 - Perfeccionamientos en aparatos para tratar la superficie de objetos cilindricos en un numero de etapas en secuencia - Google Patents

Perfeccionamientos en aparatos para tratar la superficie de objetos cilindricos en un numero de etapas en secuencia

Info

Publication number
ES8100162A1
ES8100162A1 ES488414A ES488414A ES8100162A1 ES 8100162 A1 ES8100162 A1 ES 8100162A1 ES 488414 A ES488414 A ES 488414A ES 488414 A ES488414 A ES 488414A ES 8100162 A1 ES8100162 A1 ES 8100162A1
Authority
ES
Spain
Prior art keywords
treating
unit
cylindrical object
cylindrical objects
enclosure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES488414A
Other languages
English (en)
Other versions
ES488414A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Uniroyal Ltd Great Britain
Original Assignee
Uniroyal Ltd Great Britain
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uniroyal Ltd Great Britain filed Critical Uniroyal Ltd Great Britain
Publication of ES488414A0 publication Critical patent/ES488414A0/es
Publication of ES8100162A1 publication Critical patent/ES8100162A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B11/00—Machines or apparatus for drying solid materials or objects with movement which is non-progressive
    • F26B11/18—Machines or apparatus for drying solid materials or objects with movement which is non-progressive on or in moving dishes, trays, pans, or other mainly-open receptacles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Coating Apparatus (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

DISPOSITIVO PARA TRATAR LA SUPERFICIE DE OBJETOS CILINDRICOS EN ETAPAS SUCESIVAS. CONSTA DE UN RECINTO, MEDIOS DE MONTAJE EN EL RECINTO PARA ACOPLAMIENTO DESMONTABLE EN LOS EXTREMOS OPUESTOS DE UN OBJETO CILINDRICO, MEDIOS DE TRANSMISION PARA PRODUCIR LA ROTACION DE LOS MEDIOS DE MONTAJE PARA GIRO SOBRE SU EJE GEOMETRICO, PLURALIDAD DE DISPOSITIVO DE TRATAMIENTO DIRIGIDOS HACIA EL LUGAR QUE OCUPA EL OBJETO MONTADO Y MEDIOS QUE CONTROLAN EL FUNCIONAMIENTO DE LOS DISPOSITIVOS DE TRATAMIENTO EN ETAPAS SUCESIVAS.
ES488414A 1979-02-09 1980-02-08 Perfeccionamientos en aparatos para tratar la superficie de objetos cilindricos en un numero de etapas en secuencia Expired ES8100162A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB7904705 1979-02-09

Publications (2)

Publication Number Publication Date
ES488414A0 ES488414A0 (es) 1980-11-01
ES8100162A1 true ES8100162A1 (es) 1980-11-01

Family

ID=10503105

Family Applications (1)

Application Number Title Priority Date Filing Date
ES488414A Expired ES8100162A1 (es) 1979-02-09 1980-02-08 Perfeccionamientos en aparatos para tratar la superficie de objetos cilindricos en un numero de etapas en secuencia

Country Status (7)

Country Link
EP (1) EP0017316A3 (es)
JP (1) JPS55133051A (es)
AU (1) AU5528780A (es)
BR (1) BR8000790A (es)
CA (1) CA1129716A (es)
ES (1) ES8100162A1 (es)
YU (1) YU32280A (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7014284B2 (en) 2003-01-16 2006-03-21 Morton William Bill Ammunition having surface indicia and method of manufacture
CN109099667B (zh) * 2018-08-17 2024-09-06 齐齐哈尔市恒泰农业科技有限公司 一种低成本生物质燃料烘干装置
CN112460962B (zh) * 2020-11-24 2022-03-22 常熟市恒丰轧辊有限公司 一种轧轮生产用干燥装置
CN112944856B (zh) * 2021-04-18 2022-08-16 黄韶平 试剂盒烘干装置
CN116659200B (zh) * 2023-07-12 2025-07-15 上海添涌科技有限公司 一种双桶干燥装置
CN117847995B (zh) * 2024-03-07 2024-05-14 山西华世中瑞新材料有限公司 一种用于加固材料的干燥箱及干燥方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB167298A (en) * 1920-05-06 1921-08-08 Henry Charles Lucas Improvements in and relating to etching processes and apparatus for use therein
US1463362A (en) * 1921-05-28 1923-07-31 Vacuum Oil Company Coating machine
US2602024A (en) * 1950-09-13 1952-07-01 Ind Gravure Company Roller etching machine
GB716790A (en) * 1950-09-29 1954-10-13 Rheem Mfg Co Improved method and apparatus for processing surfaces of tubular containers and other articles
US3559558A (en) * 1968-08-29 1971-02-02 Du Pont Rotary processing apparatus for photolithographic plates
DE2050202C2 (de) * 1970-10-13 1979-09-27 Vereinigte Papierwerke Schickedanz & Co, 8500 Nuernberg Verfahren zum Herstellen von kunststoffumhüllten Tampons
JPS5521339B2 (es) * 1972-03-07 1980-06-09
US3727536A (en) * 1973-01-03 1973-04-17 Dyna Flex Corp Exposed printing plate washer
DE2603082A1 (de) * 1976-01-28 1977-08-11 Basf Ag Tragzylinder fuer photopolymer- druckplatten in rundbelichtern
NL7608241A (nl) * 1976-07-23 1978-01-25 Stork Brabant Bv Werkwijze en inrichting voor het bekleden van een dunwandige geperforeerde cilinder, alsmede een losneembaar hulpstuk toe te passen in deze inrichting.
JPS5422205A (en) * 1977-07-18 1979-02-20 Asahi Chemical Ind Method and device for washing photosensitive resin plate

Also Published As

Publication number Publication date
BR8000790A (pt) 1980-10-29
EP0017316A2 (en) 1980-10-15
CA1129716A (en) 1982-08-17
EP0017316A3 (en) 1981-05-13
JPS55133051A (en) 1980-10-16
ES488414A0 (es) 1980-11-01
YU32280A (en) 1983-01-21
AU5528780A (en) 1980-08-14

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 20001009