ES8305947A1 - Procedimiento para la obtencion de placas en relieve. - Google Patents

Procedimiento para la obtencion de placas en relieve.

Info

Publication number
ES8305947A1
ES8305947A1 ES514882A ES514882A ES8305947A1 ES 8305947 A1 ES8305947 A1 ES 8305947A1 ES 514882 A ES514882 A ES 514882A ES 514882 A ES514882 A ES 514882A ES 8305947 A1 ES8305947 A1 ES 8305947A1
Authority
ES
Spain
Prior art keywords
recording material
production
photopolymerisable
photopolymerizable
relief forms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES514882A
Other languages
English (en)
Other versions
ES514882A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6139099&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES8305947(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by BASF SE filed Critical BASF SE
Publication of ES8305947A1 publication Critical patent/ES8305947A1/es
Publication of ES514882A0 publication Critical patent/ES514882A0/es
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C08F299/065—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes from polyurethanes with side or terminal unsaturations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/6705—Unsaturated polymers not provided for in the groups C08G18/671, C08G18/6795, C08G18/68 or C08G18/69
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/675—Low-molecular-weight compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)

Abstract

PROCEDIMIENTO PARA LA OBTENCION DE PLACAS DE RELIEVE. SE USA UN MATERIAL DE GRABACION FOTOPOLIMERIZABLE QUE COMPRENDE UN COMPUESTO ETILENICAMENTE INSATURADO FOTOPOLIMERIZABLE DE BAJO PESO MOLECULAR, UN INICIADOR DE POLIMERIZACION, UN POLIURETANO CON ENLACES DOBLES SUSCEPTIBLES A LA FOTOPOLIMERIZACION Y EVENTUALMENTE OTROS ADITIVOS CONVENCIONALES. LA CAPA FOTOPOLIMERIZABLE DEL MATERIAL DE GRABACION SE EXPONE A TRAVES DE UNA IMAGEN Y SE ELIMINAN LOS COMPONENTES SIN EXPONER DE LA CAPA FOTOPOLIMERIZABLE.
ES514882A 1981-08-11 1982-08-10 Procedimiento para la obtencion de placas en relieve. Granted ES514882A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813131766 DE3131766A1 (de) 1981-08-11 1981-08-11 Photopolymerisierbares aufzeichnungsmaterial und verfahren zur herstellung von reliefformen mittels dieses aufzeichnungsmaterials

Publications (2)

Publication Number Publication Date
ES8305947A1 true ES8305947A1 (es) 1983-04-16
ES514882A0 ES514882A0 (es) 1983-04-16

Family

ID=6139099

Family Applications (1)

Application Number Title Priority Date Filing Date
ES514882A Granted ES514882A0 (es) 1981-08-11 1982-08-10 Procedimiento para la obtencion de placas en relieve.

Country Status (6)

Country Link
US (1) US4590144A (es)
EP (1) EP0072918B1 (es)
JP (1) JPS5840546A (es)
CA (1) CA1186171A (es)
DE (2) DE3131766A1 (es)
ES (1) ES514882A0 (es)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4608331A (en) * 1984-11-16 1986-08-26 Witco Chemical Corporation Photosensitive plates with diazonium composition layer and polyurethane photopolymer with unsaturation in side chain overlayer
US4695604A (en) * 1985-01-16 1987-09-22 Morton Thiokol, Inc. Electron beam curable polyuethane polymers for magnetic tape applications
US4952478A (en) * 1986-12-02 1990-08-28 Canon Kabushiki Kaisha Transfer recording medium comprising a layer changing its transferability when provided with light and heat
JPH0727208B2 (ja) * 1987-04-20 1995-03-29 富士写真フイルム株式会社 感光性組成物
US5204222A (en) * 1988-07-16 1993-04-20 Hoechst Aktiengesellschaft Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates
DE3841025A1 (de) * 1988-12-06 1990-06-07 Hoechst Ag Durch strahlung polymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US6040116A (en) * 1989-03-17 2000-03-21 Basf Aktiengesellschaft Photosensitive recording element having a recording layer and a top layer possessing different solubility properties, and its development in one operation
CA2045292A1 (en) * 1990-07-26 1992-01-27 John A. Martens Flexographic printing plate compositions
US5215859A (en) * 1990-07-26 1993-06-01 Minnesota Mining And Manufacturing Company Backside ionizing irradiation in a flexographic printing plate process
US5175072A (en) * 1990-07-26 1992-12-29 Minnesota Mining And Manufacturing Company Flexographic printing plate process
US5187044A (en) * 1991-05-14 1993-02-16 Minnesota Mining And Manufacturing Company Flexographic printing plate
DE4138309C2 (de) * 1991-11-21 1995-02-09 Eos Electro Optical Syst Durch Einwirkung elektromagnetischer Strahlung vernetzbares Kunststoffmaterial
US6265132B1 (en) 1999-10-20 2001-07-24 Rohm And Haas Company Photoimageable composition containing flexible oligomer
US7077985B2 (en) * 2000-05-30 2006-07-18 Vision-Ease Lens Injection molding of lens
US20030118816A1 (en) * 2001-12-21 2003-06-26 Polanco Braulio A. High loft low density nonwoven webs of crimped filaments and methods of making same
US7858001B2 (en) * 2003-09-09 2010-12-28 Insight Equity A.P.X., L.P. Photochromic lens
ES2544317T3 (es) 2003-09-09 2015-08-28 Insight Equity A.P.X., Lp Laminado de poliuretano fotocrómico
EP1874984A2 (en) 2005-03-04 2008-01-09 Vision-Ease Lens, Inc. Forming method for polymeric laminated wafers comprising different film materials
US20080317957A1 (en) * 2005-12-20 2008-12-25 Gerardus Cornelis Overbeek Radiation Curable Composition
US9081130B1 (en) 2013-01-09 2015-07-14 Insight Equity A.P.X., Lp Photochromic polyurethane laminate
US9205638B2 (en) * 2013-02-05 2015-12-08 Eastman Kodak Company Method of forming printed patterns
US9440419B2 (en) 2013-03-15 2016-09-13 Vision Ease, Lp Photochromic polyurethane laminate
EP3046778B2 (de) * 2013-09-18 2022-08-17 Basf Se Thermotransferfolien für die trockenlackierung von oberflächen
US12448476B2 (en) * 2019-10-23 2025-10-21 Arkema France Multi(meth)acrylate-functionalized oligomers and methods of preparing and using such oligomers
DE102022133906A1 (de) * 2022-12-19 2024-06-20 Tesa Se Verfahren zur Herstellung einer vernetzten Klebemasse
DE102022133908A1 (de) * 2022-12-19 2024-06-20 Tesa Se Verfahren zur Herstellung einer vernetzten Klebemasse

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2948611A (en) * 1957-10-30 1960-08-09 Du Pont Photopolymerizable compositions, elements, and processes
JPS5034964B1 (es) * 1970-03-30 1975-11-12
DE2116591A1 (en) * 1970-04-15 1971-10-28 Grace W R & Co Polymer matrix for direct prodn of stereos
US3658531A (en) * 1970-10-29 1972-04-25 Goodrich Co B F Method of making flexible printing plates
DE2300371C3 (de) * 1973-01-05 1979-04-19 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare Druckplatte für den Flexodruck
ZA743433B (en) * 1973-06-08 1975-05-28 Electrographic Corp Photoetched printing plates prepared from hot melt systems
JPS5119602A (es) * 1974-08-08 1976-02-17 Kansai Paint Co Ltd
US4078015A (en) * 1975-01-29 1978-03-07 Freeman Chemical Corporation Copolymerizable compositions and method of making the same
DE2607257B2 (de) * 1975-02-24 1979-10-25 Electrographic Corp., Chicago, Ill. (V.St.A.) Druckplatte und Verfahren zu ihrer Herstellung
US4057431A (en) * 1975-09-29 1977-11-08 The Goodyear Tire & Rubber Company Ethylenically polyurethane unsaturated composition
US4139436A (en) * 1977-02-07 1979-02-13 The Goodyear Tire & Rubber Company Polyetherurethane composition and polymer prepared by photopolymerization
US4221646A (en) * 1978-05-01 1980-09-09 The Goodyear Tire & Rubber Company Treated polyetherurethane photopolymer composition containing triaryl phosphine
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
JPS55717A (en) * 1978-06-19 1980-01-07 Teijin Ltd Photo-setting resin composition
DE3005035A1 (de) * 1980-02-11 1981-08-20 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von polymerisierbaren polyurethanelastomeren
DE3036694A1 (de) * 1980-09-29 1982-06-03 Hoechst Ag, 6000 Frankfurt Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch

Also Published As

Publication number Publication date
ES514882A0 (es) 1983-04-16
DE3131766A1 (de) 1983-02-24
CA1186171A (en) 1985-04-30
DE3274770D1 (en) 1987-01-29
JPS5840546A (ja) 1983-03-09
US4590144A (en) 1986-05-20
EP0072918B1 (de) 1986-12-17
JPH0374381B2 (es) 1991-11-26
EP0072918A1 (de) 1983-03-02

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19970401