ES8308095A1 - "un procedimiento para la formacion de una imagen". - Google Patents

"un procedimiento para la formacion de una imagen".

Info

Publication number
ES8308095A1
ES8308095A1 ES509103A ES509103A ES8308095A1 ES 8308095 A1 ES8308095 A1 ES 8308095A1 ES 509103 A ES509103 A ES 509103A ES 509103 A ES509103 A ES 509103A ES 8308095 A1 ES8308095 A1 ES 8308095A1
Authority
ES
Spain
Prior art keywords
group
denotes
alkyl
composition
cycloalkylalkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES509103A
Other languages
English (en)
Other versions
ES509103A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES8308095A1 publication Critical patent/ES8308095A1/es
Publication of ES509103A0 publication Critical patent/ES509103A0/es
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PROCEDIMIENTO PARA LA FORMACION DE IMAGENES. CONSISTE EN EXPONER A RADIACION ACTINICA DE UNA LONGITUD DE ONDA ENTRE 200 Y 600 NM Y A TRAVES DE UNA TRANSPARENCIA PORTADORA DE IMAGEN UNA COMPOSICION, QUE CONSTA DE UN MATERIAL ORGANICO QUE TIENE POR LO MENOS UN GRUPO BENZOINICO SUBSTITUIDO DE FORMULA (I), EN LA QUE R>1, R>2 Y R>3 PUEDEN SER VARIOS RADICALES; A, M, N, P Y Q VALEN 0 O 1; B VALE 1 A 4; Y D VALE 0-3, DE UN COMPUESTO POLIMERIZABLE EN PRESENCIA DE UN CATALIZADOR DE RADICAL LIBRE; Y TRATAR LA COMPOSICION CON UN REVELADOR. TIENE APLICACIONES PARA LA PREPARACION DE PLACAS DE IMPRESION Y CIRCUITOS IMPRESOS.
ES509103A 1981-01-28 1982-01-27 "un procedimiento para la formacion de una imagen". Granted ES509103A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8102847 1981-01-28

Publications (2)

Publication Number Publication Date
ES8308095A1 true ES8308095A1 (es) 1983-08-16
ES509103A0 ES509103A0 (es) 1983-08-16

Family

ID=10519337

Family Applications (1)

Application Number Title Priority Date Filing Date
ES509103A Granted ES509103A0 (es) 1981-01-28 1982-01-27 "un procedimiento para la formacion de una imagen".

Country Status (6)

Country Link
US (1) US4368253A (es)
EP (1) EP0057162B1 (es)
JP (1) JPS57147628A (es)
CA (1) CA1163852A (es)
DE (1) DE3260279D1 (es)
ES (1) ES509103A0 (es)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3418190A1 (de) * 1984-05-16 1985-11-21 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Verfahren zur datenspeicherung in und datenauslesung aus resistschichten
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
US4663269A (en) * 1985-08-07 1987-05-05 Polytechnic Institute Of New York Method of forming highly sensitive photoresist film in the absence of water
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
DE3821585A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
DE3927632A1 (de) * 1989-08-22 1991-02-28 Basf Ag Umsetzungsprodukt, verfahren zu dessen herstellung und damit erhaltenes strahlungsempfindliches material
US6020436A (en) * 1993-03-09 2000-02-01 The Chromaline Corporation Photosensitive resin composition
US5565499A (en) * 1993-03-24 1996-10-15 Loctite Corporation Filament-winding compositions for fiber/resin composites
US5539012A (en) * 1993-08-18 1996-07-23 Loctite Corporation Fiber/resin composites and method of preparation
US5679719A (en) * 1993-03-24 1997-10-21 Loctite Corporation Method of preparing fiber/resin composites
GB9921779D0 (en) 1999-09-16 1999-11-17 Ciba Sc Holding Ag UV-Curable compositions
US20040106769A1 (en) * 2000-07-11 2004-06-03 Hatton Kevin Brian High functional polymers
US6911109B2 (en) * 2000-12-11 2005-06-28 Henkel Corporation Two-part, room temperature curable epoxy resin/ (meth)acrylate compositions and process for using same to bond substrates
US7635727B2 (en) 2003-06-24 2009-12-22 Ppg Industries Ohio, Inc. Composite transparencies
US6984262B2 (en) * 2003-07-16 2006-01-10 Transitions Optical, Inc. Adhesion enhancing coating composition, process for using and articles produced
GB0411162D0 (en) * 2004-05-19 2004-06-23 Precisense As Optical sensor for in vivo detection of analyte
JP5125453B2 (ja) * 2007-11-29 2013-01-23 住友化学株式会社 ビスフェノールモノエステル化合物、該化合物を有効成分とする安定剤及び該安定剤を含有する熱可塑性ポリマー組成物
JP5019075B2 (ja) * 2007-12-17 2012-09-05 信越化学工業株式会社 ポジ型レジスト材料及びこれを用いたパターン形成方法
US8252412B2 (en) 2009-06-16 2012-08-28 Ppg Industries Ohio, Inc Angle switchable crystalline colloidal array films
US20110135888A1 (en) 2009-12-04 2011-06-09 Ppg Industries Ohio, Inc. Crystalline colloidal array of particles bearing reactive surfactant
US8582194B2 (en) 2010-04-29 2013-11-12 Ppg Industries Ohio, Inc. Thermally responsive crystalline colloidal arrays
US9022648B2 (en) 2010-11-11 2015-05-05 Prc-Desoto International, Inc. Temperature sensitive composite for photonic crystals
US20230051188A1 (en) 2019-12-18 2023-02-16 3M Innovative Properties Company Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same
TWI805057B (zh) * 2021-11-03 2023-06-11 住華科技股份有限公司 黏著劑及包含其之偏光板

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT951496B (it) 1971-06-28 1973-06-30 Ibm Composizione fotoresistente posi tiva a base epossidica partico larmente per la stampa di micro circuiti
US3801329A (en) * 1971-12-17 1974-04-02 Union Carbide Corp Radiation curable coating compositions
US3728377A (en) * 1972-06-05 1973-04-17 Eastman Kodak Co 4,4-bis(alkoxycarbonyl)benzoin ethers
US4009040A (en) * 1974-06-18 1977-02-22 E. I. Du Pont De Nemours And Company Hexaarylbiimidazole polymers
US4029505A (en) * 1975-01-20 1977-06-14 E. I. Du Pont De Nemours And Company Method of producing positive polymer images
US4001216A (en) * 1975-10-30 1977-01-04 American Home Products Corporation Aminoalkyl ethers of 2,2'- and 3,3'-dihydroxydesoxybenzoin
US4086210A (en) * 1976-05-10 1978-04-25 Eastman Kodak Company Radiation sensitive polymeric o-nitrophenyl acetals
EP0003002B1 (de) * 1977-12-22 1984-06-13 Ciba-Geigy Ag Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone

Also Published As

Publication number Publication date
EP0057162A1 (de) 1982-08-04
EP0057162B1 (de) 1984-06-27
US4368253A (en) 1983-01-11
JPS57147628A (en) 1982-09-11
ES509103A0 (es) 1983-08-16
DE3260279D1 (en) 1984-08-02
CA1163852A (en) 1984-03-20

Similar Documents

Publication Publication Date Title
ATE103268T1 (de) Strahlungsempfindliches, ethylenisch ungesaettigte, copolymerisierbare verbindungen und verfahren zu deren herstellung.
ATE25776T1 (de) Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial.
JP2000214588A5 (es)
JPS6255770B2 (es)
JPS5570841A (en) Forming method of dye image
ES398374A1 (es) Mejoras introducidas en un procedimiento para la elabora- cion de un material copiativo fotosensitivo.
DE58901114D1 (de) Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare verbindungen und verfahren zu deren herstellung.
ZA85320B (en) Negative photoresist systems
JPS6455553A (en) Photosensitive composition, photosensitive copying material produced therefrom and making of negative relief copy
KR920006340A (ko) 비 중합성 화합물, 이를 함유하는 조성물 그리고 포지티브 및 네가티브상의 형성방법
BR8106859A (pt) Mistura foto-sensivel e material de copia foto-sensivel
KR850001443A (ko) 광 저항성 조성물
JPS57142635A (en) Photosensitive mixture and photosensitive copying material utilizing it
JPS57202534A (en) Negative type resist composition
JPS6454441A (en) Manufacture of negative type photographic element and composition for photographic element and photography
JPH10282669A5 (es)
EP0404446A3 (en) A method of forming photoresists by polymerisation of di-unsaturated monomers
KR960024674A (ko) 방사선-민감성 조성물에 사용되는 광산 생성 조성물
JP2000338680A5 (es)
DE3664824D1 (en) Process for producing a positive photoresist
JPS5524113A (en) Novel 2-halomethyl-5-vinyl-1,3,4-oxadiazole compound
JPH11305443A5 (es)
JPS56165140A (en) Photographic sensitive material for forming negative image
JPS57104925A (en) Method for developing silver halide photographic material
JPH10333326A5 (es)