ES8801869A1 - Procedimiento para la obtencion de imagagenes positivas empleando acetales o cetales ciclicos de beta-cetoesteres o amidas. - Google Patents

Procedimiento para la obtencion de imagagenes positivas empleando acetales o cetales ciclicos de beta-cetoesteres o amidas.

Info

Publication number
ES8801869A1
ES8801869A1 ES557672A ES557672A ES8801869A1 ES 8801869 A1 ES8801869 A1 ES 8801869A1 ES 557672 A ES557672 A ES 557672A ES 557672 A ES557672 A ES 557672A ES 8801869 A1 ES8801869 A1 ES 8801869A1
Authority
ES
Spain
Prior art keywords
hydrogen
ketoesters
ketals
amides
beta
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES557672A
Other languages
English (en)
Other versions
ES557672A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES557672A0 publication Critical patent/ES557672A0/es
Publication of ES8801869A1 publication Critical patent/ES8801869A1/es
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D319/00—Heterocyclic compounds containing six-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D319/04—1,3-Dioxanes; Hydrogenated 1,3-dioxanes
    • C07D319/06—1,3-Dioxanes; Hydrogenated 1,3-dioxanes not condensed with other rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
    • C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
    • C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
    • C07D317/14—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D317/30—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)

Abstract

PROCEDIMIENTO PARA LA OBTENCION DE IMAGENES POSITIVAS EMPLEANDO ACETALES O CETALES CICLICOS DE B-CETOESTERES O -AMIDAS. COMPRENDE LAS ETAPAS DE REVESTIR UN SUSTRATO CON UNA COMPOSICION SENSIBLE A LOS RAYOS, ESTANDO DICHA COMPOSICION FORMADA POR UN COMPUESTO DE FORMULA GENERAL (I), POR UN COMPUESTO DISOCIADOR DE UN ACIDO BAJO LA ACTUACION DE RADIACION ACTINICA, Y POR UN AGLUTINANTE; DE EXPOSICION DEL SUSTRATO REVESTIDO CON UNA MUESTRA PREVIAMENTE DETERMINADA DE RADIACION ACTINICA; Y DE REVELADO DEL SUSTRATO EXPUESTO. DE APLICACION EN LA OBTENCION DE PLACAS DE IMPRESION, CIRCUITOS IMPRESOS, CIRCUITOS INTEGRADOS O PELICULAS FOTOGRAFIC
ES557672A 1985-05-15 1987-08-14 Procedimiento para la obtencion de imagagenes positivas empleando acetales o cetales ciclicos de beta-cetoesteres o amidas. Expired ES8801869A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH208985 1985-05-15

Publications (2)

Publication Number Publication Date
ES557672A0 ES557672A0 (es) 1988-02-16
ES8801869A1 true ES8801869A1 (es) 1988-02-16

Family

ID=4225635

Family Applications (3)

Application Number Title Priority Date Filing Date
ES554919A Expired ES8802224A1 (es) 1985-05-15 1986-05-13 Procedimiento para la obtencion de acetales o cetales ciclicos de b-cetoesteres o-amidas
ES557671A Expired ES8801814A1 (es) 1985-05-15 1987-08-14 Procedimiento pra la obtencion de acetales o cetales ciclicos de beta-cetoesteres o -amidas.
ES557672A Expired ES8801869A1 (es) 1985-05-15 1987-08-14 Procedimiento para la obtencion de imagagenes positivas empleando acetales o cetales ciclicos de beta-cetoesteres o amidas.

Family Applications Before (2)

Application Number Title Priority Date Filing Date
ES554919A Expired ES8802224A1 (es) 1985-05-15 1986-05-13 Procedimiento para la obtencion de acetales o cetales ciclicos de b-cetoesteres o-amidas
ES557671A Expired ES8801814A1 (es) 1985-05-15 1987-08-14 Procedimiento pra la obtencion de acetales o cetales ciclicos de beta-cetoesteres o -amidas.

Country Status (6)

Country Link
US (2) US4737426A (es)
EP (1) EP0202196B1 (es)
JP (2) JPH0811753B2 (es)
CA (1) CA1281728C (es)
DE (1) DE3662397D1 (es)
ES (3) ES8802224A1 (es)

Families Citing this family (38)

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DE3730785A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3730787A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3730783A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3810631A1 (de) * 1988-03-29 1989-10-12 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand
EP0347381B1 (de) * 1988-06-13 1992-02-12 Ciba-Geigy Ag Ungesättigte beta-Ketoesteracetale und ihre Anwendungen
JPH02101462A (ja) * 1988-10-11 1990-04-13 Matsushita Electric Ind Co Ltd パターン形成材料
DE3837438A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3837513A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3841437A1 (de) * 1988-12-09 1990-06-13 Basf Ag Strahlungsempfindliches gemisch
US5220037A (en) * 1989-07-22 1993-06-15 Basf Aktiengesellschaft Sulfonium salts and use thereof
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930086A1 (de) * 1989-09-09 1991-03-21 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
EP0501919A1 (de) * 1991-03-01 1992-09-02 Ciba-Geigy Ag Strahlungsempfindliche Zusammensetzungen auf der Basis von Polyphenolen und Acetalen
EP0502819A1 (de) * 1991-03-01 1992-09-09 Ciba-Geigy Ag Säurekatalytisch vernetzbare Copolymere
JPH07140666A (ja) * 1993-06-04 1995-06-02 Internatl Business Mach Corp <Ibm> マイクロリトグラフィックレジスト組成物、酸不安定化合物、マイクロリトグラフィックレリーフ画像形成方法及び酸感知性ポリマー組成物
US6143472A (en) * 1998-11-18 2000-11-07 Wako Pure Chemical Industries, Ltd. Resist composition and a method for formation of a pattern using the composition
US5998092A (en) * 1998-05-27 1999-12-07 Clariant International, Ltd. Water soluble negative-working photoresist composition
JP3299214B2 (ja) 1999-03-12 2002-07-08 松下電器産業株式会社 パターン形成材料及びパターン形成方法
AU2001260093A1 (en) * 2000-03-02 2001-09-12 Lonza A.G. Acetoacetylated diamines and polyamines
JP4153912B2 (ja) * 2002-10-23 2008-09-24 Ａｚエレクトロニックマテリアルズ株式会社 化学増幅ポジ型感光性樹脂組成物
JP2006058430A (ja) * 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP4511383B2 (ja) * 2005-02-23 2010-07-28 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
BRPI0618901A2 (pt) * 2005-11-22 2011-09-13 Aromagen Corp cetais de glicerol levulinatos e seus usos
EP2367811A1 (en) * 2008-09-25 2011-09-28 Segetis, Inc. Ketal ester derivatives
CN102459219A (zh) * 2009-06-22 2012-05-16 赛格提斯公司 缩酮化合物及其用途
DE102010009024A1 (de) 2010-02-24 2011-08-25 Siemens Aktiengesellschaft, 80333 HF-Resonatorkavität und Beschleuniger
US20110300083A1 (en) 2010-05-10 2011-12-08 Segetis, Inc. Personal care formulations containing alkyl ketal esters and methods of manufacture
AU2011289224B2 (en) * 2010-08-12 2015-04-16 Gfbiochemicals Limited Carboxy ester ketal removal compositions, methods of manufacture, and uses thereof
US9074065B2 (en) 2010-08-12 2015-07-07 Segetis, Inc. Latex coating compositions including carboxy ester ketal coalescents, methods of manufacture, and uses thereof
US8632612B2 (en) 2010-09-07 2014-01-21 Segetis, Inc. Compositions for dyeing keratin fibers
EP2616582A4 (en) 2010-09-13 2014-03-05 Segetis Inc FABRIC SOFTENING AGENT COMPOSITIONS AND METHODS OF MANUFACTURING THE SAME
WO2012054505A2 (en) 2010-10-18 2012-04-26 Segetis, Inc. Water reducible coating compositions including carboxy ester ketals, methods of manufacture, and uses thereof
CN103189372A (zh) * 2010-11-11 2013-07-03 赛格提斯公司 多羟基缩酮酯加合物、其制造方法和用途
EP2638096A4 (en) * 2010-11-11 2014-05-28 Segetis Inc POLYCETAL ADDITION PRODUCTS, METHODS OF MANUFACTURE AND USE THEREOF
US20130087073A1 (en) * 2011-10-11 2013-04-11 Segetis, Inc. Stabilized levulinic ester ketals
WO2014047428A1 (en) 2012-09-21 2014-03-27 Segetis, Inc. Cleaning, surfactant, and personal care compositions
WO2014085609A1 (en) 2012-11-29 2014-06-05 Segetis, Inc. Carboxy ester ketals, methods of manufacture, and uses thereof
US20250002446A1 (en) * 2021-11-26 2025-01-02 Arxada Ag Acetoacetate Based Ketals

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1017979A (en) * 1963-12-02 1966-01-26 Shell Int Research Improvements in or relating to the preparation of chloro-acetoacetamides and to substituted dioxolan derivatives of acetic acid esters as intermediates in said preparation
US3515552A (en) * 1966-09-16 1970-06-02 Minnesota Mining & Mfg Light-sensitive imaging sheet and method of using
US3536489A (en) * 1966-09-16 1970-10-27 Minnesota Mining & Mfg Heterocyclic iminoaromatic-halogen containing photoinitiator light sensitive compositions
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3991033A (en) * 1975-01-30 1976-11-09 E. I. Du Pont De Nemours & Company Photosensitive and degradable polyoxymethylene polymers and their application in imaging
CH621416A5 (es) * 1975-03-27 1981-01-30 Hoechst Ag
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
DE2829512A1 (de) * 1978-07-05 1980-01-17 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
DE2829511A1 (de) * 1978-07-05 1980-01-24 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
JPS55118030A (en) * 1979-03-06 1980-09-10 Fuji Photo Film Co Ltd Photopolymerizable composition
US4294909A (en) * 1979-12-26 1981-10-13 E. I. Du Pont De Nemours And Company Photosensitive negative-working toning process
US4356252A (en) * 1979-12-26 1982-10-26 E. I. Du Pont De Nemours And Company Photosensitive negative-working tonable element
US4339567A (en) * 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts
NL8001885A (nl) * 1980-03-31 1981-11-02 Akzo Nv Intiator-systeem voor door straling hardbare composities.
US4383025A (en) * 1980-07-10 1983-05-10 Ciba-Geigy Corporation Photopolymerization by means of sulfoxonium salts
US4398014A (en) * 1980-11-04 1983-08-09 Ciba-Geigy Corporation Sulfoxonium salts and their use as polymerization catalysts
US4371605A (en) * 1980-12-09 1983-02-01 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
US4510290A (en) * 1982-01-11 1985-04-09 Ciba Geigy Corporation Acid-curable composition containing a masked curing catalyst, and a process for the curing thereof
GB2120263B (en) * 1982-05-17 1985-07-31 Ciba Geigy Ag A process for curing acid-curable abrasive compositions
US4505858A (en) * 1982-10-12 1985-03-19 Ciba-Geigy Corporation Process for producing 3,4,9,10-tetrathioperylene and 3,4,9,10-tetraselenoperylene

Also Published As

Publication number Publication date
ES554919A0 (es) 1988-04-16
JPH0811753B2 (ja) 1996-02-07
CA1281728C (en) 1991-03-19
ES557672A0 (es) 1988-02-16
EP0202196B1 (de) 1989-03-15
US4806448A (en) 1989-02-21
ES8802224A1 (es) 1988-04-16
JPH0822127A (ja) 1996-01-23
JPS61277679A (ja) 1986-12-08
EP0202196A3 (en) 1987-10-28
ES8801814A1 (es) 1988-02-16
ES557671A0 (es) 1988-02-16
US4737426A (en) 1988-04-12
EP0202196A2 (de) 1986-11-20
DE3662397D1 (en) 1989-04-20
JP2620589B2 (ja) 1997-06-18

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