FR1487028A - Compositions photo-sensibles - Google Patents

Compositions photo-sensibles

Info

Publication number
FR1487028A
FR1487028A FR69943A FR69943A FR1487028A FR 1487028 A FR1487028 A FR 1487028A FR 69943 A FR69943 A FR 69943A FR 69943 A FR69943 A FR 69943A FR 1487028 A FR1487028 A FR 1487028A
Authority
FR
France
Prior art keywords
photo
sensitive compositions
sensitive
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR69943A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FMC Corp
Original Assignee
FMC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE19661547849 priority Critical patent/DE1547849A1/de
Priority to GB3145966A priority patent/GB1141544A/en
Application filed by FMC Corp filed Critical FMC Corp
Priority to FR69943A priority patent/FR1487028A/fr
Application granted granted Critical
Publication of FR1487028A publication Critical patent/FR1487028A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F263/00—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00
    • C08F263/06—Macromolecular compounds obtained by polymerising monomers on to polymers of esters of unsaturated alcohols with saturated acids as defined in group C08F18/00 on to polymers of esters with polycarboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR69943A 1966-07-13 1966-07-19 Compositions photo-sensibles Expired FR1487028A (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE19661547849 DE1547849A1 (de) 1966-07-13 1966-07-13 Lichtempfindliche Masse
GB3145966A GB1141544A (en) 1966-07-13 1966-07-13 Polymer compositions
FR69943A FR1487028A (fr) 1966-07-13 1966-07-19 Compositions photo-sensibles

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DEF0049686 1966-07-13
GB3145966A GB1141544A (en) 1966-07-13 1966-07-13 Polymer compositions
FR69943A FR1487028A (fr) 1966-07-13 1966-07-19 Compositions photo-sensibles

Publications (1)

Publication Number Publication Date
FR1487028A true FR1487028A (fr) 1967-06-30

Family

ID=27210489

Family Applications (1)

Application Number Title Priority Date Filing Date
FR69943A Expired FR1487028A (fr) 1966-07-13 1966-07-19 Compositions photo-sensibles

Country Status (3)

Country Link
DE (1) DE1547849A1 (fr)
FR (1) FR1487028A (fr)
GB (1) GB1141544A (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2405500A1 (fr) * 1977-10-06 1979-05-04 Polychrome Corp Plaque d'impression lithographique possedant une double couche photosensible, et son procede de preparation
FR2450473A1 (fr) * 1979-02-27 1980-09-26 Minnesota Mining & Mfg Compositions photosensibles et systemes impressionnables comprenant de telles compositions
EP0104863A3 (en) * 1982-09-21 1986-04-16 Fuji Photo Film Co., Ltd. Light-sensitive planographic printing plate
EP0272550A3 (en) * 1986-12-23 1989-06-07 Hoechst Aktiengesellschaft Light-sensitive registration material with a light-sensitive intermediate layer
EP0653682A1 (fr) * 1993-11-16 1995-05-17 Agfa-Gevaert N.V. Elément d'enregistrement d'images, contenant une composition photopolymérisable et méthode pour la production d'images au moyen de cet élément

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA980163A (en) * 1970-12-23 1975-12-23 Jack R. Celeste Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds
US4169167A (en) * 1978-06-26 1979-09-25 Lord Corporation Low gloss finishes by gradient intensity cure

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2405500A1 (fr) * 1977-10-06 1979-05-04 Polychrome Corp Plaque d'impression lithographique possedant une double couche photosensible, et son procede de preparation
FR2450473A1 (fr) * 1979-02-27 1980-09-26 Minnesota Mining & Mfg Compositions photosensibles et systemes impressionnables comprenant de telles compositions
EP0104863A3 (en) * 1982-09-21 1986-04-16 Fuji Photo Film Co., Ltd. Light-sensitive planographic printing plate
EP0272550A3 (en) * 1986-12-23 1989-06-07 Hoechst Aktiengesellschaft Light-sensitive registration material with a light-sensitive intermediate layer
EP0653682A1 (fr) * 1993-11-16 1995-05-17 Agfa-Gevaert N.V. Elément d'enregistrement d'images, contenant une composition photopolymérisable et méthode pour la production d'images au moyen de cet élément

Also Published As

Publication number Publication date
GB1141544A (en) 1969-01-29
DE1547849A1 (de) 1969-12-11

Similar Documents

Publication Publication Date Title
FR1513990A (fr) Compositions adhésives
FR1515387A (fr) Compositions phénoliques
CH473400A (fr) Composition photosensible
FR1509311A (fr) Compositions adhésives
CH436751A (de) Koordinatograph
FR1517230A (fr) Compositions lubrifiantes perfectionnées
CH478909A (de) Riechstoffkompositionen
AT276854B (de) Fungizide Zusammensetzungen
BR6790897D0 (pt) Composicoes
CH485791A (fr) Composition filmogène
FR1523597A (fr) 2-aminobenzimidazoles substitués
BR6790787D0 (pt) Novas composicoes organoestanicas
FR1500559A (fr) Compositions oxyluminescentes
FR1511512A (fr) Compositions de revêtement
FR1487028A (fr) Compositions photo-sensibles
FR1544393A (fr) Compositions détergentes
FR1530104A (fr) Compositions photosensibles
AT278436B (de) Milbenbekämpfungsmittel
FR1513629A (fr) Compositions pigmentantes
FI50430C (fi) Astianpesuaineseos
AT294006B (de) Fälzelgerät
AT301006B (de) Kettsamtbahn
FR1516233A (fr) Composition détergente
FR1490900A (fr) Compositions photo-sensibles
AT280931B (de) Bleichzusammensetzung