FR1490476A - Procédé de diffusion planar - Google Patents

Procédé de diffusion planar

Info

Publication number
FR1490476A
FR1490476A FR38088A FR38088A FR1490476A FR 1490476 A FR1490476 A FR 1490476A FR 38088 A FR38088 A FR 38088A FR 38088 A FR38088 A FR 38088A FR 1490476 A FR1490476 A FR 1490476A
Authority
FR
France
Prior art keywords
diffusion process
planar diffusion
planar
diffusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR38088A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Priority to FR38088A priority Critical patent/FR1490476A/fr
Application granted granted Critical
Publication of FR1490476A publication Critical patent/FR1490476A/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/40Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/43Encapsulations, e.g. protective coatings characterised by their materials comprising oxides, nitrides or carbides, e.g. ceramics or glasses
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/401Oxides containing silicon
    • C23C16/402Silicon dioxide
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
FR38088A 1964-11-12 1965-11-12 Procédé de diffusion planar Expired FR1490476A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR38088A FR1490476A (fr) 1964-11-12 1965-11-12 Procédé de diffusion planar

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US41037264A 1964-11-12 1964-11-12
US42868265A 1965-01-28 1965-01-28
FR38088A FR1490476A (fr) 1964-11-12 1965-11-12 Procédé de diffusion planar

Publications (1)

Publication Number Publication Date
FR1490476A true FR1490476A (fr) 1967-08-04

Family

ID=27242703

Family Applications (1)

Application Number Title Priority Date Filing Date
FR38088A Expired FR1490476A (fr) 1964-11-12 1965-11-12 Procédé de diffusion planar

Country Status (1)

Country Link
FR (1) FR1490476A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0272140A3 (en) * 1986-12-19 1990-11-14 Applied Materials, Inc. Thermal cvd/pecvd reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
US5755886A (en) * 1986-12-19 1998-05-26 Applied Materials, Inc. Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0272140A3 (en) * 1986-12-19 1990-11-14 Applied Materials, Inc. Thermal cvd/pecvd reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
US5362526A (en) * 1986-12-19 1994-11-08 Applied Materials, Inc. Plasma-enhanced CVD process using TEOS for depositing silicon oxide
US5755886A (en) * 1986-12-19 1998-05-26 Applied Materials, Inc. Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing
US5871811A (en) * 1986-12-19 1999-02-16 Applied Materials, Inc. Method for protecting against deposition on a selected region of a substrate

Similar Documents

Publication Publication Date Title
FR1442585A (fr) Procédé de silylation
FR1448654A (fr) Procédé de thermographie
CH473234A (de) Diffusionsbeschichtungsverfahren
FR1455445A (fr) Procédé de séchage
FR1426556A (fr) Procédé de photocopie
FR1490476A (fr) Procédé de diffusion planar
FR1464235A (fr) Procédé de frittage
FR1435834A (fr) Procédé de granulation
FR1391926A (fr) Procédé de construction perfectionné
FR1426673A (fr) Procédé de photocopie
FR1396553A (fr) Procédé de construction de serres-tunnels et châssis-tunnels
FR1422253A (fr) Procédé de construction
CH437143A (fr) Procédé de cryo-séchage de matières
FR1473032A (fr) Procédé de brasure
FR1480216A (fr) Procédé de construction
FR1472185A (fr) Procédé de construction
FR1368121A (fr) Procédé de construction perfectionné
FR1457167A (fr) Procédé magnétographique
FR1402067A (fr) Procédé de construction
FR1497462A (fr) Procédé perfectionné de calfeutrage
FR1474794A (fr) Procédé de tirage
FR1445792A (fr) Procédé de nitration
FR1430027A (fr) Procédé de diffusion double simultanée
FR1402460A (fr) Procédé de bobinage
FR1438070A (fr) Procédé de polymérisation des 2-vinylpyridines