FR1506367A - Corps en silicium - Google Patents

Corps en silicium

Info

Publication number
FR1506367A
FR1506367A FR74033A FR74033A FR1506367A FR 1506367 A FR1506367 A FR 1506367A FR 74033 A FR74033 A FR 74033A FR 74033 A FR74033 A FR 74033A FR 1506367 A FR1506367 A FR 1506367A
Authority
FR
France
Prior art keywords
silicon body
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR74033A
Other languages
English (en)
Inventor
John George Wilkes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of FR1506367A publication Critical patent/FR1506367A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302—Non-deposition formation processes
    • H10P14/6304—Formation by oxidation, e.g. oxidation of the substrate
    • H10P14/6306—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials
    • H10P14/6308—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors
    • H10P14/6309—Formation by oxidation, e.g. oxidation of the substrate of the semiconductor materials of Group IV semiconductors of silicon in uncombined form, i.e. pure silicon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302—Non-deposition formation processes
    • H10P14/6322—Formation by thermal treatments
FR74033A 1965-08-26 1966-08-24 Corps en silicium Expired FR1506367A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB36654/65A GB1081629A (en) 1965-08-26 1965-08-26 Improvements in or relating to silicon bodies

Publications (1)

Publication Number Publication Date
FR1506367A true FR1506367A (fr) 1967-12-22

Family

ID=10390058

Family Applications (1)

Application Number Title Priority Date Filing Date
FR74033A Expired FR1506367A (fr) 1965-08-26 1966-08-24 Corps en silicium

Country Status (3)

Country Link
DE (1) DE1521909C3 (fr)
FR (1) FR1506367A (fr)
GB (1) GB1081629A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4167915A (en) * 1977-03-09 1979-09-18 Atomel Corporation High-pressure, high-temperature gaseous chemical apparatus

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2930722A (en) * 1959-02-03 1960-03-29 Bell Telephone Labor Inc Method of treating silicon
NL285088A (fr) * 1961-11-18
FR1403466A (fr) * 1963-08-16 1965-06-18 Licentia Gmbh Procédé d'oxydation de silicium ou d'une disposition de semi-conducteurs comportant une ou plusieurs transitions pn

Also Published As

Publication number Publication date
DE1521909C3 (de) 1981-07-02
DE1521909B2 (de) 1980-11-06
DE1521909A1 (de) 1969-10-30
GB1081629A (en) 1967-08-31

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