FR2157702A1 - - Google Patents
Info
- Publication number
- FR2157702A1 FR2157702A1 FR7138454A FR7138454A FR2157702A1 FR 2157702 A1 FR2157702 A1 FR 2157702A1 FR 7138454 A FR7138454 A FR 7138454A FR 7138454 A FR7138454 A FR 7138454A FR 2157702 A1 FR2157702 A1 FR 2157702A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/14—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
- H10P32/1408—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers
- H10P32/141—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase from or through or into an external applied layer, e.g. photoresist or nitride layers the applied layer comprising oxides only
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
- H10P32/171—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7138454A FR2157702B1 (de) | 1971-10-26 | 1971-10-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7138454A FR2157702B1 (de) | 1971-10-26 | 1971-10-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2157702A1 true FR2157702A1 (de) | 1973-06-08 |
| FR2157702B1 FR2157702B1 (de) | 1974-05-31 |
Family
ID=9084916
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7138454A Expired FR2157702B1 (de) | 1971-10-26 | 1971-10-26 |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2157702B1 (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3048816A1 (de) * | 1979-12-26 | 1981-09-17 | Hitachi Microcomputer Engineering Ltd., Tokyo | Durchbruch-referenzdiode |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3418180A (en) * | 1965-06-14 | 1968-12-24 | Ncr Co | p-n junction formation by thermal oxydation |
-
1971
- 1971-10-26 FR FR7138454A patent/FR2157702B1/fr not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3418180A (en) * | 1965-06-14 | 1968-12-24 | Ncr Co | p-n junction formation by thermal oxydation |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3048816A1 (de) * | 1979-12-26 | 1981-09-17 | Hitachi Microcomputer Engineering Ltd., Tokyo | Durchbruch-referenzdiode |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2157702B1 (de) | 1974-05-31 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |