FR2185100A5 - - Google Patents

Info

Publication number
FR2185100A5
FR2185100A5 FR7217587A FR7217587A FR2185100A5 FR 2185100 A5 FR2185100 A5 FR 2185100A5 FR 7217587 A FR7217587 A FR 7217587A FR 7217587 A FR7217587 A FR 7217587A FR 2185100 A5 FR2185100 A5 FR 2185100A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7217587A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IND DYESTUFF CY
Original Assignee
IND DYESTUFF CY
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US38912A priority Critical patent/US3687663A/en
Application filed by IND DYESTUFF CY filed Critical IND DYESTUFF CY
Priority to FR7217587A priority patent/FR2185100A5/fr
Priority to GB2409072A priority patent/GB1344781A/en
Application granted granted Critical
Publication of FR2185100A5 publication Critical patent/FR2185100A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
FR7217587A 1970-05-19 1972-05-17 Expired FR2185100A5 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US38912A US3687663A (en) 1970-05-19 1970-05-19 Diazo-oxides of sulfonic acid amides and/or esters and photographic element and use thereof
FR7217587A FR2185100A5 (fr) 1970-05-19 1972-05-17
GB2409072A GB1344781A (en) 1970-05-19 1972-05-23 Sulphonic diazo-oxides

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3891270A 1970-05-19 1970-05-19
FR7217587A FR2185100A5 (fr) 1970-05-19 1972-05-17
GB2409072 1972-05-23

Publications (1)

Publication Number Publication Date
FR2185100A5 true FR2185100A5 (fr) 1973-12-28

Family

ID=27249859

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7217587A Expired FR2185100A5 (fr) 1970-05-19 1972-05-17

Country Status (3)

Country Link
US (1) US3687663A (fr)
FR (1) FR2185100A5 (fr)
GB (1) GB1344781A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7934587B2 (en) 2005-03-21 2011-05-03 Faurecia Interieur Industrie Injection moulded part, energy absorbing assembly with spacer, and method for making such an assembly

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5024641B2 (fr) * 1972-10-17 1975-08-18
US4640884A (en) * 1985-03-29 1987-02-03 Polychrome Corp. Photosensitive compounds and lithographic composition or plate therewith having o-quinone diazide sulfonyl ester group
DE3603578A1 (de) * 1986-02-06 1987-08-13 Hoechst Ag Neue bis-1,2-naphthochinon-2-diazid-sulfonsaeure- amide, ihre verwendung in einem strahlungsempfindlichen gemisch und strahlungsempfindliches kopiermaterial
JPS63265242A (ja) * 1987-04-23 1988-11-01 Fuji Photo Film Co Ltd 多色画像形成方法
DE3729034A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes lichtempfindliches kopiermaterial
DE3822522A1 (de) * 1988-07-04 1990-03-22 Hoechst Ag 1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten
DE69021022T2 (de) * 1989-12-07 1996-01-18 Toshiba Kawasaki Kk Lichtempfindliche Zusammensetzung und harzumhüllte Halbleiteranordnung.
CN101486660B (zh) * 2009-02-12 2013-04-17 东华大学 2,2-双[4-(2-三氟甲基-4-氨基苯氧基)苯基]丙烷的制备方法
CN106631834A (zh) * 2016-12-26 2017-05-10 自贡中天胜新材料科技有限公司 一种2,2‑双[4‑(4‑氨基苯氧基)苯基]丙烷的制备方法
CN110256255B (zh) * 2019-07-11 2022-08-12 浙江工业大学 一种1,4-双（4-硝基苯氧基）苯的机械化学合成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7934587B2 (en) 2005-03-21 2011-05-03 Faurecia Interieur Industrie Injection moulded part, energy absorbing assembly with spacer, and method for making such an assembly

Also Published As

Publication number Publication date
US3687663A (en) 1972-08-29
GB1344781A (en) 1974-01-23

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Legal Events

Date Code Title Description
ST Notification of lapse