FR2373879A1 - Structure semiconductrice a dielectrique epais, procede de fabrication et dispositifs a tres haute frequence comportant une telle structure - Google Patents
Structure semiconductrice a dielectrique epais, procede de fabrication et dispositifs a tres haute frequence comportant une telle structureInfo
- Publication number
- FR2373879A1 FR2373879A1 FR7636786A FR7636786A FR2373879A1 FR 2373879 A1 FR2373879 A1 FR 2373879A1 FR 7636786 A FR7636786 A FR 7636786A FR 7636786 A FR7636786 A FR 7636786A FR 2373879 A1 FR2373879 A1 FR 2373879A1
- Authority
- FR
- France
- Prior art keywords
- mesa
- diode
- semiconductor structure
- substrate
- highly doped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/40—Transit-time diodes, e.g. IMPATT or TRAPATT diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P54/00—Cutting or separating of wafers, substrates or parts of devices
Landscapes
- Bipolar Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
L'invention concerne les dispositifs à semiconducteurs destinés à fonctionner à des fréquences supérieures à 1 GHz. Dans la structure selon l'invention, une diode de type << mésa >> est réduite à sa partie << mésa >> tout en gardant un substrat résiduel fortement dopé. Elle est entourée de diélectrique de manière à constituer un bloc de grandes dimensions par rapport à la diode. Le bloc présente deux grandes faces planes et parallèles portant, chacune, une métallisation. Un contact direct est établi, côté substrat, entre la diode et l'une des métallisations. Un plot épais de métal bon conducteur de la chaleur et de l'électricité assure le contact du côté de la face opposée. Application aux émetteurs, récepteurs, limiteurs, diodes de commutation en très haute fréquence.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7636786A FR2373879A1 (fr) | 1976-12-07 | 1976-12-07 | Structure semiconductrice a dielectrique epais, procede de fabrication et dispositifs a tres haute frequence comportant une telle structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7636786A FR2373879A1 (fr) | 1976-12-07 | 1976-12-07 | Structure semiconductrice a dielectrique epais, procede de fabrication et dispositifs a tres haute frequence comportant une telle structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2373879A1 true FR2373879A1 (fr) | 1978-07-07 |
| FR2373879B1 FR2373879B1 (fr) | 1980-02-08 |
Family
ID=9180741
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7636786A Granted FR2373879A1 (fr) | 1976-12-07 | 1976-12-07 | Structure semiconductrice a dielectrique epais, procede de fabrication et dispositifs a tres haute frequence comportant une telle structure |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2373879A1 (fr) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0029334A1 (fr) * | 1979-11-15 | 1981-05-27 | The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and | Combinaison des dispositifs semiconducteurs à deux électrodes connectés en série et leur fabrication |
| US4340900A (en) * | 1979-06-19 | 1982-07-20 | The United States Of America As Represented By The Secretary Of The Air Force | Mesa epitaxial diode with oxide passivated junction and plated heat sink |
| EP0417851A3 (en) * | 1989-09-15 | 1991-09-25 | Philips Electronic And Associated Industries Limited | Two-terminal non-linear devices and their method of fabrication |
| US5164813A (en) * | 1988-06-24 | 1992-11-17 | Unitrode Corporation | New diode structure |
| US5179035A (en) * | 1989-09-15 | 1993-01-12 | U.S. Philips Corporation | Method of fabricating two-terminal non-linear devices |
| WO2002001629A1 (fr) * | 2000-06-28 | 2002-01-03 | Marconi Applied Technologies Limited | Composant a semi-conducteur et procede de fabrication |
-
1976
- 1976-12-07 FR FR7636786A patent/FR2373879A1/fr active Granted
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4340900A (en) * | 1979-06-19 | 1982-07-20 | The United States Of America As Represented By The Secretary Of The Air Force | Mesa epitaxial diode with oxide passivated junction and plated heat sink |
| EP0029334A1 (fr) * | 1979-11-15 | 1981-05-27 | The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and | Combinaison des dispositifs semiconducteurs à deux électrodes connectés en série et leur fabrication |
| US5164813A (en) * | 1988-06-24 | 1992-11-17 | Unitrode Corporation | New diode structure |
| EP0417851A3 (en) * | 1989-09-15 | 1991-09-25 | Philips Electronic And Associated Industries Limited | Two-terminal non-linear devices and their method of fabrication |
| US5179035A (en) * | 1989-09-15 | 1993-01-12 | U.S. Philips Corporation | Method of fabricating two-terminal non-linear devices |
| WO2002001629A1 (fr) * | 2000-06-28 | 2002-01-03 | Marconi Applied Technologies Limited | Composant a semi-conducteur et procede de fabrication |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2373879B1 (fr) | 1980-02-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |