FR2405111A1 - Procede d'usinage par bombardement ionique et dispositif de mise en oeuvre d'un tel procede - Google Patents

Procede d'usinage par bombardement ionique et dispositif de mise en oeuvre d'un tel procede

Info

Publication number
FR2405111A1
FR2405111A1 FR7730247A FR7730247A FR2405111A1 FR 2405111 A1 FR2405111 A1 FR 2405111A1 FR 7730247 A FR7730247 A FR 7730247A FR 7730247 A FR7730247 A FR 7730247A FR 2405111 A1 FR2405111 A1 FR 2405111A1
Authority
FR
France
Prior art keywords
workpiece
machining
modulated
machined
deviation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7730247A
Other languages
English (en)
Other versions
FR2405111B1 (fr
Inventor
Georges Mourier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7730247A priority Critical patent/FR2405111A1/fr
Publication of FR2405111A1 publication Critical patent/FR2405111A1/fr
Application granted granted Critical
Publication of FR2405111B1 publication Critical patent/FR2405111B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/301—Arrangements enabling beams to pass between regions of different pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)

Abstract

L'invention concerne l'usinage de pièces par bombardement ionique. La pièce à usiner, 11, est placée dans une enceinte isolante étanche 3 remplie, par la canalisation 8, d'un gaz inerte, ionisé en fonctionnement par le champ électromagnétique haute fréquence produit par l'intermédiaire de l'enroulement 31. Simultanément, l'ensemble 5 et le générateur 7 assurent le balayage de la surface à usiner par un faisceau électronique, 6, dont l'intensité et la déviation sont programmées. Les charges électriques déposées par le faisceau sur la surface modifient localement les caractéristiques du bombardement ionique et permettent une commande fine de l'usinage. Application notamment à la réalisation de guides d'ondes et de lentilles sphériques.
FR7730247A 1977-10-07 1977-10-07 Procede d'usinage par bombardement ionique et dispositif de mise en oeuvre d'un tel procede Granted FR2405111A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7730247A FR2405111A1 (fr) 1977-10-07 1977-10-07 Procede d'usinage par bombardement ionique et dispositif de mise en oeuvre d'un tel procede

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7730247A FR2405111A1 (fr) 1977-10-07 1977-10-07 Procede d'usinage par bombardement ionique et dispositif de mise en oeuvre d'un tel procede

Publications (2)

Publication Number Publication Date
FR2405111A1 true FR2405111A1 (fr) 1979-05-04
FR2405111B1 FR2405111B1 (fr) 1980-04-04

Family

ID=9196244

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7730247A Granted FR2405111A1 (fr) 1977-10-07 1977-10-07 Procede d'usinage par bombardement ionique et dispositif de mise en oeuvre d'un tel procede

Country Status (1)

Country Link
FR (1) FR2405111A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2501725A1 (fr) * 1981-03-13 1982-09-17 Balzers Hochvakuum Procede et dispositif pour l'evaporation d'un materiau sous vide
CN113163564A (zh) * 2021-04-30 2021-07-23 中国科学院电工研究所 一种具有静电消除功能的电子束加工装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1521985A1 (de) * 1965-12-07 1969-09-11 Serwatzky Guenther Ionenaetzvorrichtung gemaess nachfolgender Beschreibung

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1521985A1 (de) * 1965-12-07 1969-09-11 Serwatzky Guenther Ionenaetzvorrichtung gemaess nachfolgender Beschreibung

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2501725A1 (fr) * 1981-03-13 1982-09-17 Balzers Hochvakuum Procede et dispositif pour l'evaporation d'un materiau sous vide
CN113163564A (zh) * 2021-04-30 2021-07-23 中国科学院电工研究所 一种具有静电消除功能的电子束加工装置
CN113163564B (zh) * 2021-04-30 2024-06-04 中国科学院电工研究所 一种具有静电消除功能的电子束加工装置

Also Published As

Publication number Publication date
FR2405111B1 (fr) 1980-04-04

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ST Notification of lapse