FR2494865B1 - Masque d'exposition pour rayonnements multiples - Google Patents

Masque d'exposition pour rayonnements multiples

Info

Publication number
FR2494865B1
FR2494865B1 FR8121578A FR8121578A FR2494865B1 FR 2494865 B1 FR2494865 B1 FR 2494865B1 FR 8121578 A FR8121578 A FR 8121578A FR 8121578 A FR8121578 A FR 8121578A FR 2494865 B1 FR2494865 B1 FR 2494865B1
Authority
FR
France
Prior art keywords
exposure mask
multiple radiation
radiation
mask
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8121578A
Other languages
English (en)
Other versions
FR2494865A1 (fr
Inventor
Seiichi Iwamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suwa Seikosha KK
Original Assignee
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suwa Seikosha KK filed Critical Suwa Seikosha KK
Publication of FR2494865A1 publication Critical patent/FR2494865A1/fr
Application granted granted Critical
Publication of FR2494865B1 publication Critical patent/FR2494865B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR8121578A 1980-11-25 1981-11-18 Masque d'exposition pour rayonnements multiples Expired FR2494865B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16551080A JPS5789221A (en) 1980-11-25 1980-11-25 Multiple mask

Publications (2)

Publication Number Publication Date
FR2494865A1 FR2494865A1 (fr) 1982-05-28
FR2494865B1 true FR2494865B1 (fr) 1988-05-20

Family

ID=15813757

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8121578A Expired FR2494865B1 (fr) 1980-11-25 1981-11-18 Masque d'exposition pour rayonnements multiples

Country Status (4)

Country Link
JP (1) JPS5789221A (fr)
DE (1) DE3146559C2 (fr)
FR (1) FR2494865B1 (fr)
GB (1) GB2088084B (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61143757A (ja) * 1984-12-17 1986-07-01 Mitsubishi Electric Corp Ｘ線露光用マスク
JPH0658875B2 (ja) * 1986-06-11 1994-08-03 日本電信電話株式会社 Ｘ線マスク及びそれを用いたパタン形成方法
DE3623637A1 (de) * 1986-07-12 1988-01-21 Kernforschungsz Karlsruhe Verfahren zur herstellung von mikrostrukturen unterschiedlicher strukturhoehe mittels roentgentiefenlithographie
US4865952A (en) * 1986-09-20 1989-09-12 Mitsubishi Denki Kabushiki Kaisha Method of forming a T-shaped control electrode through an X-ray mask
IL88837A (en) * 1988-12-30 1993-08-18 Technion Res & Dev Foundation Method for the preparation of mask for x-ray lithography
US5156942A (en) * 1989-07-11 1992-10-20 Texas Instruments Incorporated Extended source E-beam mask imaging system and method
CN1196175C (zh) 2000-05-25 2005-04-06 凸版印刷株式会社 转印掩模的制造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2193931A (en) * 1936-03-24 1940-03-19 Bela Gaspar Process for producing multicolored photographic images
GB1395718A (en) * 1971-09-16 1975-05-29 Exacta Circuits Ltd Printed circuits
US3930857A (en) * 1973-05-03 1976-01-06 International Business Machines Corporation Resist process
GB1557064A (en) * 1976-09-09 1979-12-05 Mullard Ltd Masks suitable for use in electron image projectors

Also Published As

Publication number Publication date
JPS5789221A (en) 1982-06-03
DE3146559C2 (de) 1985-06-13
GB2088084B (en) 1983-12-21
DE3146559A1 (de) 1982-11-11
GB2088084A (en) 1982-06-03
FR2494865A1 (fr) 1982-05-28

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