FR2880986B1 - Procede de metallisation d'un dispositif semi-conducteur - Google Patents

Procede de metallisation d'un dispositif semi-conducteur

Info

Publication number
FR2880986B1
FR2880986B1 FR0550173A FR0550173A FR2880986B1 FR 2880986 B1 FR2880986 B1 FR 2880986B1 FR 0550173 A FR0550173 A FR 0550173A FR 0550173 A FR0550173 A FR 0550173A FR 2880986 B1 FR2880986 B1 FR 2880986B1
Authority
FR
France
Prior art keywords
metallizing
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0550173A
Other languages
English (en)
Other versions
FR2880986A1 (fr
Inventor
Pierre Jean Ribeyron
Emmanuel Rolland
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR0550173A priority Critical patent/FR2880986B1/fr
Priority to PCT/FR2006/050020 priority patent/WO2006077342A1/fr
Priority to US11/813,721 priority patent/US7947527B2/en
Priority to JP2007551713A priority patent/JP5336086B2/ja
Priority to EP06709407A priority patent/EP1854148A1/fr
Publication of FR2880986A1 publication Critical patent/FR2880986A1/fr
Application granted granted Critical
Publication of FR2880986B1 publication Critical patent/FR2880986B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/164—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells
    • H10F10/165—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells
    • H10F10/166—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells the Group IV-IV heterojunctions being heterojunctions of crystalline and amorphous materials, e.g. silicon heterojunction [SHJ] photovoltaic cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
FR0550173A 2005-01-20 2005-01-20 Procede de metallisation d'un dispositif semi-conducteur Expired - Fee Related FR2880986B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR0550173A FR2880986B1 (fr) 2005-01-20 2005-01-20 Procede de metallisation d'un dispositif semi-conducteur
PCT/FR2006/050020 WO2006077342A1 (fr) 2005-01-20 2006-01-18 Procede de metallisation d'un dispositif semi-conducteur
US11/813,721 US7947527B2 (en) 2005-01-20 2006-01-18 Method for metallization of a semiconductor device
JP2007551713A JP5336086B2 (ja) 2005-01-20 2006-01-18 半導体デバイスの製造方法
EP06709407A EP1854148A1 (fr) 2005-01-20 2006-01-18 Procede de metallissation d'un dispositif semi-conducteur

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0550173A FR2880986B1 (fr) 2005-01-20 2005-01-20 Procede de metallisation d'un dispositif semi-conducteur

Publications (2)

Publication Number Publication Date
FR2880986A1 FR2880986A1 (fr) 2006-07-21
FR2880986B1 true FR2880986B1 (fr) 2007-03-02

Family

ID=34954033

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0550173A Expired - Fee Related FR2880986B1 (fr) 2005-01-20 2005-01-20 Procede de metallisation d'un dispositif semi-conducteur

Country Status (5)

Country Link
US (1) US7947527B2 (fr)
EP (1) EP1854148A1 (fr)
JP (1) JP5336086B2 (fr)
FR (1) FR2880986B1 (fr)
WO (1) WO2006077342A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101154571B1 (ko) 2009-06-15 2012-06-08 엘지이노텍 주식회사 태양전지 모듈 및 이의 제조방법
WO2013140549A1 (fr) * 2012-03-21 2013-09-26 三洋電機株式会社 Cellule solaire et son procédé de fabrication
CN104900539B (zh) * 2015-06-10 2017-06-09 中国电子科技集团公司第十三研究所 实现宽带高效、小尺寸低成本的内匹配器件制作方法
KR102901510B1 (ko) * 2019-11-21 2025-12-17 레이저쎌 주식회사 레이저 리플로우 장치 및 레이저 리플로우 방법

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63308301A (ja) * 1987-06-10 1988-12-15 Matsushita Electric Ind Co Ltd セラミック電子部品などの電極形成方法
JP2740284B2 (ja) 1989-08-09 1998-04-15 三洋電機株式会社 光起電力素子
US5213628A (en) 1990-09-20 1993-05-25 Sanyo Electric Co., Ltd. Photovoltaic device
AU8872891A (en) * 1990-10-15 1992-05-20 United Solar Systems Corporation Monolithic solar cell array and method for its manufacture
JPH06283745A (ja) * 1993-03-25 1994-10-07 Matsushita Electric Ind Co Ltd 太陽電池およびその製造法
DE69534582T2 (de) * 1994-05-19 2006-07-20 Canon K.K. Photovoltaisches Bauelement, Elektrodenstruktur desselben und Herstellungsverfahren
JP2992638B2 (ja) * 1995-06-28 1999-12-20 キヤノン株式会社 光起電力素子の電極構造及び製造方法並びに太陽電池
JPH10173210A (ja) * 1996-12-13 1998-06-26 Canon Inc 電極、その形成方法及び該電極を有する光起電力素子
JP3760361B2 (ja) * 1997-03-24 2006-03-29 株式会社村田製作所 太陽電池用導電性組成物
US6091019A (en) * 1997-09-26 2000-07-18 Sanyo Electric Co., Ltd. Photovoltaic element and manufacturing method thereof
JP4441102B2 (ja) * 1999-11-22 2010-03-31 キヤノン株式会社 光起電力素子及びその製造方法
WO2003005457A1 (fr) * 2001-07-04 2003-01-16 Ebara Corporation Module a piles solaires et procede permettant sa realisation
FR2854497B1 (fr) 2003-04-29 2005-09-02 Commissariat Energie Atomique Procede de realisation d'un dispositif semi-conducteur a metallisations auto-alignees
FR2880989B1 (fr) 2005-01-20 2007-03-09 Commissariat Energie Atomique Dispositif semi-conducteur a heterojonctions et a structure inter-digitee
FR2881879B1 (fr) 2005-02-08 2007-03-09 Commissariat Energie Atomique Procede de realisation de contacts metal/semi-conducteur a travers un dielectrique.

Also Published As

Publication number Publication date
FR2880986A1 (fr) 2006-07-21
US7947527B2 (en) 2011-05-24
JP2008529264A (ja) 2008-07-31
JP5336086B2 (ja) 2013-11-06
WO2006077342A1 (fr) 2006-07-27
EP1854148A1 (fr) 2007-11-14
US20080087319A1 (en) 2008-04-17

Similar Documents

Publication Publication Date Title
FR2872342B1 (fr) Procede de fabrication d'un dispositif semiconducteur
EP1861134A4 (fr) Procede de fabrication de dispositif de protection d'aiguille
EP2259293A4 (fr) Procede de fabrication d'un dispositif a semi-conducteur
EP1756857A4 (fr) Procédé de production d'une plaquette de dispositif semi-conducteur étanche
FR2911865B1 (fr) Procede de realisation d'un capot de protection de composant sur un substrat
EP1946374A4 (fr) Dispositif semi-conducteur et procédé pour le fabriquer
FR2924270B1 (fr) Procede de fabrication d'un dispositif electronique
EP1810334A4 (fr) Dispositif a semi-conducteur
EP1829102A4 (fr) Dispositif a semiconducteur
EP2015353A4 (fr) Dispositif semi-conducteur et procédé de fabrication d'un dispositif semi-conducteur
EP1953824A4 (fr) Dispositif a semi-conducteur
EP1721344A4 (fr) Procede de fabrication d'un dispositif a superjonction
FR2905690B1 (fr) Procede de fabrication d'un dispositif microfluidique.
FR2894783B1 (fr) Dispositif et procede de conception d'un vetement
EP2097926A4 (fr) Procédé de fabrication d'un dispositif d'imagerie semi-conducteur
FR2858714B1 (fr) Procede de fabrication d'un dispositif a semi-conducteur
EP1725496A4 (fr) Procede de fabrication d`un dispositif semi-conducteur
EP1619715A4 (fr) Procede de production d'un dispositif a semi-conducteur
FR2865420B1 (fr) Procede de nettoyage d'un substrat
EP1557888A4 (fr) Dispositif a semi-conducteur et procede permettant de produire ce dispositif
EP1922749A4 (fr) Procede de fabrication d'un dispositif semi-conducteur
FR2919741B1 (fr) Procede de fabrication d'un insert comportant un dispositif rfid
EP1925039A4 (fr) Procede de fabrication d'un dispositif lumineux a semi-conducteur nitrure
EP1830405A4 (fr) Dispositif a semiconducteur
EP1988574A4 (fr) Dispositif a semi-conducteurs

Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20150930