FR2937342B1 - Procede pour le depot continu de revetements et appareil pour la realisation du procede - Google Patents
Procede pour le depot continu de revetements et appareil pour la realisation du procedeInfo
- Publication number
- FR2937342B1 FR2937342B1 FR0957102A FR0957102A FR2937342B1 FR 2937342 B1 FR2937342 B1 FR 2937342B1 FR 0957102 A FR0957102 A FR 0957102A FR 0957102 A FR0957102 A FR 0957102A FR 2937342 B1 FR2937342 B1 FR 2937342B1
- Authority
- FR
- France
- Prior art keywords
- coatings
- carrying
- continuous deposition
- deposition
- continuous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000008021 deposition Effects 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/005—Apparatus specially adapted for electrolytic conversion coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/024—Anodisation under pulsed or modulated current or potential
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/026—Anodisation with spark discharge
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/26—Anodisation of refractory metals or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/30—Anodisation of magnesium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/32—Anodisation of semiconducting materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/34—Anodisation of metals or alloys not provided for in groups C25D11/04 - C25D11/32
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IN1829DE2008 | 2008-10-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2937342A1 FR2937342A1 (fr) | 2010-04-23 |
| FR2937342B1 true FR2937342B1 (fr) | 2015-12-18 |
Family
ID=42096616
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR0957102A Expired - Fee Related FR2937342B1 (fr) | 2008-10-16 | 2009-10-12 | Procede pour le depot continu de revetements et appareil pour la realisation du procede |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8486237B2 (fr) |
| JP (1) | JP5442386B2 (fr) |
| BR (1) | BRPI0904232A2 (fr) |
| DE (1) | DE102009044256A1 (fr) |
| FR (1) | FR2937342B1 (fr) |
| GB (1) | GB2464378B (fr) |
| ZA (1) | ZA200906786B (fr) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012004753A2 (fr) * | 2010-07-06 | 2012-01-12 | Pct Protective Coating Technologies Limited | Articles provenant de procédés par micro-arcs et leurs procédés de fabrication |
| CN102080246B (zh) * | 2010-12-03 | 2012-08-15 | 浙江丰川电子科技有限公司 | 中高压电极箔高速生产装置 |
| KR101534642B1 (ko) | 2012-07-05 | 2015-07-07 | 주식회사 엘지화학 | 딥핑 배스 |
| US10871256B2 (en) | 2015-07-27 | 2020-12-22 | Schlumberger Technology Corporation | Property enhancement of surfaces by electrolytic micro arc oxidation |
| FR3040712B1 (fr) * | 2015-09-03 | 2019-12-13 | Montupet S.A. | Procede ameliore de formation d'un revetement de conduit de culasse et culasse ainsi obtenue |
| US10602133B2 (en) * | 2016-10-04 | 2020-03-24 | Facebook, Inc. | Controls and interfaces for user interactions in virtual spaces |
| CN110029385B (zh) * | 2019-04-07 | 2021-01-15 | 佛山市现代铜铝型材有限公司 | 铝合金加工的表面阳极氧化处理装置 |
| CN112195490B (zh) * | 2020-09-22 | 2021-06-29 | 盐城市新澳精密锻造有限公司 | 一种用于氧化膜的生产系统 |
| CN112813477A (zh) * | 2020-12-24 | 2021-05-18 | 西比里电机技术(苏州)有限公司 | 一种移动工件式热电化学氧化的方法及设备 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1003588A (en) * | 1963-12-19 | 1965-09-08 | Gen Electric | Improvements in control of composition of electrodeposits |
| JPS5853080B2 (ja) * | 1976-04-28 | 1983-11-26 | スプラギユ−・エレクトリツク・カンパニ− | 酸化物膜形成方法 |
| JPS5481133A (en) * | 1977-12-12 | 1979-06-28 | Fuji Photo Film Co Ltd | Anodic oxidation device |
| US4248674A (en) * | 1979-09-20 | 1981-02-03 | Leyh Henry W | Anodizing method and apparatus |
| JPS5915999B2 (ja) * | 1982-04-02 | 1984-04-12 | メイバン工芸株式会社 | アルミニウム又はその合金から成る金属箔の陽極酸化処理装置 |
| JPS59215500A (ja) * | 1983-05-19 | 1984-12-05 | Fuji Photo Film Co Ltd | 電解処理方法 |
| JPS60100697A (ja) * | 1983-11-02 | 1985-06-04 | Fuji Photo Film Co Ltd | 電解処理方法 |
| JPH03203219A (ja) * | 1989-12-28 | 1991-09-04 | Elna Co Ltd | アルミニウム電極箔の製造方法およびエッチング槽 |
| IL109857A (en) | 1994-06-01 | 1998-06-15 | Almag Al | Electrolytic process and apparatus for coating metals |
| US5804053A (en) * | 1995-12-07 | 1998-09-08 | Eltech Systems Corporation | Continuously electroplated foam of improved weight distribution |
| US6197178B1 (en) * | 1999-04-02 | 2001-03-06 | Microplasmic Corporation | Method for forming ceramic coatings by micro-arc oxidation of reactive metals |
| US6726825B2 (en) * | 2000-04-07 | 2004-04-27 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for manufacturing positive electrode foil of aluminum electrolytic capacitor |
| FR2808291B1 (fr) * | 2000-04-26 | 2003-05-23 | Mofratech | Procede electrolytique d'oxydation pour l'obtention d'un revetement ceramique a la surface d'un metal |
| JP2002363799A (ja) * | 2001-06-11 | 2002-12-18 | Fuji Photo Film Co Ltd | アルミニウム板、平版印刷版用支持体の製造方法、平版印刷版用支持体、および平版印刷原版 |
| US6893551B2 (en) * | 2001-11-22 | 2005-05-17 | International Advanced Research Centre For Powder Metallurgy And New Materials (Arci) | Process for forming coatings on metallic bodies and an apparatus for carrying out the process |
| US6919012B1 (en) * | 2003-03-25 | 2005-07-19 | Olimex Group, Inc. | Method of making a composite article comprising a ceramic coating |
| JP4365415B2 (ja) * | 2004-01-12 | 2009-11-18 | アレクサンドロビチ ニキフォロフ,アレクセイ | マイクロアーク酸化によるバルブ金属部品の高接着性の厚い保護コーティングを生産する方法 |
-
2009
- 2009-09-30 ZA ZA200906786A patent/ZA200906786B/en unknown
- 2009-10-02 GB GB0917306.3A patent/GB2464378B/en not_active Expired - Fee Related
- 2009-10-12 FR FR0957102A patent/FR2937342B1/fr not_active Expired - Fee Related
- 2009-10-14 US US12/579,002 patent/US8486237B2/en not_active Expired - Fee Related
- 2009-10-15 BR BRPI0904232-6A patent/BRPI0904232A2/pt not_active IP Right Cessation
- 2009-10-15 JP JP2009237921A patent/JP5442386B2/ja not_active Expired - Fee Related
- 2009-10-15 DE DE102009044256A patent/DE102009044256A1/de not_active Withdrawn
-
2012
- 2012-08-17 US US13/587,960 patent/US9365945B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20100163421A1 (en) | 2010-07-01 |
| US8486237B2 (en) | 2013-07-16 |
| US20120305402A1 (en) | 2012-12-06 |
| GB2464378B (en) | 2013-05-15 |
| JP2010156040A (ja) | 2010-07-15 |
| GB0917306D0 (en) | 2009-11-18 |
| US9365945B2 (en) | 2016-06-14 |
| GB2464378A (en) | 2010-04-21 |
| JP5442386B2 (ja) | 2014-03-12 |
| ZA200906786B (en) | 2010-05-26 |
| BRPI0904232A2 (pt) | 2010-09-14 |
| DE102009044256A1 (de) | 2010-05-12 |
| FR2937342A1 (fr) | 2010-04-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PLFP | Fee payment |
Year of fee payment: 7 |
|
| ST | Notification of lapse |
Effective date: 20170630 |