FR2964334B1 - Procede et dispositif de depollution d'un photomasque pellicule - Google Patents

Procede et dispositif de depollution d'un photomasque pellicule

Info

Publication number
FR2964334B1
FR2964334B1 FR1057120A FR1057120A FR2964334B1 FR 2964334 B1 FR2964334 B1 FR 2964334B1 FR 1057120 A FR1057120 A FR 1057120A FR 1057120 A FR1057120 A FR 1057120A FR 2964334 B1 FR2964334 B1 FR 2964334B1
Authority
FR
France
Prior art keywords
depolluting
film photomask
photomask
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1057120A
Other languages
English (en)
Other versions
FR2964334A1 (fr
Inventor
Arnaud Favre
Rabah Smail Hadj
Julien Bounouar
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pfeiffer Vacuum SAS
Original Assignee
Alcatel Lucent SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1057120A priority Critical patent/FR2964334B1/fr
Application filed by Alcatel Lucent SAS filed Critical Alcatel Lucent SAS
Priority to JP2013527580A priority patent/JP2013539559A/ja
Priority to EP11764121.7A priority patent/EP2614407A1/fr
Priority to KR1020137008783A priority patent/KR20130123379A/ko
Priority to US13/819,408 priority patent/US20130152977A1/en
Priority to PCT/EP2011/065408 priority patent/WO2012032059A1/fr
Priority to TW100132232A priority patent/TW201226065A/zh
Publication of FR2964334A1 publication Critical patent/FR2964334A1/fr
Application granted granted Critical
Publication of FR2964334B1 publication Critical patent/FR2964334B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0428—Apparatus for mechanical treatment or grinding or cutting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR1057120A 2010-09-08 2010-09-08 Procede et dispositif de depollution d'un photomasque pellicule Expired - Fee Related FR2964334B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR1057120A FR2964334B1 (fr) 2010-09-08 2010-09-08 Procede et dispositif de depollution d'un photomasque pellicule
EP11764121.7A EP2614407A1 (fr) 2010-09-08 2011-09-06 Procédé et dispositif pour la dépollution d'un réticule en pellicule
KR1020137008783A KR20130123379A (ko) 2010-09-08 2011-09-06 펠리클을 갖춘 레티클의 오염 제거 방법 및 장치
US13/819,408 US20130152977A1 (en) 2010-09-08 2011-09-06 Method And Device for The Depollution Of A Pelliculated Reticle
JP2013527580A JP2013539559A (ja) 2010-09-08 2011-09-06 ペリクルを付したレチクルの汚染を除去する方法および装置
PCT/EP2011/065408 WO2012032059A1 (fr) 2010-09-08 2011-09-06 Procédé et dispositif pour la dépollution d'un réticule en pellicule
TW100132232A TW201226065A (en) 2010-09-08 2011-09-07 Method and device for the depollution of a pelliculated reticle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1057120A FR2964334B1 (fr) 2010-09-08 2010-09-08 Procede et dispositif de depollution d'un photomasque pellicule

Publications (2)

Publication Number Publication Date
FR2964334A1 FR2964334A1 (fr) 2012-03-09
FR2964334B1 true FR2964334B1 (fr) 2012-09-14

Family

ID=43981118

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1057120A Expired - Fee Related FR2964334B1 (fr) 2010-09-08 2010-09-08 Procede et dispositif de depollution d'un photomasque pellicule

Country Status (7)

Country Link
US (1) US20130152977A1 (fr)
EP (1) EP2614407A1 (fr)
JP (1) JP2013539559A (fr)
KR (1) KR20130123379A (fr)
FR (1) FR2964334B1 (fr)
TW (1) TW201226065A (fr)
WO (1) WO2012032059A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2954583B1 (fr) 2009-12-18 2017-11-24 Alcatel Lucent Procede et dispositif de pilotage de fabrication de semi conducteurs par mesure de contamination
FR2961946B1 (fr) 2010-06-29 2012-08-03 Alcatel Lucent Dispositif de traitement pour boites de transport et de stockage
CN112934850A (zh) * 2021-01-26 2021-06-11 泉芯集成电路制造(济南)有限公司 光罩杂质去除设备和光罩杂质去除方法
US20230359116A1 (en) * 2022-05-06 2023-11-09 Intel Corporation System and process for cleaning a membrane

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4237767A1 (de) * 1992-11-09 1994-05-11 Siemens Ag Verfahren und Vorrichtung zum Reinigen von Bauteiloberflächen, insbesondere von mit Partikeln kontaminierten hochreinen Oberflächen von für die Elektronikfertigung bestimmten Bauteilen, wie Masken, Wafern od. dgl.
JPH11188329A (ja) * 1997-12-26 1999-07-13 Ums:Kk 処理装置
DE19941399A1 (de) * 1999-08-31 2001-04-19 Infineon Technologies Ag Reinigung von Stencilmasken mit Hilfe einer durch Maskenöffnungen hindurchtretenden Gasströmung
US6791661B2 (en) * 1999-12-09 2004-09-14 Nikon Corporation Gas replacement method and apparatus, and exposure method and apparatus
JP2001267200A (ja) * 2000-03-14 2001-09-28 Nikon Corp ガス置換方法及び装置、並びに露光方法及び装置
JP2002372777A (ja) * 2001-06-18 2002-12-26 Canon Inc ガス置換方法および露光装置
WO2003034475A1 (fr) * 2001-10-10 2003-04-24 Nikon Corporation Procede et dispositif de substitution de gaz, dispositif de protection de masque, masque, ainsi que procede et dispositif d'exposition
JP2006060037A (ja) * 2004-08-20 2006-03-02 Canon Inc 露光装置
KR100719373B1 (ko) * 2005-08-11 2007-05-17 삼성전자주식회사 반도체 노광 설비 및 펠리클 검사 방법
JPWO2007094197A1 (ja) * 2006-02-16 2009-07-02 株式会社ニコン 保護装置、マスク及び露光装置
FR2908674A1 (fr) * 2007-01-29 2008-05-23 Alcatel Sa Dispositif de nettoyage et de depollution d'un objet a environnement confine non etanche limite par une paroi a membrane souple

Also Published As

Publication number Publication date
TW201226065A (en) 2012-07-01
WO2012032059A1 (fr) 2012-03-15
FR2964334A1 (fr) 2012-03-09
US20130152977A1 (en) 2013-06-20
EP2614407A1 (fr) 2013-07-17
KR20130123379A (ko) 2013-11-12
JP2013539559A (ja) 2013-10-24

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Legal Events

Date Code Title Description
TP Transmission of property

Owner name: ADIXEN VACUUM PRODUCTS, FR

Effective date: 20120709

PLFP Fee payment

Year of fee payment: 6

CD Change of name or company name

Owner name: PFEIFFER VACUUM, FR

Effective date: 20160120

ST Notification of lapse

Effective date: 20170531