FR3135330B1 - Procédé de fabrication de microlentilles - Google Patents

Procédé de fabrication de microlentilles

Info

Publication number
FR3135330B1
FR3135330B1 FR2204255A FR2204255A FR3135330B1 FR 3135330 B1 FR3135330 B1 FR 3135330B1 FR 2204255 A FR2204255 A FR 2204255A FR 2204255 A FR2204255 A FR 2204255A FR 3135330 B1 FR3135330 B1 FR 3135330B1
Authority
FR
France
Prior art keywords
microlens structures
manufacturing process
deformation
formation
convex shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR2204255A
Other languages
English (en)
Other versions
FR3135330A1 (fr
Inventor
Jonathan Fantuz
Alain Inard
Didier Dutartre
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics Crolles 2 SAS
Original Assignee
STMicroelectronics Crolles 2 SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics Crolles 2 SAS filed Critical STMicroelectronics Crolles 2 SAS
Priority to FR2204255A priority Critical patent/FR3135330B1/fr
Priority to US18/298,781 priority patent/US20230361151A1/en
Publication of FR3135330A1 publication Critical patent/FR3135330A1/fr
Application granted granted Critical
Publication of FR3135330B1 publication Critical patent/FR3135330B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/024Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/0056Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/806Optical elements or arrangements associated with the image sensors
    • H10F39/8063Microlenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

Selon un aspect, il est proposé un procédé de fabrication d’un dispositif optique sur un substrat support (SUB), comprenant une formation d’une pluralité de microlentille comportant : - une formation de premières structures de microlentille (LS1) par photolithographie (PTH_LITO1) sur le substrat support (SUB), puis par une déformation des premières structures de microlentille (LS1) de façon à donner une forme bombée aux premières structures de microlentille (LS1), les premières structures de microlentille (LS1) étant séparées les unes des autres par des régions d’espacement (GP) après déformation, puis - une formation de deuxièmes structures de microlentille (LS2) par photolithographie (PTH_LITO2) puis par déformation des deuxièmes structures de microlentille (LS2) de sorte que les deuxièmes structures de microlentille (LS2) présentent une forme bombée épousant la forme bombée desdites premières structures de microlentille (LS1) et s’étendent en partie dans les régions d’espacement (GP) entre les premières structures de microlentille (LS1). Figure pour l’abrégé : Fig 9
FR2204255A 2022-05-05 2022-05-05 Procédé de fabrication de microlentilles Active FR3135330B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR2204255A FR3135330B1 (fr) 2022-05-05 2022-05-05 Procédé de fabrication de microlentilles
US18/298,781 US20230361151A1 (en) 2022-05-05 2023-04-11 Method for manufacturing microlenses

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2204255 2022-05-05
FR2204255A FR3135330B1 (fr) 2022-05-05 2022-05-05 Procédé de fabrication de microlentilles

Publications (2)

Publication Number Publication Date
FR3135330A1 FR3135330A1 (fr) 2023-11-10
FR3135330B1 true FR3135330B1 (fr) 2025-11-07

Family

ID=82319824

Family Applications (1)

Application Number Title Priority Date Filing Date
FR2204255A Active FR3135330B1 (fr) 2022-05-05 2022-05-05 Procédé de fabrication de microlentilles

Country Status (2)

Country Link
US (1) US20230361151A1 (fr)
FR (1) FR3135330B1 (fr)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2803395A1 (fr) * 1999-12-30 2001-07-06 Commissariat Energie Atomique Microsysteme optique solide a face plane et procede de realisation d'un tel microsysteme
JP2015065268A (ja) * 2013-09-25 2015-04-09 ソニー株式会社 レンズアレイおよびその製造方法、固体撮像装置、並びに電子機器
US20200348455A1 (en) * 2019-05-03 2020-11-05 Semiconductor Components Industries, Llc Imaging systems with improved microlenses

Also Published As

Publication number Publication date
FR3135330A1 (fr) 2023-11-10
US20230361151A1 (en) 2023-11-09

Similar Documents

Publication Publication Date Title
US9142806B2 (en) Mask and method for forming the same
US10662519B2 (en) Mask, method for manufacturing the same, and mask assembly
US9502306B2 (en) Pattern formation method that includes partially removing line and space pattern
WO2019051931A1 (fr) Plaque de masque et procédés de fabrication et d'évaporation associés
US11063181B2 (en) Patterned epitaxial substrate and semiconductor structure
CN109950201B (zh) 光电器件外延结构的制造方法
US20040150172A1 (en) Substrate holding device
FR3120985B1 (fr) Procédé de fabrication d’une hétérostructure
FR3135330B1 (fr) Procédé de fabrication de microlentilles
JP2821678B2 (ja) 基板の吸着装置
TWI704411B (zh) 光罩、對應之間隔物結構及應用其之液晶面板
US10649338B2 (en) Stepped wafer and method for manufacturing stepped wafer
CN111512461A (zh) 沉积掩模
KR20200042163A (ko) 마스크 장치 및 이의 제조 방법
US20190341265A1 (en) Mask and fabrication method thereof
US5567552A (en) Method for fabricating a phase shift mask
CN109830511A (zh) 掩膜板制作方法及掩膜板
FR3112421B1 (fr) Procédé de réalisation d’une structure d’isolation
CN108011003A (zh) 一种led芯片的光刻结构制作方法
US20050012107A1 (en) [led device ]
KR102388724B1 (ko) 증착용 마스크 제조 방법
FR3111628B1 (fr) Procédé de fabrication d’un dispositif microélectronique comprenant une membrane suspendue au-dessus d’une cavité
JP2019007069A (ja) 蒸着マスク
KR102916306B1 (ko) Oled용 마스크 및 그 제조방법
CN113186490A (zh) 一种具有多层结构的掩膜板

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 2

PLSC Publication of the preliminary search report

Effective date: 20231110

PLFP Fee payment

Year of fee payment: 3

PLFP Fee payment

Year of fee payment: 4