FR3140888B1 - Procede de depot de revetement - Google Patents

Procede de depot de revetement Download PDF

Info

Publication number
FR3140888B1
FR3140888B1 FR2210459A FR2210459A FR3140888B1 FR 3140888 B1 FR3140888 B1 FR 3140888B1 FR 2210459 A FR2210459 A FR 2210459A FR 2210459 A FR2210459 A FR 2210459A FR 3140888 B1 FR3140888 B1 FR 3140888B1
Authority
FR
France
Prior art keywords
target
coated
deposition process
coating deposition
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR2210459A
Other languages
English (en)
Other versions
FR3140888A1 (fr
Inventor
Mathilde Millot
Marjorie Christine Cavarroc
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Safran SA
Original Assignee
Safran SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Safran SA filed Critical Safran SA
Priority to FR2210459A priority Critical patent/FR3140888B1/fr
Publication of FR3140888A1 publication Critical patent/FR3140888A1/fr
Application granted granted Critical
Publication of FR3140888B1 publication Critical patent/FR3140888B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C23C14/226—Oblique incidence of vaporised material on substrate in order to form films with columnar structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Dispositif de dépôt PVD ou PECVD comportant une enceinte (25) dans laquelle se trouve une pièce (22) à revêtir montée mobile sur un support (24), et une cible (20) d’un matériau d’un revêtement à évaporer et déposer sur la pièce, le dispositif comportant un masque (21) pourvu d’une lumière (23) en regard de la pièce (22) à revêtir et fixe par rapport à la cible (20), ledit masque étant disposé entre la cible et la pièce de sorte qu’un mouvement de la pièce derrière la lumière définisse sur la pièce une zone revêtue homogène à dépôt colonnaire.
FR2210459A 2022-10-12 2022-10-12 Procede de depot de revetement Active FR3140888B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR2210459A FR3140888B1 (fr) 2022-10-12 2022-10-12 Procede de depot de revetement

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2210459A FR3140888B1 (fr) 2022-10-12 2022-10-12 Procede de depot de revetement
FR2210459 2022-10-12

Publications (2)

Publication Number Publication Date
FR3140888A1 FR3140888A1 (fr) 2024-04-19
FR3140888B1 true FR3140888B1 (fr) 2025-05-16

Family

ID=85569642

Family Applications (1)

Application Number Title Priority Date Filing Date
FR2210459A Active FR3140888B1 (fr) 2022-10-12 2022-10-12 Procede de depot de revetement

Country Status (1)

Country Link
FR (1) FR3140888B1 (fr)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4622271A (en) * 1984-04-20 1986-11-11 Fuji Photo Film Co., Ltd. Magnetic recording medium
US5638197A (en) * 1994-04-04 1997-06-10 Rockwell International Corp. Inorganic thin film compensator for improved gray scale performance in twisted nematic liquid crystal displays and method of making
WO1998024944A1 (fr) * 1996-12-06 1998-06-11 THEVA DüNNSCHICHTTECHNIK GMBH Materiau stratifie, procede et dispositif de production de materiau stratifie
JP2008065917A (ja) * 2006-09-08 2008-03-21 Tdk Corp 磁気記録媒体、磁気記録媒体製造装置および磁気記録媒体製造方法
US20080075856A1 (en) * 2006-09-27 2008-03-27 Seiko Epson Corporation Deposition apparatus, deposition method, method of manufacturing liquid crystal device
WO2008108477A1 (fr) * 2007-03-02 2008-09-12 Canon Kabushiki Kaisha Procédé de formation de couche et processus de fabrication de dispositif d'affichage à cristaux liquides
US10690992B2 (en) * 2017-04-05 2020-06-23 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Chalcogenide glass waveguides for refractive non-mechanical beam steerer

Also Published As

Publication number Publication date
FR3140888A1 (fr) 2024-04-19

Similar Documents

Publication Publication Date Title
US4315960A (en) Method of making a thin film
US6244212B1 (en) Electron beam evaporation assembly for high uniform thin film
US6712492B2 (en) Spread illuminating apparatus with light reflection-diffusion layer on optical path conversion means
US20080283394A1 (en) Magnetron sputtering target
FR2354393A1 (fr) Procede et dispositif de pulverisation cathodique reactive
FR3140888B1 (fr) Procede de depot de revetement
JP2001525603A (ja) 化学的気相成長装置および方法
KR910001911A (ko) 막형성장치 및 방법
KR960026266A (ko) 원통형 스퍼터링 차폐물
WO2019051975A1 (fr) Dispositif d'exposition à des rayons ultraviolets
FR2399732A1 (fr) Ensemble cathodique a cible pour equipements de pulverisation de couches dielectriques ou amagnetiques sur des substrats
TW201312628A (zh) 光罩配置、用以在基板上沉積層體的裝置及其方法
US20050231982A1 (en) Light-guidance plate for liquid crystal display
KR20170000266U (ko) 기판 에지 마스킹 시스템
US20050006223A1 (en) Sputter deposition masking and methods
WO2015096855A1 (fr) Agencements de support destinés à des substrats
TWI657532B (zh) 基板固持件
KR940016462A (ko) 조준형 침착 장치
TWI816883B (zh) 蒸鍍裝置
KR20190009530A (ko) 증착 장치
CN116171336A (zh) 蒸气源、用于蒸气源的喷嘴、真空沉积系统和用于沉积蒸镀材料的方法
JP6591570B2 (ja) 基板用セルフロックホルダ
CN108060397A (zh) 一种基于不规则源材的表面梯度薄膜制备装置
KR102339795B1 (ko) 이동가능 마스킹 엘리먼트
CN223852744U (zh) 一种镀膜修正框架及镀膜修正结构

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 2

PLSC Publication of the preliminary search report

Effective date: 20240419

PLFP Fee payment

Year of fee payment: 3

PLFP Fee payment

Year of fee payment: 4