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MAXIME JEAN TAMARIT
Original Assignee
MAXIME JEAN TAMARIT
Filing date
Publication date
Application filed by MAXIME JEAN TAMARITfiledCriticalMAXIME JEAN TAMARIT
Application grantedgrantedCritical
Publication of FR413569ApublicationCriticalpatent/FR413569A/fr
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
G03F1/92—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
FR413569A1909-05-28Procédé pour l'obtention de clichés typographiques
ExpiredFR413569A
(fr)