HK1237892B - 曝光装置、曝光方法、以及装置制造方法 - Google Patents

曝光装置、曝光方法、以及装置制造方法 Download PDF

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Publication number
HK1237892B
HK1237892B HK17111755.3A HK17111755A HK1237892B HK 1237892 B HK1237892 B HK 1237892B HK 17111755 A HK17111755 A HK 17111755A HK 1237892 B HK1237892 B HK 1237892B
Authority
HK
Hong Kong
Prior art keywords
substrate
liquid
projection optical
optical system
exposure
Prior art date
Application number
HK17111755.3A
Other languages
German (de)
English (en)
French (fr)
Other versions
HK1237892A1 (zh
Inventor
Masahiko Yasuda
Takahiro Masada
Yuho Kanaya
Tadashi Nagayama
Kenichi Shiraishi
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of HK1237892A1 publication Critical patent/HK1237892A1/zh
Publication of HK1237892B publication Critical patent/HK1237892B/zh

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HK17111755.3A 2003-10-09 2017-11-14 曝光装置、曝光方法、以及装置制造方法 HK1237892B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003350628 2003-10-09
JP2004045103 2004-02-20

Publications (2)

Publication Number Publication Date
HK1237892A1 HK1237892A1 (zh) 2018-04-20
HK1237892B true HK1237892B (zh) 2019-07-05

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