HUE045344T2 - Mangán(III)-ionok elõállítása elektrolitikai úton erõs kénsavban - Google Patents

Mangán(III)-ionok elõállítása elektrolitikai úton erõs kénsavban

Info

Publication number
HUE045344T2
HUE045344T2 HUE14779082A HUE14779082A HUE045344T2 HU E045344 T2 HUE045344 T2 HU E045344T2 HU E14779082 A HUE14779082 A HU E14779082A HU E14779082 A HUE14779082 A HU E14779082A HU E045344 T2 HUE045344 T2 HU E045344T2
Authority
HU
Hungary
Prior art keywords
electrolysis
manganese
ions
iii
production
Prior art date
Application number
HUE14779082A
Other languages
English (en)
Inventor
Trevor Pearson
Terence Clarke
Roshan Chapaneri
Craig Robinson
Alison Hyslop
Amrik Singh
Original Assignee
Macdermid Acumen Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/795,382 external-priority patent/US9534306B2/en
Application filed by Macdermid Acumen Inc filed Critical Macdermid Acumen Inc
Publication of HUE045344T2 publication Critical patent/HUE045344T2/hu

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/21Manganese oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073Multistep pretreatment
    • C23C18/2086Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • C23C18/24Roughening, e.g. by etching using acid aqueous solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/042Electrodes formed of a single material
    • C25B11/043Carbon, e.g. diamond or graphene
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
    • C25B11/081Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00Operating or servicing cells
    • C25B15/02Process control or regulation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54Electroplating of non-metallic surfaces
    • C25D5/56Electroplating of non-metallic surfaces of plastics

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Chemically Coating (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
HUE14779082A 2013-03-12 2014-03-07 Mangán(III)-ionok elõállítása elektrolitikai úton erõs kénsavban HUE045344T2 (hu)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/795,382 US9534306B2 (en) 2012-01-23 2013-03-12 Electrolytic generation of manganese (III) ions in strong sulfuric acid

Publications (1)

Publication Number Publication Date
HUE045344T2 true HUE045344T2 (hu) 2019-12-30

Family

ID=51658840

Family Applications (1)

Application Number Title Priority Date Filing Date
HUE14779082A HUE045344T2 (hu) 2013-03-12 2014-03-07 Mangán(III)-ionok elõállítása elektrolitikai úton erõs kénsavban

Country Status (18)

Country Link
EP (1) EP2971260B1 (hu)
JP (1) JP6167222B2 (hu)
KR (1) KR101749947B1 (hu)
CN (1) CN105209667B (hu)
AU (1) AU2014249521B2 (hu)
BR (1) BR112015021067B1 (hu)
CA (2) CA2955467C (hu)
DK (1) DK2971260T3 (hu)
ES (1) ES2745071T3 (hu)
HR (1) HRP20191626T1 (hu)
HU (1) HUE045344T2 (hu)
LT (1) LT2971260T (hu)
MX (1) MX379432B (hu)
PL (1) PL2971260T3 (hu)
PT (1) PT2971260T (hu)
SI (1) SI2971260T1 (hu)
TW (1) TWI489007B (hu)
WO (1) WO2014164272A1 (hu)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9267077B2 (en) * 2013-04-16 2016-02-23 Rohm And Haas Electronic Materials Llc Chrome-free methods of etching organic polymers with mixed acid solutions
BR112015016031A2 (pt) * 2013-10-22 2017-07-11 Okuno Chem Ind Co composição para tratamento de decapagem de material de resina
CN105483715B (zh) * 2015-12-09 2018-01-30 哈尔滨工业大学 镁金属表面微‑纳米复合多级孔材料的模板‑3d刻蚀制备方法
CN106830204B (zh) * 2017-03-13 2020-04-28 重庆大学 一种电化学阴极激发高锰酸盐降解水中污染物的方法及装置
CN110869529B (zh) * 2017-07-10 2021-07-06 Srg全球有限责任公司 不含六价铬的蚀刻锰回收系统
CN109256180B (zh) * 2018-07-03 2022-02-11 南昌立德生物技术有限公司 一种计算机辅助先导药物优化设计的敏感性分析算法
JP7336126B2 (ja) * 2019-03-11 2023-08-31 国立研究開発法人産業技術総合研究所 高価数マンガンの製造方法、及び製造装置
EP3825441A1 (en) * 2019-11-21 2021-05-26 COVENTYA S.p.A. An electrolytic treatment device for preparing plastic parts to be metallized and a method for etching plastic parts
US11842958B2 (en) * 2022-03-18 2023-12-12 Chun-Ming Lin Conductive structure including copper-phosphorous alloy and a method of manufacturing conductive structure

Family Cites Families (24)

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US3065155A (en) 1960-09-02 1962-11-20 Manganese Chemicals Corp Electrolytic manganese dioxide process
US3793171A (en) * 1970-09-04 1974-02-19 Carrier Corp Process for removing pollutants from gas streams
JPS51764A (ja) * 1974-06-25 1976-01-06 Mitsui Mining & Smelting Co Mudenkaidometsukihaisuino shorihoho
US3941677A (en) * 1974-06-27 1976-03-02 Carrier Corporation Electrolytic regeneration cell
AU4083878A (en) * 1977-11-02 1980-04-24 Diamond Shamrock Techn Dislodging electrolytic manganese dioxide
US4279705A (en) * 1980-02-19 1981-07-21 Kerr-Mcgee Corporation Process for oxidizing a metal of variable valence by constant current electrolysis
JPS6013087A (ja) * 1983-07-05 1985-01-23 Kawasaki Kasei Chem Ltd 硫酸第一セリウムの電解法
JPS6447890A (en) * 1987-08-13 1989-02-22 Kenzo Yamaguchi Electrolytic synthesis method
US5213665A (en) * 1988-02-29 1993-05-25 Nippon Shokubai Kagaku Kogyo, Co., Ltd. Process for producing 1-aminoanthraquinones
US4911802A (en) * 1988-03-09 1990-03-27 Macdermid, Incorporated Conversion of manganate to permanganate
US4936970A (en) * 1988-11-14 1990-06-26 Ebonex Technologies, Inc. Redox reactions in an electrochemical cell including an electrode comprising Magneli phase titanium oxide
US5318803A (en) * 1990-11-13 1994-06-07 International Business Machines Corporation Conditioning of a substrate for electroless plating thereon
JPH05112872A (ja) * 1991-10-21 1993-05-07 Okuno Seiyaku Kogyo Kk ポリイミド系樹脂の無電解めつき方法及びプリエツチング用組成物
US5246553A (en) * 1992-03-05 1993-09-21 Hydro-Quebec Tetravalent titanium electrolyte and trivalent titanium reducing agent obtained thereby
JP3806181B2 (ja) * 1996-05-31 2006-08-09 株式会社大和化成研究所 ナフタレンアルデヒド類の製造方法
GB9714275D0 (en) * 1997-07-08 1997-09-10 Ciba Geigy Ag Oxidation process
US6616828B2 (en) * 2001-08-06 2003-09-09 Micron Technology, Inc. Recovery method for platinum plating bath
EP1824945A4 (en) * 2004-11-19 2008-08-06 Honeywell Int Inc CHEMICALS FOR SELECTIVE REMOVAL FOR SEMICONDUCTOR APPLICATIONS, METHODS OF MANUFACTURE AND IDOINE USES
JP5585980B2 (ja) * 2007-05-22 2014-09-10 奥野製薬工業株式会社 樹脂成形体に対する無電解めっきの前処理方法、樹脂成形体に対するめっき方法、及び前処理剤
DE502007001745D1 (de) * 2007-08-10 2009-11-26 Enthone Chromfreie Beize für Kunststoffoberflächen
CA2748146C (en) * 2010-03-12 2012-10-02 Sumitomo Electric Industries, Ltd. Redox flow battery
US10260000B2 (en) * 2012-01-23 2019-04-16 Macdermid Acumen, Inc. Etching of plastic using acidic solutions containing trivalent manganese
US8603352B1 (en) * 2012-10-25 2013-12-10 Rohm and Haas Electroncis Materials LLC Chrome-free methods of etching organic polymers
CN104838044B (zh) * 2012-11-15 2017-12-05 麦克德米德尖端有限公司 在强硫酸中电解产生锰(iii)离子

Also Published As

Publication number Publication date
TW201500593A (zh) 2015-01-01
EP2971260A1 (en) 2016-01-20
SI2971260T1 (sl) 2019-12-31
CA2955467A1 (en) 2014-10-09
AU2014249521B2 (en) 2018-03-01
CA2901589A1 (en) 2014-10-09
MX2015012584A (es) 2016-01-14
ES2745071T3 (es) 2020-02-27
TWI489007B (zh) 2015-06-21
HRP20191626T1 (hr) 2019-12-13
PT2971260T (pt) 2019-09-27
MX379432B (es) 2025-03-10
KR101749947B1 (ko) 2017-06-22
BR112015021067A2 (pt) 2017-07-18
DK2971260T3 (da) 2019-09-23
BR112015021067B1 (pt) 2021-06-08
PL2971260T3 (pl) 2020-03-31
EP2971260A4 (en) 2017-04-19
JP2016512574A (ja) 2016-04-28
AU2014249521A1 (en) 2015-08-27
LT2971260T (lt) 2019-09-25
CN105209667A (zh) 2015-12-30
WO2014164272A1 (en) 2014-10-09
CA2955467C (en) 2021-03-16
EP2971260B1 (en) 2019-06-19
JP6167222B2 (ja) 2017-07-19
CA2901589C (en) 2019-01-22
CN105209667B (zh) 2017-12-05
KR20150126935A (ko) 2015-11-13

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