ID19647A - RESIN PHOTOSENSITIVE COMPOSITION AND COATING COMPOSITION - Google Patents

RESIN PHOTOSENSITIVE COMPOSITION AND COATING COMPOSITION

Info

Publication number
ID19647A
ID19647A IDP970837A ID970837A ID19647A ID 19647 A ID19647 A ID 19647A ID P970837 A IDP970837 A ID P970837A ID 970837 A ID970837 A ID 970837A ID 19647 A ID19647 A ID 19647A
Authority
ID
Indonesia
Prior art keywords
composition
resin photosensitive
coating composition
coating
photosensitive composition
Prior art date
Application number
IDP970837A
Other languages
Indonesian (id)
Inventor
Stuart Arthur Harris
Theodorus Kessler
Albertus Koster
Gerardus Fransicus Jos Pouwels
Original Assignee
Stork Screens Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stork Screens Bv filed Critical Stork Screens Bv
Publication of ID19647A publication Critical patent/ID19647A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Paints Or Removers (AREA)
IDP970837A 1996-03-15 1997-03-14 RESIN PHOTOSENSITIVE COMPOSITION AND COATING COMPOSITION ID19647A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL1002627A NL1002627C2 (en) 1996-03-15 1996-03-15 Photosensitive resin composition and this composition comprising lacquer.

Publications (1)

Publication Number Publication Date
ID19647A true ID19647A (en) 1998-07-23

Family

ID=19762507

Family Applications (1)

Application Number Title Priority Date Filing Date
IDP970837A ID19647A (en) 1996-03-15 1997-03-14 RESIN PHOTOSENSITIVE COMPOSITION AND COATING COMPOSITION

Country Status (4)

Country Link
AU (1) AU2046097A (en)
ID (1) ID19647A (en)
NL (1) NL1002627C2 (en)
WO (1) WO1997034198A1 (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3481738A (en) * 1966-09-21 1969-12-02 Ball Brothers Co Inc Presensitized photoengraving plate and method of making same
JPS5637244B2 (en) * 1973-02-13 1981-08-29
US4272620A (en) * 1978-08-09 1981-06-09 Agency Of Industrial Science And Technology Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
US4564580A (en) * 1983-06-30 1986-01-14 Kogyo Gijutsuin Photosensitive resin composition
US5053315A (en) * 1990-07-17 1991-10-01 Eastman Kodak Company Radiation-sensitive composition containing an unsaturated polyester and use thereof in lithographic printing plates
US5045432A (en) * 1990-07-17 1991-09-03 Eastman Kodak Company Radiation-sensitive composition containing both a poly(N-acylalkyleneimine) and an unsaturated polyester and use thereof in lithographic printing plates
JPH05127372A (en) * 1991-11-01 1993-05-25 Nippon Paint Co Ltd Photosensitive resin for lithographic printing and resin composition

Also Published As

Publication number Publication date
AU2046097A (en) 1997-10-01
NL1002627C2 (en) 1997-09-17
WO1997034198A1 (en) 1997-09-18

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