ID29539A - Pengontrol aliran - Google Patents

Pengontrol aliran

Info

Publication number
ID29539A
ID29539A ID20011593A ID20011593A ID29539A ID 29539 A ID29539 A ID 29539A ID 20011593 A ID20011593 A ID 20011593A ID 20011593 A ID20011593 A ID 20011593A ID 29539 A ID29539 A ID 29539A
Authority
ID
Indonesia
Prior art keywords
flow controller
controller
flow
Prior art date
Application number
ID20011593A
Other languages
English (en)
Inventor
Robert F Mcloughlin
George L Gonnella
Timothy J King
Original Assignee
Mykrolis Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mykrolis Corp filed Critical Mykrolis Corp
Publication of ID29539A publication Critical patent/ID29539A/id

Links

Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00Control of fluid pressure
    • G05D16/20Control of fluid pressure characterised by the use of electric means
    • G05D16/2006Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
    • G05D16/2013Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1007Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material
    • B05C11/1013Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material responsive to flow or pressure of liquid or other fluent material
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00Control of fluid pressure
    • G05D16/20Control of fluid pressure characterised by the use of electric means
    • G05D16/2006Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
    • G05D16/2013Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
    • G05D16/2026Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1026Valves
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/0318Processes
    • Y10T137/0324With control of flow by a condition or characteristic of a fluid
    • Y10T137/0379By fluid pressure
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/2278Pressure modulating relays or followers
    • Y10T137/2409With counter-balancing pressure feedback to the modulating device
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/7722Line condition change responsive valves
    • Y10T137/7758Pilot or servo controlled
    • Y10T137/7759Responsive to change in rate of fluid flow
    • Y10T137/776Control by pressures across flow line valve

Landscapes

  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Coating Apparatus (AREA)
  • Control Of Fluid Pressure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
ID20011593A 1999-01-20 2000-01-20 Pengontrol aliran ID29539A (id)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11651199P 1999-01-20 1999-01-20
US14337099P 1999-07-12 1999-07-12

Publications (1)

Publication Number Publication Date
ID29539A true ID29539A (id) 2001-09-06

Family

ID=26814324

Family Applications (1)

Application Number Title Priority Date Filing Date
ID20011593A ID29539A (id) 1999-01-20 2000-01-20 Pengontrol aliran

Country Status (9)

Country Link
US (2) US6348098B1 (id)
EP (1) EP1146967A4 (id)
JP (4) JP2002535122A (id)
KR (1) KR100590303B1 (id)
AU (1) AU3211900A (id)
ID (1) ID29539A (id)
IL (1) IL143765A0 (id)
TW (1) TW440757B (id)
WO (1) WO2000043130A1 (id)

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JP2002535122A (ja) * 1999-01-20 2002-10-22 マイクロリス・コーポレーション 流れコントローラ
KR100393289B1 (ko) * 2001-06-26 2003-07-31 주식회사 실리콘 테크 포토레지스트 토출 감시장치
EP1480906A4 (en) * 2002-02-07 2009-09-23 Pall Corp LIQUID DISPENSING SYSTEMS AND METHODS
CN100374768C (zh) * 2002-07-19 2008-03-12 诚实公司 液体流动控制设备及方法
US6998305B2 (en) * 2003-01-24 2006-02-14 Asm America, Inc. Enhanced selectivity for epitaxial deposition
US7141119B2 (en) * 2003-05-19 2006-11-28 Imation Corp. Pressure-controlling dispersion delivery system
US7014724B2 (en) * 2003-06-25 2006-03-21 Lear Corporation Gravity regulated method and apparatus for controlling application of a fluid
KR101012234B1 (ko) 2003-12-31 2011-02-08 동부일렉트로닉스 주식회사 Sog 코팅막 불량 방지 방법
US7107128B2 (en) * 2004-02-13 2006-09-12 Entegris, Inc. System for controlling fluid flow
KR20070056092A (ko) * 2004-08-13 2007-05-31 엔테그리스, 아이엔씨. 유량계의 교정 시스템 및 방법
JP5079516B2 (ja) 2004-11-23 2012-11-21 インテグリス・インコーポレーテッド 可変定位置ディスペンスシステムのためのシステムおよび方法
US8087429B2 (en) 2005-11-21 2012-01-03 Entegris, Inc. System and method for a pump with reduced form factor
US8753097B2 (en) * 2005-11-21 2014-06-17 Entegris, Inc. Method and system for high viscosity pump
US8083498B2 (en) 2005-12-02 2011-12-27 Entegris, Inc. System and method for position control of a mechanical piston in a pump
KR101243509B1 (ko) 2005-12-02 2013-03-20 엔테그리스, 아이엔씨. 펌프에서의 압력 보상을 위한 시스템 및 방법
US7878765B2 (en) * 2005-12-02 2011-02-01 Entegris, Inc. System and method for monitoring operation of a pump
TWI402423B (zh) * 2006-02-28 2013-07-21 Entegris Inc 用於一幫浦操作之系統及方法
US20070207259A1 (en) * 2006-03-03 2007-09-06 Applied Materials, Inc. Track lithography system with integrated photoresist pump, filter, and buffer vessel
US20070251450A1 (en) * 2006-04-28 2007-11-01 Applied Materials, Inc. Systems and Methods for Monitoring and Controlling Dispense Using a Digital Optical Sensor
US20070254092A1 (en) * 2006-04-28 2007-11-01 Applied Materials, Inc. Systems and Methods for Detecting Abnormal Dispense of Semiconductor Process Fluids
US7517469B2 (en) * 2006-04-28 2009-04-14 Sokudo Co., Ltd. Method and system to measure flow velocity and volume
US7759199B2 (en) * 2007-09-19 2010-07-20 Asm America, Inc. Stressor for engineered strain on channel
US8240153B2 (en) 2008-05-14 2012-08-14 General Electric Company Method and system for controlling a set point for extracting air from a compressor to provide turbine cooling air in a gas turbine
US8561627B1 (en) * 2008-09-26 2013-10-22 Intermolecular, Inc. Calibration of a chemical dispense system
US8015791B2 (en) * 2008-11-18 2011-09-13 General Electric Company Fuel control system for gas turbine and feed forward control method
DE202009014152U1 (de) * 2009-10-19 2011-03-03 Dürr Optronik GmbH & Co. KG Abrolleinrichtung für eine Materialbahn
US8367528B2 (en) 2009-11-17 2013-02-05 Asm America, Inc. Cyclical epitaxial deposition and etch
JP5466068B2 (ja) * 2010-03-31 2014-04-09 アズビル株式会社 電空ポジショナおよび電空変換器
JP5433660B2 (ja) * 2011-10-12 2014-03-05 Ckd株式会社 ガス流量監視システム
ES2888931T3 (es) 2013-07-19 2022-01-10 Graco Minnesota Inc Algoritmo de conmutación de bomba para un sistema de pulverización
ES2804104T3 (es) 2014-03-19 2021-02-03 Graco Minnesota Inc Método y aparato para dispensar un fluido
KR101950565B1 (ko) 2014-05-15 2019-02-20 도쿄엘렉트론가부시키가이샤 포토레지스트 공급 시스템에서의 증가한 재순환 및 필터링을 위한 방법 및 장치
JP6374247B2 (ja) * 2014-07-14 2018-08-15 住友ゴム工業株式会社 タイヤ用ライン塗布装置およびタイヤ用ライン塗布方法
WO2016040514A1 (en) 2014-09-09 2016-03-17 Proteus Industries Inc. Systems and methods for coolant drawback
JP6420604B2 (ja) 2014-09-22 2018-11-07 株式会社Screenホールディングス 塗布装置
US10792697B2 (en) * 2017-05-17 2020-10-06 Taiwan Semiconductor Manufacturing Company, Ltd. Drippage prevention system and method of operating same
WO2019067323A1 (en) * 2017-09-26 2019-04-04 Lam Research Corporation DOSE CONTROL SYSTEMS AND METHODS MODULATED BY TIME PULSES
KR102099114B1 (ko) * 2018-04-16 2020-04-10 세메스 주식회사 기판 처리 방법 및 기판 처리 장치
CN112024310A (zh) * 2020-07-31 2020-12-04 中国科学院微电子研究所 涂胶机的控制方法、涂胶机的控制系统
DK181404B1 (en) * 2022-01-03 2023-10-17 Nel Hydrogen As Compressor with reduced start-up torque

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Also Published As

Publication number Publication date
KR20010101571A (ko) 2001-11-14
JP2011003203A (ja) 2011-01-06
JP2007144422A (ja) 2007-06-14
US6348098B1 (en) 2002-02-19
WO2000043130A1 (en) 2000-07-27
AU3211900A (en) 2000-08-07
EP1146967A4 (en) 2009-05-20
US20020029740A1 (en) 2002-03-14
KR100590303B1 (ko) 2006-06-15
IL143765A0 (en) 2002-04-21
EP1146967A1 (en) 2001-10-24
JP2002535122A (ja) 2002-10-22
JP2008016038A (ja) 2008-01-24
US6527862B2 (en) 2003-03-04
TW440757B (en) 2001-06-16

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