IE39231L - Light sensitive materials for the production of printing¹plates. - Google Patents
Light sensitive materials for the production of printing¹plates.Info
- Publication number
- IE39231L IE39231L IE740859A IE85974A IE39231L IE 39231 L IE39231 L IE 39231L IE 740859 A IE740859 A IE 740859A IE 85974 A IE85974 A IE 85974A IE 39231 L IE39231 L IE 39231L
- Authority
- IE
- Ireland
- Prior art keywords
- acid
- group
- poly
- reaction product
- resin
- Prior art date
Links
- 239000000463 material Substances 0.000 title abstract 5
- -1 poly(vinylalcohol) Polymers 0.000 abstract 9
- 229920005989 resin Polymers 0.000 abstract 8
- 239000011347 resin Substances 0.000 abstract 8
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract 7
- 239000007795 chemical reaction product Substances 0.000 abstract 6
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 abstract 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 abstract 3
- 150000004820 halides Chemical class 0.000 abstract 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 3
- 229920000642 polymer Polymers 0.000 abstract 3
- CNAQPKDRSLQHIN-UHFFFAOYSA-N 2-(1-chlorosulfonyl-3-phenylprop-2-enylidene)propanedioic acid Chemical compound OC(=O)C(C(O)=O)=C(S(Cl)(=O)=O)C=CC1=CC=CC=C1 CNAQPKDRSLQHIN-UHFFFAOYSA-N 0.000 abstract 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 abstract 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 2
- 229920002873 Polyethylenimine Polymers 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 229920002678 cellulose Polymers 0.000 abstract 2
- 239000001913 cellulose Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 229920001577 copolymer Polymers 0.000 abstract 2
- 125000004093 cyano group Chemical group *C#N 0.000 abstract 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 abstract 2
- 239000003822 epoxy resin Substances 0.000 abstract 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 abstract 2
- 125000005843 halogen group Chemical group 0.000 abstract 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 2
- 229920000647 polyepoxide Polymers 0.000 abstract 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 abstract 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 abstract 1
- 229940093475 2-ethoxyethanol Drugs 0.000 abstract 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 abstract 1
- OKUVGYDBZPSDHQ-UHFFFAOYSA-N 3-chloro-2-(2-chlorosulfonylphenyl)-3-phenylprop-2-enoic acid Chemical compound C=1C=CC=C(S(Cl)(=O)=O)C=1C(C(=O)O)=C(Cl)C1=CC=CC=C1 OKUVGYDBZPSDHQ-UHFFFAOYSA-N 0.000 abstract 1
- AGLGZHVPJKOOQW-UHFFFAOYSA-N 3-chlorosulfonyl-2-cyano-5-phenylpenta-2,4-dienoic acid Chemical compound OC(=O)C(C#N)=C(S(Cl)(=O)=O)C=CC1=CC=CC=C1 AGLGZHVPJKOOQW-UHFFFAOYSA-N 0.000 abstract 1
- PQXPAFTXDVNANI-UHFFFAOYSA-N 4-azidobenzoic acid Chemical compound OC(=O)C1=CC=C(N=[N+]=[N-])C=C1 PQXPAFTXDVNANI-UHFFFAOYSA-N 0.000 abstract 1
- XXKYTTAVNYTVFC-UHFFFAOYSA-N 4-azidobenzoyl chloride Chemical compound ClC(=O)C1=CC=C(N=[N+]=[N-])C=C1 XXKYTTAVNYTVFC-UHFFFAOYSA-N 0.000 abstract 1
- 239000005711 Benzoic acid Substances 0.000 abstract 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 abstract 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 abstract 1
- 239000004593 Epoxy Substances 0.000 abstract 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 abstract 1
- 229920001311 Poly(hydroxyethyl acrylate) Polymers 0.000 abstract 1
- 239000004115 Sodium Silicate Substances 0.000 abstract 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 abstract 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 abstract 1
- 235000011054 acetic acid Nutrition 0.000 abstract 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 abstract 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 150000004984 aromatic diamines Chemical class 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000004104 aryloxy group Chemical group 0.000 abstract 1
- 235000010233 benzoic acid Nutrition 0.000 abstract 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 125000002843 carboxylic acid group Chemical group 0.000 abstract 1
- 229930016911 cinnamic acid Natural products 0.000 abstract 1
- 235000013985 cinnamic acid Nutrition 0.000 abstract 1
- 239000007859 condensation product Substances 0.000 abstract 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 150000002924 oxiranes Chemical group 0.000 abstract 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 abstract 1
- 229920006287 phenoxy resin Polymers 0.000 abstract 1
- 239000013034 phenoxy resin Substances 0.000 abstract 1
- 229920002338 polyhydroxyethylmethacrylate Polymers 0.000 abstract 1
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- 235000019260 propionic acid Nutrition 0.000 abstract 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 abstract 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 abstract 1
- 235000019795 sodium metasilicate Nutrition 0.000 abstract 1
- 239000001488 sodium phosphate Substances 0.000 abstract 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract 1
- 229910052911 sodium silicate Inorganic materials 0.000 abstract 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 abstract 1
- 239000006188 syrup Substances 0.000 abstract 1
- 235000020357 syrup Nutrition 0.000 abstract 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 abstract 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 abstract 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 abstract 1
- 235000019801 trisodium phosphate Nutrition 0.000 abstract 1
- 229920001567 vinyl ester resin Polymers 0.000 abstract 1
- 229960000834 vinyl ether Drugs 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4223—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1483—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Materials For Photolithography (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
1466252 Light-sensitive polymeric material VICKERS Ltd 25 April 1974 [26 April 1973] 19994/73 Headings C3R C3P and C3B [Also in Divisions G2 and C2] A light sensitive material comprises the reaction product of a polymer containing a plurality of epoxide groups, hydroxyl groups or primary and/or secondary amino groups with a halosulphonyl group containing compound of the formula wherein R represents an aromatic radical; a is 0 or 1, R 1 , R 2 and R 3 each represents a hydrogen atom, a halogen atom or a cyano, alkyl, aryl, alkoxy, aryloxy, aralkyl or aralkoxy group; and R 4 is an alkoxy carbonyl group, a carboxyl group, a phenyl group substituted with a deactivating group or a halosulphonyl substituted phenyl group when a is 0 or 1 and additionally when a is 1 a hydrogen atom or an alkyl or cyano group, and X represents a halosulphonyl group except when R 4 is a halosulphonyl phenyl group in which case X is a deactivating syrup, e.g. a halogen atom. Suitable polymers are epoxy and novolak/epoxy resins, phenol/aldehyde resins, phenoxy resins, poly(vinylalcohol), cellulose or a cellulose derivative, a partially hydrolysed poly(vinyl ester), poly(hydroxyethylacrylate), poly(hydroxyethyl methacrylate), a partially hydrolysed acetal, a phenoxy alkanol/aldehyde condensate, poly- (vinyl amine), an aniline/formaldehyde resin, poly(ethyleneimine) or the condensation product of a styrene/maleic anhydride copolymer or an alkyl vinylether/maleic anhydride copolymer with an excess of an aliphatic or aromatic diamine. The polymer may be additionally reacted before, during or after the reaction with the halosulphonyl group containing compound, with a halide of an aromatic sulphonic acid, an aliphatic or aromatic carboxylic acid, the halide containing no free carboxylic acid groups. Suitable halides are those of p-toluene sulphonic acid, acetic acid, propionic acid, benzoic acid, p-azido-benzoic acid or cinnamic acid. In the examples the following light-sensitive materials are prepared: (1) the reaction product of chlorosulphonylcinnamylidene malonic acid and either (i) a resorcinol/HCHO resin, or (ii) an epoxide resin prepared by condensing 2,2- bis - (p - hydroxyphenyl)propane with excess epichlorohydrin, or (iii) 2-phenoxyethanol- HCHO resin, or (iv) the reaction product of a phenol/HCHO resin and p-azidobenzoyl chloride, or (v) a styrene-maleic anhydride copolymer that has been reacted with excess ethylene diamine; or (vi) a polyethylene imine; (2) the reaction product of α-(chlorosulphonylphenyl)- chlorocinnamic acid, chlorosulphonylcinnamylidene malonic acid and a resorcinol/HCHO resin; (3) the reaction product of chlorosulphonylcinnamylidenecyanoacetic acid and a resorcinol/HCHO resin; (4) the reaction product of chlorosulphonyl-delta-chlorocinnamylidene malonic acid and a resorcinol-HCHO resin. The light sensitive materials are used to produce printing plates by applying a solution thereof in DMF and 2-ethoxyethanol to an aluminium sheet, drying the plate and then image-wise exposing the plate. A developer, e.g. trisodium phosphate or sodium metasilicate solution is then applied to remove the non- light-struck areas of the layer.
[GB1466252A]
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1999473A GB1466252A (en) | 1973-04-26 | 1973-04-26 | Light-sensitive material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IE39231L true IE39231L (en) | 1974-10-26 |
| IE39231B1 IE39231B1 (en) | 1978-08-30 |
Family
ID=10138567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IE859/74A IE39231B1 (en) | 1973-04-26 | 1974-04-22 | Improvements in or relating to light sensistive material |
Country Status (16)
| Country | Link |
|---|---|
| JP (1) | JPS5842460B2 (en) |
| AT (1) | AT344998B (en) |
| BE (1) | BE814282A (en) |
| CA (1) | CA1023491A (en) |
| CH (2) | CH607100A5 (en) |
| DE (1) | DE2420372A1 (en) |
| FI (1) | FI62911C (en) |
| FR (1) | FR2227556B1 (en) |
| GB (1) | GB1466252A (en) |
| IE (1) | IE39231B1 (en) |
| IT (1) | IT1010118B (en) |
| LU (1) | LU69940A1 (en) |
| NL (1) | NL175631C (en) |
| NO (1) | NO148794C (en) |
| SE (1) | SE418191B (en) |
| ZA (1) | ZA742559B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6841335B2 (en) * | 2002-07-29 | 2005-01-11 | Kodak Polychrome Graphics Llc | Imaging members with ionic multifunctional epoxy compounds |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE758116A (en) * | 1969-10-30 | 1971-04-01 | Fuji Photo Film Co Ltd | COMPOUND A HIGH MOLECULAR WEIGHT AND ITS PREPARATION PROCESS |
| JPS4944601B1 (en) * | 1970-05-15 | 1974-11-29 | ||
| BE790383A (en) * | 1971-10-22 | 1973-02-15 | Howson Algraphy Ltd | Light sensitive material |
-
1973
- 1973-04-26 GB GB1999473A patent/GB1466252A/en not_active Expired
-
1974
- 1974-04-22 IE IE859/74A patent/IE39231B1/en unknown
- 1974-04-23 ZA ZA00742559A patent/ZA742559B/en unknown
- 1974-04-23 FI FI1224/74A patent/FI62911C/en active
- 1974-04-24 SE SE7405484A patent/SE418191B/en unknown
- 1974-04-25 NL NLAANVRAGE7405575,A patent/NL175631C/en not_active IP Right Cessation
- 1974-04-25 NO NO741505A patent/NO148794C/en unknown
- 1974-04-26 AT AT349474A patent/AT344998B/en not_active IP Right Cessation
- 1974-04-26 BE BE143702A patent/BE814282A/en not_active IP Right Cessation
- 1974-04-26 CH CH1186877A patent/CH607100A5/xx not_active IP Right Cessation
- 1974-04-26 CH CH579774A patent/CH598621A5/xx not_active IP Right Cessation
- 1974-04-26 IT IT21939/74A patent/IT1010118B/en active
- 1974-04-26 LU LU69940A patent/LU69940A1/xx unknown
- 1974-04-26 DE DE2420372A patent/DE2420372A1/en not_active Withdrawn
- 1974-04-26 FR FR7414649A patent/FR2227556B1/fr not_active Expired
- 1974-04-26 JP JP49046735A patent/JPS5842460B2/en not_active Expired
- 1974-05-27 CA CA200,931A patent/CA1023491A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| BE814282A (en) | 1974-08-16 |
| NL175631C (en) | 1984-12-03 |
| ATA349474A (en) | 1977-12-15 |
| CA1023491A (en) | 1977-12-27 |
| JPS5031819A (en) | 1975-03-28 |
| ZA742559B (en) | 1975-04-30 |
| CH598621A5 (en) | 1978-05-12 |
| NO741505L (en) | 1974-10-29 |
| SE418191B (en) | 1981-05-11 |
| FI62911C (en) | 1983-03-10 |
| FR2227556B1 (en) | 1980-08-29 |
| FI62911B (en) | 1982-11-30 |
| IE39231B1 (en) | 1978-08-30 |
| JPS5842460B2 (en) | 1983-09-20 |
| NL175631B (en) | 1984-07-02 |
| NO148794C (en) | 1983-12-14 |
| LU69940A1 (en) | 1974-08-06 |
| GB1466252A (en) | 1977-03-02 |
| CH607100A5 (en) | 1978-11-30 |
| NL7405575A (en) | 1974-10-29 |
| AT344998B (en) | 1978-08-25 |
| AU6823074A (en) | 1975-10-30 |
| FR2227556A1 (en) | 1974-11-22 |
| DE2420372A1 (en) | 1974-11-07 |
| IT1010118B (en) | 1977-01-10 |
| NO148794B (en) | 1983-09-05 |
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