IL110716A - Nondestructive determination of plasma processing treatment characteristics - Google Patents

Nondestructive determination of plasma processing treatment characteristics

Info

Publication number
IL110716A
IL110716A IL110716A IL11071694A IL110716A IL 110716 A IL110716 A IL 110716A IL 110716 A IL110716 A IL 110716A IL 11071694 A IL11071694 A IL 11071694A IL 110716 A IL110716 A IL 110716A
Authority
IL
Israel
Prior art keywords
plasma processing
indicator layer
property
processing surface
processing treatment
Prior art date
Application number
IL110716A
Other languages
English (en)
Other versions
IL110716A0 (en
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of IL110716A0 publication Critical patent/IL110716A0/xx
Publication of IL110716A publication Critical patent/IL110716A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Materials For Medical Uses (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
IL110716A 1993-08-27 1994-08-18 Nondestructive determination of plasma processing treatment characteristics IL110716A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11355693A 1993-08-27 1993-08-27

Publications (2)

Publication Number Publication Date
IL110716A0 IL110716A0 (en) 1994-11-11
IL110716A true IL110716A (en) 1997-04-15

Family

ID=22350117

Family Applications (1)

Application Number Title Priority Date Filing Date
IL110716A IL110716A (en) 1993-08-27 1994-08-18 Nondestructive determination of plasma processing treatment characteristics

Country Status (7)

Country Link
US (1) US5455061A (fr)
EP (1) EP0640696B1 (fr)
JP (1) JP2716371B2 (fr)
KR (1) KR950006966A (fr)
CA (1) CA2130167C (fr)
DE (1) DE69401248T2 (fr)
IL (1) IL110716A (fr)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0753082B1 (fr) * 1994-03-29 1999-07-07 Schott Glas Procede plasma-cvd de revetement de substrats bombes
US5618758A (en) * 1995-02-17 1997-04-08 Sharp Kabushiki Kaisha Method for forming a thin semiconductor film and a plasma CVD apparatus to be used in the method
US6077386A (en) * 1998-04-23 2000-06-20 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6221679B1 (en) * 1998-04-23 2001-04-24 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6165312A (en) * 1998-04-23 2000-12-26 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6269278B1 (en) 1998-04-23 2001-07-31 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6419801B1 (en) 1998-04-23 2002-07-16 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6090302A (en) * 1998-04-23 2000-07-18 Sandia Method and apparatus for monitoring plasma processing operations
US6192826B1 (en) 1998-04-23 2001-02-27 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6275740B1 (en) 1998-04-23 2001-08-14 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6134005A (en) * 1998-04-23 2000-10-17 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6246473B1 (en) 1998-04-23 2001-06-12 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6123983A (en) * 1998-04-23 2000-09-26 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6157447A (en) * 1998-04-23 2000-12-05 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6254717B1 (en) 1998-04-23 2001-07-03 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6261470B1 (en) 1998-04-23 2001-07-17 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6169933B1 (en) 1998-04-23 2001-01-02 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6132577A (en) * 1998-04-23 2000-10-17 Sandia Corporation Method and apparatus for monitoring plasma processing operations
US6223755B1 (en) 1998-04-23 2001-05-01 Sandia Corporation Method and apparatus for monitoring plasma processing operations
WO2005042064A1 (fr) * 2003-10-31 2005-05-12 Ventracor Limited Pompe a sang amelioree comprenant des composants polymeres
CN1322163C (zh) * 2004-11-05 2007-06-20 哈尔滨工业大学 绝缘材料零部件等离子体注入方法及其注入装置
US20080318345A1 (en) * 2007-06-22 2008-12-25 Persing Harold M Plasma ion implantation process control using reflectometry
DE102009002337B4 (de) * 2009-04-09 2013-07-11 Christof-Herbert Diener Indikator zur Überwachung eines Plasmas
US10388491B2 (en) * 2011-10-31 2019-08-20 Canon Anelva Corporation Ion beam etching method of magnetic film and ion beam etching apparatus
US9944061B2 (en) 2016-01-08 2018-04-17 Sikorsky Aircraft Corporation Plasma detection tracers for process monitoring
US11154903B2 (en) * 2016-05-13 2021-10-26 Jiangsu Favored Nanotechnology Co., Ltd. Apparatus and method for surface coating by means of grid control and plasma-initiated gas-phase polymerization

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3583361A (en) * 1969-12-18 1971-06-08 Atomic Energy Commission Ion beam deposition system
JPS6123760A (ja) * 1984-07-09 1986-02-01 Canon Inc 電子写真感光体の製造方法
JPS6148386A (ja) * 1984-08-13 1986-03-10 株式会社ブリヂストン ゴルフボールの表面処理装置
JPS62229056A (ja) * 1986-03-31 1987-10-07 Nippon Steel Corp 塗装金属の塗膜劣化程度定量診断方法およびその装置
GB8619775D0 (en) * 1986-08-14 1986-09-24 Millspin Ltd Ion beam dosimetry
US4764394A (en) * 1987-01-20 1988-08-16 Wisconsin Alumni Research Foundation Method and apparatus for plasma source ion implantation
US4960072A (en) * 1987-08-05 1990-10-02 Ricoh Company, Ltd. Apparatus for forming a thin film
US5133849A (en) * 1988-12-12 1992-07-28 Ricoh Company, Ltd. Thin film forming apparatus
US5185067A (en) * 1989-07-10 1993-02-09 Tdk Corporation Process for manufacturing diamond-like thin film
US5128173A (en) * 1990-09-12 1992-07-07 Micron Technology, Inc. Process for deposition of inorganic materials
US5143747A (en) * 1991-02-12 1992-09-01 Hughes Aircraft Company Die improved tooling for metal working
US5374456A (en) * 1992-12-23 1994-12-20 Hughes Aircraft Company Surface potential control in plasma processing of materials

Also Published As

Publication number Publication date
JPH07167783A (ja) 1995-07-04
EP0640696A1 (fr) 1995-03-01
EP0640696B1 (fr) 1996-12-27
IL110716A0 (en) 1994-11-11
KR950006966A (ko) 1995-03-21
CA2130167A1 (fr) 1995-02-28
DE69401248D1 (de) 1997-02-06
DE69401248T2 (de) 1997-04-24
JP2716371B2 (ja) 1998-02-18
US5455061A (en) 1995-10-03
CA2130167C (fr) 1999-07-20

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