IL123416A0 - Multi laser surface treatment in ambient fast flowing photoreactive gases - Google Patents

Multi laser surface treatment in ambient fast flowing photoreactive gases

Info

Publication number
IL123416A0
IL123416A0 IL12341698A IL12341698A IL123416A0 IL 123416 A0 IL123416 A0 IL 123416A0 IL 12341698 A IL12341698 A IL 12341698A IL 12341698 A IL12341698 A IL 12341698A IL 123416 A0 IL123416 A0 IL 123416A0
Authority
IL
Israel
Prior art keywords
photoreactive
gases
surface treatment
laser surface
fast flowing
Prior art date
Application number
IL12341698A
Other languages
English (en)
Original Assignee
Oramir Semiconductor Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oramir Semiconductor Ltd filed Critical Oramir Semiconductor Ltd
Priority to IL12341698A priority Critical patent/IL123416A0/xx
Publication of IL123416A0 publication Critical patent/IL123416A0/xx
Priority to EP99102747A priority patent/EP0943390A3/de
Priority to JP11043513A priority patent/JPH11317385A/ja
Priority to KR1019990005761A priority patent/KR19990072815A/ko
Priority to US09/256,056 priority patent/US6215099B1/en
Priority to IL14032300A priority patent/IL140323A0/xx
Priority to IL14036200A priority patent/IL140362A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special environment or atmosphere, e.g. in an enclosure
    • B23K26/123—Working by laser beam, e.g. welding, cutting or boring in a special environment or atmosphere, e.g. in an enclosure in an atmosphere of particular gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10038—Amplitude control
    • H01S3/10046—Pulse repetition rate control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2383—Parallel arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Lasers (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Laser Beam Processing (AREA)
IL12341698A 1998-02-23 1998-02-23 Multi laser surface treatment in ambient fast flowing photoreactive gases IL123416A0 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
IL12341698A IL123416A0 (en) 1998-02-23 1998-02-23 Multi laser surface treatment in ambient fast flowing photoreactive gases
EP99102747A EP0943390A3 (de) 1998-02-23 1999-02-22 Oberflächenbehandlung durch multilaser-Verbrennung
JP11043513A JPH11317385A (ja) 1998-02-23 1999-02-22 マルチレ―ザ燃焼式表面処理
KR1019990005761A KR19990072815A (ko) 1998-02-23 1999-02-22 다중-레이저발화표면처리방법및장치
US09/256,056 US6215099B1 (en) 1998-02-23 1999-02-23 Multi-Laser Combustion surface treatment
IL14032300A IL140323A0 (en) 1998-02-23 2000-12-14 Apparatus for multilaser surface treatment in ambient fast flowing photoreactive gases
IL14036200A IL140362A0 (en) 1998-02-23 2000-12-17 Mobile heat level controller for cans

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL12341698A IL123416A0 (en) 1998-02-23 1998-02-23 Multi laser surface treatment in ambient fast flowing photoreactive gases

Publications (1)

Publication Number Publication Date
IL123416A0 true IL123416A0 (en) 1998-09-24

Family

ID=11071260

Family Applications (3)

Application Number Title Priority Date Filing Date
IL12341698A IL123416A0 (en) 1998-02-23 1998-02-23 Multi laser surface treatment in ambient fast flowing photoreactive gases
IL14032300A IL140323A0 (en) 1998-02-23 2000-12-14 Apparatus for multilaser surface treatment in ambient fast flowing photoreactive gases
IL14036200A IL140362A0 (en) 1998-02-23 2000-12-17 Mobile heat level controller for cans

Family Applications After (2)

Application Number Title Priority Date Filing Date
IL14032300A IL140323A0 (en) 1998-02-23 2000-12-14 Apparatus for multilaser surface treatment in ambient fast flowing photoreactive gases
IL14036200A IL140362A0 (en) 1998-02-23 2000-12-17 Mobile heat level controller for cans

Country Status (5)

Country Link
US (1) US6215099B1 (de)
EP (1) EP0943390A3 (de)
JP (1) JPH11317385A (de)
KR (1) KR19990072815A (de)
IL (3) IL123416A0 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2347788A (en) * 1999-03-06 2000-09-13 Secr Defence Forming devices such as ferroelectric infra-red sensors by annealing
US6433303B1 (en) * 2000-03-31 2002-08-13 Matsushita Electric Industrial Co., Ltd. Method and apparatus using laser pulses to make an array of microcavity holes
WO2002090036A1 (en) * 2001-05-10 2002-11-14 Vanderbilt University Method and apparatus for laser ablative modification of dielectric surfaces
US7332689B2 (en) * 2002-02-26 2008-02-19 Boston Scientific Scimed, Inc. Tacking method and apparatus
US6900409B2 (en) * 2003-08-22 2005-05-31 General Electric Company Single head laser high throughput laser shock peening
US20070148567A1 (en) * 2005-12-09 2007-06-28 Joerg Ferber Method and apparatus for laser-drilling an inkjet orifice in a substrate
US20110076853A1 (en) * 2009-09-28 2011-03-31 Magic Technologies, Inc. Novel process method for post plasma etch treatment
KR101790169B1 (ko) 2015-07-30 2017-10-25 장병수 부양 기능과 수중 투시 기능을 향상시킨 수생 생물 수집용 수경
DE112017006203B4 (de) * 2016-12-09 2021-07-29 Furukawa Electric Co., Ltd. Pulslaservorrichtung, Bearbeitungsvorrichtung und Verfahren zum Steuern der Pulslaservorrichtung
US12074026B2 (en) * 2022-05-19 2024-08-27 Taiwan Semiconductor Manufacturing Co., Ltd. Integrated photoresist removal and laser annealing

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3145278C2 (de) * 1981-11-14 1985-02-14 Schott-Zwiesel-Glaswerke Ag, 8372 Zwiesel Verfahren zum berührungslosen Abtragen von Material von der Oberfläche eines Glasgegenstandes und Vorrichtung zur Durchführung des Verfahrens
DE3410051A1 (de) * 1984-03-19 1985-09-19 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Verfahren und einrichtung zum synchronen modenkoppeln der longitudinalen lasermoden eines halbleiterdiodenlasers
US4660205A (en) * 1985-05-13 1987-04-21 Allied Corporation Multi-resonator switching laser
IL84255A (en) * 1987-10-23 1993-02-21 Galram Technology Ind Ltd Process for removal of post- baked photoresist layer
US5691989A (en) * 1991-07-26 1997-11-25 Accuwave Corporation Wavelength stabilized laser sources using feedback from volume holograms
IL115931A0 (en) 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Laser stripping improvement by modified gas composition
IL115933A0 (en) 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Process and apparatus for oblique beam revolution for the effective laser stripping of sidewalls
IL115934A0 (en) 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Laser processing chamber with cassette cell
IL115932A0 (en) * 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Damage-free laser surface treatment method
JP3590822B2 (ja) * 1995-12-12 2004-11-17 株式会社ニコン 露光方法及び装置
US5891605A (en) * 1996-01-16 1999-04-06 Lucent Technologies Inc. Reduction in damage to optical elements used in optical lithography for device fabrication
IL119246A (en) 1996-09-12 2000-10-31 Oramir Semiconductor Ltd Laser removal of foreign materials from surfaces
IL119672A (en) 1996-11-21 2000-02-29 Oramir Semiconductor Ltd Method and apparatus for the laser processing of substrate surfaces
US6021154A (en) * 1997-11-21 2000-02-01 General Electric Company Laser shock peening method and reflective laser beam homogenizer

Also Published As

Publication number Publication date
KR19990072815A (ko) 1999-09-27
US6215099B1 (en) 2001-04-10
EP0943390A3 (de) 2004-05-06
IL140323A0 (en) 2002-02-10
IL140362A0 (en) 2002-02-10
JPH11317385A (ja) 1999-11-16
EP0943390A2 (de) 1999-09-22

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