IL131838A - A laser system that uses a sub-material to control heat - Google Patents
A laser system that uses a sub-material to control heatInfo
- Publication number
- IL131838A IL131838A IL13183899A IL13183899A IL131838A IL 131838 A IL131838 A IL 131838A IL 13183899 A IL13183899 A IL 13183899A IL 13183899 A IL13183899 A IL 13183899A IL 131838 A IL131838 A IL 131838A
- Authority
- IL
- Israel
- Prior art keywords
- heat
- assembly
- phase change
- change material
- laser medium
- Prior art date
Links
- 239000012782 phase change material Substances 0.000 title claims abstract description 150
- 239000007787 solid Substances 0.000 claims abstract description 30
- 239000007788 liquid Substances 0.000 claims abstract description 29
- 230000003287 optical effect Effects 0.000 claims abstract description 29
- 238000004891 communication Methods 0.000 claims abstract description 24
- 230000004044 response Effects 0.000 claims abstract 7
- 239000012530 fluid Substances 0.000 claims description 31
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 17
- 229910052733 gallium Inorganic materials 0.000 claims description 17
- 239000004593 Epoxy Substances 0.000 claims description 6
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 6
- 230000031070 response to heat Effects 0.000 claims description 4
- 229910000679 solder Inorganic materials 0.000 claims description 3
- 238000001816 cooling Methods 0.000 description 24
- 238000003491 array Methods 0.000 description 21
- 238000002844 melting Methods 0.000 description 17
- 230000008018 melting Effects 0.000 description 17
- 230000008859 change Effects 0.000 description 14
- 238000010276 construction Methods 0.000 description 12
- 239000012071 phase Substances 0.000 description 12
- 239000002918 waste heat Substances 0.000 description 11
- 239000013078 crystal Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 229910019655 synthetic inorganic crystalline material Inorganic materials 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 238000002310 reflectometry Methods 0.000 description 7
- 238000012546 transfer Methods 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000007791 liquid phase Substances 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- 229910001369 Brass Inorganic materials 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000012080 ambient air Substances 0.000 description 4
- 239000010951 brass Substances 0.000 description 4
- 238000009760 electrical discharge machining Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000001427 coherent effect Effects 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000013021 overheating Methods 0.000 description 3
- 239000007790 solid phase Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- -1 alkyl hydrocarbons Chemical class 0.000 description 2
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052755 nonmetal Inorganic materials 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 2
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- 206010042135 Stomatitis necrotising Diseases 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 229910000743 fusible alloy Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000003562 lightweight material Substances 0.000 description 1
- VCZFPTGOQQOZGI-UHFFFAOYSA-N lithium bis(oxoboranyloxy)borinate Chemical compound [Li+].[O-]B(OB=O)OB=O VCZFPTGOQQOZGI-UHFFFAOYSA-N 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000002905 metal composite material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- UYIXUPGBIXNDHN-UHFFFAOYSA-N neodymium(3+) Chemical compound [Nd+3] UYIXUPGBIXNDHN-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 201000008585 noma Diseases 0.000 description 1
- 230000009972 noncorrosive effect Effects 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 238000002135 phase contrast microscopy Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- WYOHGPUPVHHUGO-UHFFFAOYSA-K potassium;oxygen(2-);titanium(4+);phosphate Chemical compound [O-2].[K+].[Ti+4].[O-]P([O-])([O-])=O WYOHGPUPVHHUGO-UHFFFAOYSA-K 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F3/00—Plate-like or laminated elements; Assemblies of plate-like or laminated elements
- F28F3/02—Elements or assemblies thereof with means for increasing heat-transfer area, e.g. with fins, with recesses, with corrugations
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D20/00—Heat storage plants or apparatus in general; Regenerative heat-exchange apparatus not covered by groups F28D17/00 or F28D19/00
- F28D20/02—Heat storage plants or apparatus in general; Regenerative heat-exchange apparatus not covered by groups F28D17/00 or F28D19/00 using latent heat
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F3/00—Plate-like or laminated elements; Assemblies of plate-like or laminated elements
- F28F3/12—Elements constructed in the shape of a hollow panel, e.g. with channels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/042—Arrangements for thermal management for solid state lasers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D21/00—Heat-exchange apparatus not covered by any of the groups F28D1/00 - F28D20/00
- F28D2021/0019—Other heat exchangers for particular applications; Heat exchange systems not otherwise provided for
- F28D2021/0028—Other heat exchangers for particular applications; Heat exchange systems not otherwise provided for for cooling heat generating elements, e.g. for cooling electronic components or electric devices
- F28D2021/0029—Heat sinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/025—Constructional details of solid state lasers, e.g. housings or mountings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/025—Constructional details of solid state lasers, e.g. housings or mountings
- H01S3/027—Constructional details of solid state lasers, e.g. housings or mountings comprising a special atmosphere inside the housing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0405—Conductive cooling, e.g. by heat sinks or thermo-electric elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0407—Liquid cooling, e.g. by water
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02407—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling
- H01S5/02415—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling by using a thermo-electric cooler [TEC], e.g. Peltier element
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02438—Characterized by cooling of elements other than the laser chip, e.g. an optical element being part of an external cavity or a collimating lens
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02469—Passive cooling, e.g. where heat is removed by the housing as a whole or by a heat pipe without any active cooling element like a TEC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/14—Thermal energy storage
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Control Of Temperature (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/151,851 US6351478B1 (en) | 1998-09-11 | 1998-09-11 | Passively cooled solid-state laser |
| US09/270,991 US6307871B1 (en) | 1998-09-11 | 1999-03-17 | Laser system using phase change material for thermal control |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IL131838A0 IL131838A0 (en) | 2001-03-19 |
| IL131838A true IL131838A (en) | 2002-12-01 |
Family
ID=26849027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL13183899A IL131838A (en) | 1998-09-11 | 1999-09-09 | A laser system that uses a sub-material to control heat |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US6307871B1 (de) |
| EP (1) | EP0987799B1 (de) |
| JP (1) | JP2000091672A (de) |
| AT (1) | ATE234522T1 (de) |
| DE (1) | DE69905829T2 (de) |
| IL (1) | IL131838A (de) |
Families Citing this family (75)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6307871B1 (en) * | 1998-09-11 | 2001-10-23 | Cutting Edge Optronics, Inc. | Laser system using phase change material for thermal control |
| GB2373636B (en) * | 2000-11-29 | 2004-09-08 | Mitsubishi Chem Corp | Semiconductor light emitting device with two heat sinks in contact with each other |
| US6397618B1 (en) * | 2001-05-30 | 2002-06-04 | International Business Machines Corporation | Cooling system with auxiliary thermal buffer unit for cooling an electronics module |
| WO2003047052A2 (en) * | 2001-11-21 | 2003-06-05 | General Atomics | Laser containing a distributed gain medium |
| US7002800B2 (en) * | 2002-01-25 | 2006-02-21 | Lockheed Martin Corporation | Integrated power and cooling architecture |
| US7106777B2 (en) * | 2003-01-07 | 2006-09-12 | The Boeing Company | Phase-change heat exchanger |
| US7170919B2 (en) | 2003-06-23 | 2007-01-30 | Northrop Grumman Corporation | Diode-pumped solid-state laser gain module |
| US7495848B2 (en) | 2003-07-24 | 2009-02-24 | Northrop Grumman Corporation | Cast laser optical bench |
| EP1519039A1 (de) * | 2003-09-23 | 2005-03-30 | AVL List GmbH | Gütegeschaltener, gepumpter Festkörperlaser |
| DK176137B1 (da) * | 2003-10-27 | 2006-09-25 | Danfoss Silicon Power Gmbh | Flowfordelingsenhed og köleenhed med bypassflow |
| JP2005268445A (ja) * | 2004-03-17 | 2005-09-29 | Hamamatsu Photonics Kk | 半導体レーザ装置 |
| US7218655B2 (en) * | 2004-10-08 | 2007-05-15 | B&W Tek Property, Inc. | Solid state laser insensitive to temperature changes |
| US20060088271A1 (en) * | 2004-10-22 | 2006-04-27 | Nanocoolers, Inc. | Transient thermoelectric cooling of optoelectronic devices |
| US7056116B2 (en) * | 2004-10-26 | 2006-06-06 | Ultradent Products, Inc. | Heat sink for dental curing light comprising a plurality of different materials |
| US7729392B2 (en) * | 2005-01-28 | 2010-06-01 | Scientific Materials Corporation | Monoblock laser with reflective substrate |
| US7305016B2 (en) * | 2005-03-10 | 2007-12-04 | Northrop Grumman Corporation | Laser diode package with an internal fluid cooling channel |
| US7817704B2 (en) * | 2005-03-17 | 2010-10-19 | Scientific Materials Corporation | Monoblock laser with improved alignment features |
| US7328508B2 (en) * | 2005-07-05 | 2008-02-12 | International Business Machines Corporation | Anisotropic heat spreading apparatus and method for semiconductor devices |
| US20070104233A1 (en) * | 2005-11-09 | 2007-05-10 | Jan Vetrovec | Thermal management system for high energy laser |
| US20070115635A1 (en) * | 2005-11-18 | 2007-05-24 | Low Andrew G | Passive cooling for fiber to the premise (FTTP) electronics |
| US7761181B2 (en) * | 2005-11-29 | 2010-07-20 | The Boeing Company | Line replaceable systems and methods |
| KR100719225B1 (ko) * | 2005-12-21 | 2007-05-17 | 주식회사 글로벌스탠다드테크놀로지 | 반도체 제조 공정용 온도조절 시스템 |
| US7839904B1 (en) | 2006-01-26 | 2010-11-23 | Scientific Materials Corporation | Monoblock laser systems and methods |
| WO2007098094A2 (en) * | 2006-02-16 | 2007-08-30 | Polacek Denise C | Thermoelectric cooler and reservoir for medical treatment |
| US8364320B2 (en) | 2006-05-19 | 2013-01-29 | ARGES Gesellschaft für Industrieplanung und Lasertechnik m.b.H. | Method for the highly precise regulation of load-variable heat sources or heat sinks, and device for controlling the temperature of a dynamic heat source, especially pump diodes for solid-state lasers |
| US7656915B2 (en) * | 2006-07-26 | 2010-02-02 | Northrop Grumman Space & Missions Systems Corp. | Microchannel cooler for high efficiency laser diode heat extraction |
| US20080056314A1 (en) * | 2006-08-31 | 2008-03-06 | Northrop Grumman Corporation | High-power laser-diode package system |
| US7518123B2 (en) * | 2006-09-25 | 2009-04-14 | Philip Morris Usa Inc. | Heat capacitor for capillary aerosol generator |
| US7433190B2 (en) * | 2006-10-06 | 2008-10-07 | Honeywell International Inc. | Liquid cooled electronic chassis having a plurality of phase change material reservoirs |
| US7983373B2 (en) * | 2007-02-07 | 2011-07-19 | Vintomie Networks B.V., Llc | Clock distribution for 10GBase-T analog front end |
| US7532652B2 (en) * | 2007-02-20 | 2009-05-12 | The Boeing Company | Laser thermal management systems and methods |
| DE102008004053A1 (de) * | 2008-01-11 | 2009-07-23 | Airbus Deutschland Gmbh | Spitzenlast-Kühlung von elektronischen Bauteilen durch phasenwechselnde Materialien |
| US7724791B2 (en) * | 2008-01-18 | 2010-05-25 | Northrop Grumman Systems Corporation | Method of manufacturing laser diode packages and arrays |
| US7633980B1 (en) | 2008-02-29 | 2009-12-15 | The United States Of America As Represented By The United States Department Of Energy | Phase change based cooling for high burst mode heat loads with temperature regulation above the phase change temperature |
| US7810965B2 (en) | 2008-03-02 | 2010-10-12 | Lumenetix, Inc. | Heat removal system and method for light emitting diode lighting apparatus |
| US9102857B2 (en) * | 2008-03-02 | 2015-08-11 | Lumenetix, Inc. | Methods of selecting one or more phase change materials to match a working temperature of a light-emitting diode to be cooled |
| DE102008013816B4 (de) * | 2008-03-12 | 2010-09-16 | Trumpf Werkzeugmaschinen Gmbh + Co. Kg | Rückgewinnung von Energie aus einem Laserbearbeitungssystem |
| JP4677009B2 (ja) * | 2008-05-30 | 2011-04-27 | ヤマハ発動機株式会社 | 部品供給装置およびそれを備えた表面実装機 |
| US8657487B2 (en) * | 2008-06-11 | 2014-02-25 | Utah State University Research Foundation | Mini-cell, on-orbit, temperature re-calibration apparatus and method |
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- 1999-03-17 US US09/270,991 patent/US6307871B1/en not_active Expired - Lifetime
- 1999-09-09 IL IL13183899A patent/IL131838A/en active IP Right Review Request
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- 1999-09-10 DE DE69905829T patent/DE69905829T2/de not_active Expired - Lifetime
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- 1999-09-10 JP JP11257957A patent/JP2000091672A/ja active Pending
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| US6307871B1 (en) | 2001-10-23 |
| IL131838A0 (en) | 2001-03-19 |
| DE69905829T2 (de) | 2003-08-14 |
| EP0987799B1 (de) | 2003-03-12 |
| ATE234522T1 (de) | 2003-03-15 |
| EP0987799A3 (de) | 2001-01-10 |
| JP2000091672A (ja) | 2000-03-31 |
| US20020018498A1 (en) | 2002-02-14 |
| US6570895B2 (en) | 2003-05-27 |
| EP0987799A2 (de) | 2000-03-22 |
| DE69905829D1 (de) | 2003-04-17 |
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