IL143115A - Method for producing bulk zinc sulfide by progressive chemical vapor deposition - Google Patents

Method for producing bulk zinc sulfide by progressive chemical vapor deposition

Info

Publication number: IL143115A
Authority: IL; Israel
Prior art keywords: zinc; temperature; hours; zinc sulfide; substrate
Prior art date: 1998-02-05

Application number

IL143115A

Other languages

English (en)

Inventor

Jitendra Singh Goela

Zlatko Salhibegovic

Original Assignee

Cvd Inc

Jitendra Singh Goela

Zlatko Salhibegovic

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1998-02-05

Filing date

1999-02-02

Publication date

2007-02-11

1999-02-02 Application filed by Cvd Inc, Jitendra Singh Goela, Zlatko Salhibegovic filed Critical Cvd Inc

2007-02-11 Publication of IL143115A publication Critical patent/IL143115A/en

Links

229910052984 zinc sulfide Inorganic materials 0.000 title claims description 30
DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 title claims description 30
239000005083 Zinc sulfide Substances 0.000 title claims description 27
238000005229 chemical vapour deposition Methods 0.000 title claims description 17
238000004519 manufacturing process Methods 0.000 title description 3
230000000750 progressive effect Effects 0.000 title description 2
239000011701 zinc Substances 0.000 claims description 58
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 47
229910052725 zinc Inorganic materials 0.000 claims description 47
238000000034 method Methods 0.000 claims description 26
239000000758 substrate Substances 0.000 claims description 19
RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims description 15
229910000037 hydrogen sulfide Inorganic materials 0.000 claims description 14
239000000203 mixture Substances 0.000 claims description 3
239000007787 solid Substances 0.000 claims description 2
238000000151 deposition Methods 0.000 description 22
230000008021 deposition Effects 0.000 description 22
239000000047 product Substances 0.000 description 13
238000001513 hot isostatic pressing Methods 0.000 description 10
230000005540 biological transmission Effects 0.000 description 9
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
239000007789 gas Substances 0.000 description 8
229910002804 graphite Inorganic materials 0.000 description 8
239000010439 graphite Substances 0.000 description 8
230000003287 optical effect Effects 0.000 description 7
239000012159 carrier gas Substances 0.000 description 6
238000010438 heat treatment Methods 0.000 description 6
230000003247 decreasing effect Effects 0.000 description 5
229910052786 argon Inorganic materials 0.000 description 4
239000000463 material Substances 0.000 description 4
230000006911 nucleation Effects 0.000 description 3
238000010899 nucleation Methods 0.000 description 3
239000000356 contaminant Substances 0.000 description 2
230000003292 diminished effect Effects 0.000 description 2
238000001914 filtration Methods 0.000 description 2
238000007689 inspection Methods 0.000 description 2
238000001228 spectrum Methods 0.000 description 2
230000000007 visual effect Effects 0.000 description 2
238000012935 Averaging Methods 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
238000009529 body temperature measurement Methods 0.000 description 1
239000007795 chemical reaction product Substances 0.000 description 1
239000011248 coating agent Substances 0.000 description 1
238000000576 coating method Methods 0.000 description 1
238000004891 communication Methods 0.000 description 1
238000009833 condensation Methods 0.000 description 1
230000005494 condensation Effects 0.000 description 1
238000005336 cracking Methods 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
239000000835 fiber Substances 0.000 description 1
238000007731 hot pressing Methods 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
229910052739 hydrogen Inorganic materials 0.000 description 1
238000003384 imaging method Methods 0.000 description 1
230000000977 initiatory effect Effects 0.000 description 1
238000005259 measurement Methods 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
HYWYRSMBCFDLJT-UHFFFAOYSA-N nimesulide Chemical compound CS(=O)(=O)NC1=CC=C([N+]([O-])=O)C=C1OC1=CC=CC=C1 HYWYRSMBCFDLJT-UHFFFAOYSA-N 0.000 description 1
229960000965 nimesulide Drugs 0.000 description 1
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
238000012545 processing Methods 0.000 description 1
238000005201 scrubbing Methods 0.000 description 1
229910001220 stainless steel Inorganic materials 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1
230000002459 sustained effect Effects 0.000 description 1
231100000331 toxic Toxicity 0.000 description 1
230000002588 toxic effect Effects 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0005—Separation of the coating from the substrate
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0026—Activation or excitation of reactive gases outside the coating chamber
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
- C23C14/0629—Sulfides, selenides or tellurides of zinc, cadmium or mercury
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/305—Sulfides, selenides, or tellurides
- C23C16/306—AII BVI compounds, where A is Zn, Cd or Hg and B is S, Se or Te

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
General Chemical & Material Sciences (AREA)
Inorganic Chemistry (AREA)
Chemical Vapour Deposition (AREA)

IL143115A 1998-02-05 1999-02-02 Method for producing bulk zinc sulfide by progressive chemical vapor deposition IL143115A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US09/018,969 US6083561A (en)	1998-02-05	1998-02-05	Low scatter, high quality water clear zinc sulfide

Publications (1)

Publication Number	Publication Date
IL143115A true IL143115A (en)	2007-02-11

Family

ID=21790693

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
IL143115A IL143115A (en)	1998-02-05	1999-02-02	Method for producing bulk zinc sulfide by progressive chemical vapor deposition
IL12834699A IL128346A (en)	1998-02-05	1999-02-02	Low scatter, high quality water-clear zinc sulfide

Family Applications After (1)

Application Number	Title	Priority Date	Filing Date
IL12834699A IL128346A (en)	1998-02-05	1999-02-02	Low scatter, high quality water-clear zinc sulfide

Country Status (4)

Country	Link
US (1)	US6083561A (fr)
EP (1)	EP0935012B1 (fr)
DE (1)	DE69938944D1 (fr)
IL (2)	IL143115A (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6221482B1 (en) *	1999-04-07	2001-04-24	Cvd Inc.	Low stress, water-clear zinc sulfide
EP1331308A1 (fr) *	2002-01-25	2003-07-30	Georgia-Pacific France	Feuille de papier absorbant gaufré, cylindre pour le gaufrage et son procédé de mise en oeuvre
RU2221906C1 (ru) *	2002-12-25	2004-01-20	Институт химии высокочистых веществ РАН	Способ получения поликристаллического сульфида цинка
DE602004016440D1 (de) *	2003-11-06	2008-10-23	Rohm & Haas Elect Mat	Optischer Gegenstand mit leitender Struktur
US20090000700A1 (en) *	2007-06-29	2009-01-01	Hogan Patrick K	Treatment method for optically transmissive body
US7790072B2 (en) *	2007-12-18	2010-09-07	Raytheon Company	Treatment method for optically transmissive bodies
US8252823B2 (en) *	2008-01-28	2012-08-28	New York University	Oxazole and thiazole compounds as beta-catenin modulators and uses thereof
CN101760725B (zh) *	2008-12-25	2011-09-07	北京有色金属研究总院	一种高光学质量硫化锌头罩的制备方法
EP2511236B1 (fr)	2011-04-14	2015-07-01	Rohm and Haas Company	Sulfure de zinc multispectral de qualité améliorée
EP2634157B1 (fr)	2011-05-24	2016-08-10	Rohm and Haas Company	Sulfure de zinc multispectral de qualité améliorée
CN103469160B (zh) *	2013-08-26	2015-10-21	莫儒就	远红外线能量发热管专用生产设备
TWI583629B (zh)	2013-09-26	2017-05-21	羅門哈斯電子材料有限公司	增加硫化鋅硬度之方法
CN107604340B (zh) *	2017-08-31	2023-09-01	安徽光智科技有限公司	化学气相沉积炉

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4944900A (en) *	1983-03-16	1990-07-31	Raytheon Company	Polycrystalline zinc sulfide and zinc selenide articles having improved optical quality
US4978577A (en) *	1989-04-12	1990-12-18	Cvd Incorporated	Method for preparing laminates of ZnSe and ZnS
US5077092A (en) *	1989-06-30	1991-12-31	Texas Instruments Incorporated	Method and apparatus for deposition of zinc sulfide films
US5183689A (en) *	1991-07-15	1993-02-02	Cvd, Inc.	Process for an improved laminated of znse and zns
US5507987A (en) *	1994-04-28	1996-04-16	Saint Gobain/Norton Industrial Ceramics Corp.	Method of making a free-standing diamond film with reduced bowing

1998
- 1998-02-05 US US09/018,969 patent/US6083561A/en not_active Expired - Lifetime
1999
- 1999-02-02 EP EP99300763A patent/EP0935012B1/fr not_active Expired - Lifetime
- 1999-02-02 DE DE69938944T patent/DE69938944D1/de not_active Expired - Lifetime
- 1999-02-02 IL IL143115A patent/IL143115A/en not_active IP Right Cessation
- 1999-02-02 IL IL12834699A patent/IL128346A/en not_active IP Right Cessation

Also Published As

Publication number	Publication date
IL128346A0 (en)	2000-01-31
US6083561A (en)	2000-07-04
EP0935012B1 (fr)	2008-06-25
EP0935012A3 (fr)	2001-01-31
EP0935012A2 (fr)	1999-08-11
DE69938944D1 (de)	2008-08-07
IL128346A (en)	2002-09-12

Legal Events

Date	Code	Title
2013-02-03	KB	Patent renewed
2016-12-29	KB	Patent renewed
2019-08-29	EXP	Patent expired

Publication	Publication Date	Title
US6083561A (en)	2000-07-04	Low scatter, high quality water clear zinc sulfide
CA1325793C (fr)	1994-01-04	Enduits deposes par formation de plasma et methode basse temperature au plasma utilisee pour ce faire
CA1222912A (fr)	1987-06-16	Vapo-deposition chimique de nitrure de titane et de revetements analogues
DK168664B1 (da)	1994-05-16	Fremgangsmåde til fremstilling af et pladeglasprodukt
US5939201A (en)	1999-08-17	Method for depositing a reflective layer on glass, and products obtained
EP0397292B1 (fr)	1993-04-21	Procédé pour la formation d'une couche mince d'oxydes métalliques sur un substrat, notamment en verre, et son utilisation comme vitrage
US4194022A (en)	1980-03-18	Transparent, colorless, electrically conductive coating
US5643505A (en)	1997-07-01	Method for making low cost infrared windows
EP2853618A1 (fr)	2015-04-01	Augmentation de la dureté de sulfure de zinc
US6472057B2 (en)	2002-10-29	Low stress, water-clear zinc sulfide
GB2028376A (en)	1980-03-05	Electrically Conductive Coatings
Hayashi et al.	1976	Chemical vapour deposition of rutile films
Fu et al.	1997	Single films and heat mirrors produced by plasma ion assisted deposition
EP0353461B1 (fr)	1993-08-18	Déposition chimique en phase vapeur d'oxyde de bismuth
Kim et al.	1995	Microstructure comparison of transparent and opaque CVD SiC
EP0486236B1 (fr)	1995-08-23	Eléments optiques au sulfure de zinc
JPH11504615A (ja)	1999-04-27	ガラス上に反射層を被着する方法及び得られる製品
US5547706A (en)	1996-08-20	Optical thin films and method for their production
EP0955392B1 (fr)	2002-09-18	Réplication précise par CVD
Parttow et al.	1991	CVD diamond coatings for the infrared by optical brazing
EP3417088B1 (fr)	2022-05-18	Procédé de dépôt chimique en phase vapeur pour le dépôt d'un revêtement
JP3247838B2 (ja)	2002-01-21	熱分解窒化ほう素ルツボ及びその製造方法
EP3697737B1 (fr)	2022-12-28	Procédé de fabrication d'un article de verre à revêtement réfléchissant
Taylor et al.	1984	Erosion Resistant FLIR Windows: Colorless ZnS
Sugimoto	1993	Corrosion Resistance of Nb2O5 Films Formed by MOCVD