IL326686A - עיצובי עדשות - Google Patents

עיצובי עדשות

Info

Publication number
IL326686A
IL326686A IL326686A IL32668626A IL326686A IL 326686 A IL326686 A IL 326686A IL 326686 A IL326686 A IL 326686A IL 32668626 A IL32668626 A IL 32668626A IL 326686 A IL326686 A IL 326686A
Authority
IL
Israel
Prior art keywords
lens designs
designs
lens
Prior art date
Application number
IL326686A
Other languages
English (en)
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of IL326686A publication Critical patent/IL326686A/he

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1205—Microlenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/121—Lenses electrostatic characterised by shape
    • H01J2237/1215—Annular electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Beam Exposure (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Materials For Medical Uses (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Prostheses (AREA)
  • Optical Filters (AREA)
  • Mechanical Pencils And Projecting And Retracting Systems Therefor, And Multi-System Writing Instruments (AREA)
IL326686A 2020-02-28 2021-02-18 עיצובי עדשות IL326686A (he)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP20160282.8A EP3872836A1 (en) 2020-02-28 2020-02-28 Electrostatic lens designs
PCT/EP2021/054008 WO2021170482A1 (en) 2020-02-28 2021-02-18 Electrostatic lens designs

Publications (1)

Publication Number Publication Date
IL326686A true IL326686A (he) 2026-04-01

Family

ID=69743068

Family Applications (2)

Application Number Title Priority Date Filing Date
IL295300A IL295300B1 (he) 2020-02-28 2021-02-18 עיצובי עדשות אלקטרוסטטיות
IL326686A IL326686A (he) 2020-02-28 2021-02-18 עיצובי עדשות

Family Applications Before (1)

Application Number Title Priority Date Filing Date
IL295300A IL295300B1 (he) 2020-02-28 2021-02-18 עיצובי עדשות אלקטרוסטטיות

Country Status (9)

Country Link
US (2) US12243714B2 (he)
EP (2) EP3872836A1 (he)
JP (2) JP7410311B2 (he)
KR (2) KR20250083589A (he)
CN (1) CN115176326A (he)
CA (1) CA3169686A1 (he)
IL (2) IL295300B1 (he)
TW (2) TWI788789B (he)
WO (1) WO2021170482A1 (he)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020115183B4 (de) * 2020-06-08 2026-01-29 Carl Zeiss Multisem Gmbh Teilchenstrahlsystem mit Multiquellensystem sowie Mehrstrahl-Teilchenmikroskop
CN118451527A (zh) * 2021-12-31 2024-08-06 Asml荷兰有限公司 带电粒子束装置中的束操纵器
DE102022131862A1 (de) * 2022-12-01 2024-06-06 Carl Zeiss Multisem Gmbh Vielstrahl-Teilchenmikroskop umfassend eine Aberrationskorrektureinheit mit Geometrie-basierten Korrekturelektroden und Verfahren zum Einstellen der Aberrationskorrektur sowie Computerprogrammprodukt

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3930163A (en) * 1974-03-22 1975-12-30 Varian Associates Ion beam apparatus with separately replaceable elements
JPH067466B2 (ja) 1986-11-27 1994-01-26 日電アネルバ株式会社 荷電ビ−ム用静電偏向器
JPS6481151A (en) * 1987-09-22 1989-03-27 Meitec Corp Electrostatic type charged particle beam deflecting converging device
DE3734620C1 (en) * 1987-10-13 1988-12-22 Schwerionenforsch Gmbh Electrostatic quadrupole lens system for focusing particle beams in a vacuum tube
JP3763446B2 (ja) 1999-10-18 2006-04-05 キヤノン株式会社 静電レンズ、電子ビーム描画装置、荷電ビーム応用装置、および、デバイス製造方法
JP2001118536A (ja) 1999-10-19 2001-04-27 Nikon Corp 荷電粒子ビーム制御素子および荷電粒子ビーム装置
JP4585661B2 (ja) * 2000-03-31 2010-11-24 キヤノン株式会社 電子光学系アレイ、荷電粒子線露光装置およびデバイス製造方法
JP2002100317A (ja) 2000-09-26 2002-04-05 Toshiba Corp 荷電ビーム装置、電子ビーム装置及び電子ビーム描画装置
US7109483B2 (en) * 2000-11-17 2006-09-19 Ebara Corporation Method for inspecting substrate, substrate inspecting system and electron beam apparatus
JP2003028999A (ja) * 2001-07-11 2003-01-29 Ebara Corp 荷電粒子ビーム制御装置、及びそれを用いた荷電粒子ビーム光学装置、荷電粒子ビーム欠陥検査装置、並びに荷電粒子ビーム制御方法
JP4252813B2 (ja) 2003-01-30 2009-04-08 キヤノン株式会社 荷電ビーム用レンズ、荷電ビーム露光装置及びデバイス製造方法
JP4615816B2 (ja) 2002-11-14 2011-01-19 キヤノン株式会社 電子レンズ、その電子レンズを用いた荷電粒子線露光装置、デバイス製造方法
JP4541798B2 (ja) 2004-08-06 2010-09-08 キヤノン株式会社 荷電粒子線レンズアレイ、及び該荷電粒子線レンズアレイを用いた荷電粒子線露光装置
JP4959288B2 (ja) * 2005-10-28 2012-06-20 京セラ株式会社 電子光学多層コラム
JP4621621B2 (ja) 2006-03-31 2011-01-26 株式会社東芝 荷電ビーム描画装置
JP2008235464A (ja) 2007-03-19 2008-10-02 Toshiba Corp 電子ビーム描画装置
JP2012238770A (ja) 2011-05-12 2012-12-06 Canon Inc 静電レンズアレイ、描画装置、及びデバイスの製造方法
WO2013047688A1 (ja) 2011-09-30 2013-04-04 京セラ株式会社 静電レンズおよびそれを用いた荷電粒子ビーム装置
JP5886663B2 (ja) 2012-03-21 2016-03-16 株式会社日立ハイテクノロジーズ 電子線応用装置およびレンズアレイ
JP2014033033A (ja) 2012-08-02 2014-02-20 Canon Inc 静電レンズ用電極ユニット
JP6185267B2 (ja) * 2013-03-25 2017-08-23 京セラ株式会社 制御素子およびそれを用いた荷電粒子線装置
NL2013411B1 (en) * 2014-09-04 2016-09-27 Univ Delft Tech Multi electron beam inspection apparatus.
DE102015202172B4 (de) * 2015-02-06 2017-01-19 Carl Zeiss Microscopy Gmbh Teilchenstrahlsystem und Verfahren zur teilchenoptischen Untersuchung eines Objekts
US11302511B2 (en) 2016-02-04 2022-04-12 Kla Corporation Field curvature correction for multi-beam inspection systems
US10176965B1 (en) * 2017-07-05 2019-01-08 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Aberration-corrected multibeam source, charged particle beam device and method of imaging or illuminating a specimen with an array of primary charged particle beamlets
US10395887B1 (en) * 2018-02-20 2019-08-27 Technische Universiteit Delft Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column
US10504687B2 (en) 2018-02-20 2019-12-10 Technische Universiteit Delft Signal separator for a multi-beam charged particle inspection apparatus
EP3881347A1 (en) * 2018-11-16 2021-09-22 ASML Netherlands B.V. Electromagnetic compound lens and charged particle optical system with such a lens

Also Published As

Publication number Publication date
WO2021170482A1 (en) 2021-09-02
TWI788789B (zh) 2023-01-01
US12243714B2 (en) 2025-03-04
IL295300A (he) 2022-10-01
IL295300B1 (he) 2026-04-01
US20250125120A1 (en) 2025-04-17
JP2023516275A (ja) 2023-04-19
KR20250083589A (ko) 2025-06-10
US20220406563A1 (en) 2022-12-22
EP3872836A1 (en) 2021-09-01
CN115176326A (zh) 2022-10-11
TWI899541B (zh) 2025-10-01
EP4111483A1 (en) 2023-01-04
TW202324479A (zh) 2023-06-16
KR20220130790A (ko) 2022-09-27
CA3169686A1 (en) 2021-09-02
JP7611353B2 (ja) 2025-01-09
TW202147370A (zh) 2021-12-16
JP7410311B2 (ja) 2024-01-09
KR102816491B1 (ko) 2025-06-05
JP2024050537A (ja) 2024-04-10

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